Abstract: A liquid filtering structure having high filtering efficiency, excellent transparency, and excellent durability can be provided. The liquid filtering structure includes a filtering layer, wherein the filtering layer includes a nanopore structure unit including a plurality of nanopores and a functional group-containing compound including functional groups at one end, and has selectivity with respect to liquid molecules to be filtered, for example, water molecules, and effectively filter liquid, particularly water by preventing ions or compounds from being passed.

Abstract: Disclosed is an apparatus for self-extracting a cell using a magnetic field. The apparatus for self-extracting the cell using the magnetic field according to the present invention includes a flow path casing including an upper substrate and a lower substrate having a magnetic property combined with each other, and a fluid path formed to fluidize a cell solution therein; a separation portion disposed on the fluid path and provided with a separation channel selectively passing only an effective cell that is a separation target in the cell included in the cell solution therethrough; and a magnetic field control portion forming the magnetic field in the flow path portion to separate the cell blocking the separation channel from the separation channel.

Abstract: An apparatus for separating cells using magnetic force includes: a separation channel portion including ferromagnetic particles, and provided with a flow path through which a cell fluid containing a plurality of cells having at least one of diamagnetic and paramagnetic properties; and a magnetic field controller that generates a magnetic field within the flow path so that the cells in the cell fluid flow within the flow path and are separated by height by a magnetic field. Accordingly, there are provided an apparatus for separating cells using magnetic force and a cell separation method using the same, by which cells can be easily separated using magnetic force.

Abstract: Disclosed is an apparatus for self-extracting a cell using a magnetic field. The apparatus for self-extracting the cell using the magnetic field according to the present invention includes a flow path casing including an upper substrate and a lower substrate having a magnetic property combined with each other, and a fluid path formed to fluidize a cell solution therein; a separation portion disposed on the fluid path and provided with a separation channel selectively passing only an effective cell that is a separation target in the cell included in the cell solution therethrough; and a magnetic field control portion forming the magnetic field in the flow path portion to separate the cell blocking the separation channel from the separation channel.

Abstract: An apparatus for separating cells using magnetic force includes: a separation channel portion including ferromagnetic particles, and provided with a flow path through which a cell fluid containing a plurality of cells having at least one of diamagnetic and paramagnetic properties; and a magnetic field controller that generates a magnetic field within the flow path so that the cells in the cell fluid flow within the flow path and are separated by height by a magnetic field. Accordingly, there are provided an apparatus for separating cells using magnetic force and a cell separation method using the same, by which cells can be easily separated using magnetic force.

Abstract: A lithography apparatus is provided. The lithography apparatus includes: a polarizing filter that converts incident light to first polarized light having a single polarizing direction; and a photo mask that is disposed to be separated from the polarizing filter and in which a polarizing pattern having a polarization axis of a predetermined direction in order to convert the applied first polarized light to second polarized light by adjusting a transmittance of the first polarized light and a light blocking pattern that blocks the first polarized light are formed, wherein by radiating light in which a transmittance is adjusted in the photo mask, the photoresist is patterned.

Abstract: Provided is a photoelectric conversion device using a semiconductor nanomaterial, which converts light energy having photon energy into electrical energy, including: a substrate, a plurality of semiconductor nanomaterials arranged on the substrate, and a metal layer that is formed on the semiconductor nanomaterial and is joined with the semiconductor nanomaterial by a schottky junction, wherein electrical energy is generated by a rectified current generated between the semiconductor nanomaterial and the metal layer joined by the schottky junction.

Abstract: A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.

Abstract: A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.

Abstract: A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.

Abstract: A photoelectric conversion device using a semiconductor nanomaterial to which a rectifying action caused by a Schottky junction between semiconductor nanomaterials and metal is applied and a method of manufacturing the same are provided. The photoelectric conversion device includes a substrate, an insulating layer formed on the substrate, a nanomaterial layer made of a plurality of semiconductor nanomaterials vertically arranged between the insulating layer or horizontally arranged on the substrate, and a metal layer provided on the semiconductor nanomaterial layer to form a Schottky junction with the semiconductor nanomaterials. The electrical energy is generated by rectification generated between the semiconductor nanomaterials and the metal layer that form the Schottky junction with each other.

Abstract: A microcontact printing method using an imprinted nanostructure is provided, wherein the microcontact printing is introduced to a nanoimprint lithography process to pattern a self-assembled monolayer (SAM). The method includes forming a nanostructure on a substrate by using the nanoimprint lithography process; and patterning the nanostructure with the microcontact printing method. The operation of patterning includes: depositing a metal thin film on the nanostructure; contacting a plate with the nanostructure to selectively print the SAM on the nanostructure, wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure; selectively removing the metal thin film by using the SAM as a mask; removing the SAM from the nanostructure; and patterning the substrate by using the remaining metal thin film on the nanostructure as a mask.

Abstract: A UV nanoimprint lithography process for forming nanostructures on a substrate. The process includes depositing a resist on a substrate; contacting a stamp having formed thereon nanostructures at areas corresponding to where nanostructures on the substrate are to be formed to an upper surface of the resist, and applying a predetermined pressure to the stamp in a direction toward the substrate, the contacting and applying being performed at room temperature and at low pressure; irradiating ultraviolet rays onto the resist; separating the stamp from the resist; and etching an upper surface of the substrate on which the resist is deposited. The stamp is an elementwise embossed stamp that comprises at least two element stamps, and grooves formed between adjacent element stamps and having a depth that is greater than a depth of the nanostructures formed on the element stamps.

Abstract: A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.

Abstract: A microcontact printing method using an imprinted nanostructure is provided, wherein the microcontact printing is introduced to a nanoimprint lithography process to pattern a self-assembled monolayer (SAM) The method includes forming a nanostructure on a substrate by using the nanoimprint lithography process; and patterning the nanostructure with the microcontact printing method. The operation of patterning includes: depositing a metal thin film on the nanostructure; contacting a plate with the nanostructure to selectively print the SAM on the nanostructure, wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure; selectively removing the metal thin film by using the SAM as a mask; removing the SAM from the nanostructure; and patterning the substrate by using the remaining metal thin film on the nanostructure as a mask.

Abstract: A UV nanoimprint lithography process for forming nanostructures on a substrate. The process includes depositing a resist on a substrate; contacting a stamp having formed thereon nanostructures at areas corresponding to where nanostructures on the substrate are to be formed to an upper surface of the resist, and applying a predetermined pressure to the stamp in a direction toward the substrate, the contacting and applying being performed at room temperature and at low pressure; irradiating ultraviolet rays onto the resist; separating the stamp from the resist; and etching an upper surface of the substrate on which the resist is deposited. The stamp is an elementwise embossed stamp that comprises at least two element stamps, and grooves formed between adjacent element stamps and having a depth that is greater than a depth of the nanostructures formed on the element stamps.

Abstract: Method for making a minute product by using laser beam. A workpiece is mounted on a mounting device. The laser beam is irradiated to a pre-selected portion of the workpiece for ablation. The space formed during the ablation is filled with filler. The other portion of the workpiece is ablated for making the workpiece to have a predetermined shape. The filler is removed from the shaped workpiece to provide the minute product.