Abstract: Provided is a bioresorbable stent including a stent substrate including a bioresorbable polymer and a contrast medium containing an iodine component, coated on the stent substrate. Since the stent according to the present invention is absorbed in and removed from the human body after a predetermined time, it has excellent biodegradability since it has improved radiopacity by iodine contrast medium coating, it has a high radiography contrast and is very efficient even when a procedure is performed with real time radiography, and since it has low foreshortening and high flexibility, radial force, and re-coil, it may be useful for insertion into a blood vessel having a small diameter, an acute occlusive lesion, an imminent occlusive lesion, and the like.

Abstract: A semiconductor device capacitor has a storage electrode wherein the impurity concentration decreases from the bottom to the top thereof. The semiconductor device capacitor is formed on a lower structure of a semiconductor substrate burying a contact hole formed on the semiconductor substrate. The impurity concentration linearly or non-linearly decreases going upward from the bottom of the contact hole to the top of the storage electrode. A method of manufacturing the semiconductor device capacitor also provides that the storage electrode is formed such that the concentration of impurities decreases linearly or non-linearly going upward from the bottom toward the top.

Abstract: The present invention relates to a method for depositing a silicon nitride layer in which a NH3 treatment is performed in a LPCVD chamber having a high pressure valve under operational conditions of high pressure and low temperature. This has the effect of shortening a total operational time required for the NH3 treatment without any decrease in the effectiveness of nitridation. It can also prevent a loss in the operational time in the process of depositing a silicon nitride layer. The method includes the steps of: placing a wafer having an oxide layer in an LPCVD chamber having a high pressure valve under operational conditions of high pressure (for instance, 5˜300 Torr) and low temperature (for instance, 670±50° C.); performing an NH3 treatment on the wafer; and depositing a silicon nitride layer on the wafer at the same temperature as the NH3 treatment is performed at.

Abstract: A semiconductor device capacitor has a storage electrode wherein the impurity concentration decreases from the bottom to the top thereof. The semiconductor device capacitor is formed on a lower structure of a semiconductor substrate burying a contact hole formed on the semiconductor substrate. The impurity concentration linearly or non-linearly decreases going upward from the bottom of the contact hole to the top of the storage electrode. A method of manufacturing the semiconductor device capacitor also provides that the storage electrode is formed such that the concentration of impurities decreases linearly or non-linearly going upward from the bottom toward the top.

Abstract: A method of fabricating a capacitor of a semiconductor device maximizes the imurity density of HSG formed at a surface of an electrode of the capacitor and thereby improves capacitance and breakdown voltage characteristics of a DRAM device incorporating the same. The method includes forming an inter-level insulating layer having a buried contact hole which exposes the underlying semiconductor substrate, forming an amorphous polysilicon layer doped with a low density of a p-type impurity on the resultant structure, selectively etching the polysilicon layer with a mask having a pattern configured to form a bottom electrode over a predetermined portion of the inter-level insulating layer which includes the contact hole, causing HSG to grow on the exposed surface of the bottom electrode, and doping PH3 into the HSG under a “low temperature/ high pressure” process condition.