Abstract: The disclosure pertains to compositions and methods for modifying or refining the surface of a wafer suited for semiconductor fabrication. The compositions include working liquids useful in modifying a surface of a wafer suited for fabrication of a semiconductor device. In some embodiments, the working liquids are aqueous solutions of initial components substantially free of loose abrasive particles, the components including water, a surfactant, and a pH buffer exhibiting at least one pKa greater than 7. In certain embodiments, the pH buffer includes a basic pH adjusting agent and an acidic complexing agent, and the working liquid exhibits a pH from about 7 to about 12. In further embodiments, the disclosure provides a fixed abrasive article comprising a surfactant suitable for modifying the surface of a wafer, and a method of making the fixed abrasive article. Additional embodiments describe methods that may be used to modify a wafer surface.

Abstract: A composition for encapsulation and controlled release comprises a water-insoluble matrix comprising a host molecule that is non-covalently crosslinked by multi-valent cations, that is non-polymeric, that has more than one carboxy functional group, that has at least partial aromatic or heteroaromatic character, and that comprises at least one pterin or 5-substituted pterin moiety. The composition can further comprise a guest molecule (for example, a drug) that can be encapsulated within the matrix and subsequently released.

Abstract: Electrolytic solutions containing organic additive(s) selected from a described class of additives (e.g., 4,6-dihydroxypyrimidine) reduce overall applied electrical potential of electrolytic cells and/or reduce gas formation at the anode(s) or increase copper production rate. Benefits include reducing overall power consumption and reducing acid mist during electrolytic processes.

Abstract: Methods are provided to make acid functional fluoropolymers by: a) dehydrofluorinating a starting fluoropolymer with a dehydrofluorinating agent to form an unsaturated fluoropolymer; b) adding an acidifiable nucleophilic functionalizing agent to a double bond of the unsaturated fluoropolymer; and c) acidifying the added acidifiable function. Acid functional fluoropolymers and ion conducting membranes thereof are also provided, including acid functional fluoropolymer having pendent groups according to the formula: —X—Ar—An, wherein X is selected from O, S or NR, where R is selected from H and C1–C30 alkyl or aryl, which are optionally substituted, wherein Ar is a C6–C30 aromatic group, which is optionally substituted, wherein A is an acidic function or salt thereof, wherein a can be independently chosen to be 1, 2 or 3.

Abstract: Methods are provided to make acid functional fluoropolymers by: a) dehydrofluorinating a starting fluoropolymer with a dehydrofluorinating agent to form an unsaturated fluoropolymer; b) adding an acidifiable nucleophilic functionalizing agent to a double bond of the unsaturated fluoropolymer; and c) acidifying the added acidifiable function. Acid functional fluoropolymers and ion conducting membranes thereof are also provided, including acid functional fluoropolymer having pendent groups according to the formula: —X—Ar—An, wherein X is selected from O, S or NR, where R is selected from H and C1-C30 alkyl or aryl, which are optionally substituted, wherein Ar is a C6-C30 aromatic group, which is optionally substituted, wherein A is an acidic function or salt thereof, wherein a can be independently chosen to be 1, 2 or 3.

Abstract: Electrolytic solutions containing organic additive(s) selected from a described class of additives (e.g., 4,6-dihydroxypyrimidine) reduce overall applied electrical potential of electrolytic cells and/or reduce gas formation at the anode(s) or increase copper production rate. Benefits include reducing overall power consumption and reducing acid mist during electrolytic processes.

Abstract: Methods are provided to make acid functional fluoropolymers by: a) dehydrofluorinating a starting fluoropolymer with a dehydrofluorinating agent to form an unsaturated fluoropolymer; b) adding an acidifiable nucleophilic functionalizing agent to a double bond of the unsaturated fluoropolymer; and c) acidifying the added acidifiable function. Acid functional fluoropolymers and ion conducting membranes thereof are also provided, including acid functional fluoropolymer having pendent groups according to the formula: —X—Ar—An, wherein X is selected from O, S or NR, where R is selected from H and C1-C30 alkyl or aryl, which are optionally substituted, wherein Ar is a C6-C30 aromatic group, which is optionally substituted, wherein A is an acidic function or salt thereof, wherein a can be independently chosen to be 1, 2 or 3.

Abstract: Methods are provided to make acid functional fluoropolymers by: a) dehydrofluorinating a starting fluoropolymer with a dehydrofluorinating agent to form an unsaturated fluoropolymer; b) adding an acidifiable nucleophilic functionalizing agent to a double bond of the unsaturated fluoropolymer; and c) acidifying the added acidifiable function. Acid functional fluoropolymers and ion conducting membranes thereof are also provided, including acid functional fluoropolymer having pendent groups according to the formula: —X—Ar—An, wherein X is selected from O, S or NR, where R is selected from H and C1-C30 alkyl or aryl, which are optionally substituted, wherein Ar is a C6-C30 aromatic group, which is optionally substituted, wherein A is an acidic function or salt thereof, wherein a can be independently chosen to be 1, 2 or 3.

Abstract: A family of working liquids useful in modifying exposed surfaces of wafers for semiconductor fabrication are provided along with methods of modifying exposed surfaces of wafers for semiconductor fabrication utilizing such a family of working liquids, and semiconductor wafers made according the foregoing process. The working liquid of the invention is a solution of initial components, the components comprising: an oxidizing agent; an ionic buffer; a passivating agent; a chelating agent selected from iminodiacetic acid and salts thereof; and water.

Abstract: This invention pertains to a method of modifying or refining a surface of a wafer suited for semiconductor fabrication. This method may be used to modify a wafer having an unmodified, exposed surface comprised of a layer of a second material deployed over at least one discrete feature of a first material attached to the wafer. A first step of this method comprises contacting and relatively moving the exposed surface of the wafer with respect to an abrasive article, wherein the abrasive article comprises an exposed surface of a plurality of three-dimensional abrasive composites comprising a plurality of abrasive particles fixed and dispersed in a binder and maintaining contact to effect removal of the second material. In a second step, the contact and relative motion are continued until an exposed surface of the wafer has at least one area of exposed first material and at least one area of exposed second material.

Abstract: Electrochromic devices are disclosed in which the counterelectrode layer is a gamma phase Li.sub.x V.sub.2 O.sub.5 layer in which x is between about 0.7 and 2.0. In addition, methods of producing electrochromic devices are disclosed including such counterelectrode layers which are heat treated at temperatures of greater than about 260.degree. C. to convert the counterelectrode layer into such a gamma phase Li.sub.x V.sub.2 O.sub.5 layer.

Abstract: A tape that includes an electronically conductive flexible substrate, a release layer, and an adhesive comprising an ion-intercalating material, and electrochromic devices and glazing units prepared using this tape.

Abstract: The preparation, structure, and properties of solid inorganic materials containing cobalt, boron, oxygen and, optionally, aluminum, is described. Also described is the use of such materials in catalytic compositions for the conversion of organic compounds. In particular, the new material Co(BO.sub.2)OH is described as well as the use of such material in various catalyzed processes including oxidation of organic compound processes. A particularly useful process is a heterogeneous catalyzed partial oxidation of an alkylaromatic followed by complete oxidation to an aromatic polycarboxlic acid in a water phase.