Patents by Inventor Lai Wai
Lai Wai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240093298Abstract: Systems, methods, and apparatuses are provided for diagnosing auto-immune diseases such as systemic lupus erythematosus (SLE) based on the sizes, methylation levels, and/or genomic characteristics of circulating DNA molecules. Patients provide blood or other tissue samples containing cell-free nucleic molecules for analysis. Massively parallel and/or methylation-aware sequencing can be used to determine the sizes and methylation levels of individual DNA molecules and identify the number of molecules originating from different genomic regions.Type: ApplicationFiled: April 21, 2023Publication date: March 21, 2024Inventors: Yuk-Ming Dennis Lo, Rossa Wai Kwun Chiu, Rebecca Wing Yan Chan, Lai Shan Tam
-
Publication number: 20180213604Abstract: The present invention relates to a disposable heating cup intended for heating up a food product or for maintaining such a food product when pre-heated hot in a disposable cup over an extended period of time, wherein the heating cup is characterized in that it comprises a printed electrical heating circuit and a printed USB connector linked to said electrical heating circuit. Furthermore, the present invention relates to a packaged food product comprising the disposable heating cup, and a method for heating a food or beverage product with making use of a disposable heating cup.Type: ApplicationFiled: May 9, 2016Publication date: July 26, 2018Inventors: Yves Soppelsa, Budiman Salam, Lai Lai Wai
-
Patent number: 7705691Abstract: A substrate for power decoupling and a method of forming a substrate for power decoupling. The substrate comprises one or more decoupling capacitors; and one or more interconnections to the decoupling capacitors. At least one of the interconnections comprises a lossy material.Type: GrantFiled: October 18, 2005Date of Patent: April 27, 2010Assignee: Agency for Science, Technology & ResearchInventors: Chee Wai Albert Lu, Boon Keng Lok, Chee Khuen Stephen Wong, Kai Meng Chua, Lai Lai Wai, Sunnappan Vasudivan
-
Patent number: 7548432Abstract: An embedded capacitor structure comprising a main body; at least one embedded capacitor, having a first electrode, a dielectric layer, and a second electrode, formed in the main body; and at least one via electrical connection formed in the main body; wherein at least one of the first and second electrodes is free from direct electrical connection to the via electrical connections.Type: GrantFiled: March 24, 2005Date of Patent: June 16, 2009Assignee: Agency for Science, Technology and ResearchInventors: Chee Wai Lu, Boon Keng Lok, Kai Meng Chua, Lai Lai Wai
-
Patent number: 7257146Abstract: A method and system for stabilizing energy consumption in multiple loads, or in single multi-phase loads. The method and system also compensates for unbalance in multi-phase loads. A central controller monitors variable reactances in the loads and identifies situations of power and/or current fluctuation and/or unbalance. It determines appropriate corrective action by the other loads/phases to compensate for the power and/or current change or unbalance due to the problematic load, and it issues control signals instructing variable reactor controllers associated with the other loads to adjust accordingly. The method and system may by applied to electric arc furnace installations. The system and method may be employed to maintain a predetermined level of unbalance in the system.Type: GrantFiled: September 1, 2005Date of Patent: August 14, 2007Assignee: Hatch Ltd.Inventors: Mohammad Sedighy, Thomas Lai Wai Ma
-
Patent number: 7212561Abstract: A method and system for stabilizing energy consumption in multiple loads, or in single multi-phase loads. The method and system also compensates for unbalance in multi-phase loads. A central controller monitors variable reactances in the loads and identifies situations of power and/or current fluctuation and/or unbalance. It determines appropriate corrective action by the other loads/phases to compensate for the power and/or current change or unbalance due to the problematic load, and it issues control signals instructing variable reactor controllers associated with the other loads to adjust accordingly. The method and system may by applied to electric arc furnace installations. In this context, the method and system provide an electrode position controller coupled to the feed rate controller so as to predictively anticipate the introduction of new source material and lower the electrodes so as to prevent arc extinguishment while the variable reactors maintain predetermined power set-points.Type: GrantFiled: August 31, 2005Date of Patent: May 1, 2007Assignee: Hatch Ltd.Inventors: Mohammad Sedighy, Thomas Lai Wai Ma
-
Patent number: 7212562Abstract: A method and system for stabilizing energy consumption in multiple loads, or in single multi-phase loads. A central controller monitors variable reactances in the loads and identifies situations of power and/or current fluctuation and/or unbalance. The central controller determines appropriate corrective action by the other loads/phases to compensate for the power and/or current change or unbalance due to the problematic load, and it issues control signals instructing electrode position controllers associated with the other loads to adjust accordingly. The method and system may by applied to electric arc furnace installations. The electrode position controllers may be used in conjunction with variable reactance control systems to take corrective action to address power and/or current changes or unbalances. The variable reactors respond orders of magnitude faster than the electrode positioning system.Type: GrantFiled: September 1, 2005Date of Patent: May 1, 2007Assignee: Hatch Ltd.Inventor: Thomas Lai Wai Ma
-
Publication number: 20060215380Abstract: An embedded capacitor structure comprising a main body; at least one embedded capacitor, having a first electrode, a dielectric layer, and a second electrode, formed in the main body; and at least one via electrical connection formed in the main body; wherein at least one of the first and second electrodes is free from direct electrical connection to the via electrical connections.Type: ApplicationFiled: March 24, 2005Publication date: September 28, 2006Inventors: Chee Lu, Boon Lok, Kai Chua, Lai Wai
-
Publication number: 20060050760Abstract: A method and system for stabilizing energy consumption in multiple loads, or in single multi-phase loads. The method and system also compensates for unbalance in multi-phase loads. A central controller monitors variable reactances in the loads and identifies situations of power and/or current fluctuation and/or unbalance. It determines appropriate corrective action by the other loads/phases to compensate for the power and/or current change or unbalance due to the problematic load, and it issues control signals instructing variable reactor controllers associated with the other loads to adjust accordingly. The method and system may by applied to electric arc furnace installations. In this context, the method and system provide an electrode position controller coupled to the feed rate controller so as to predicatively anticipate the introduction of new feed material and lower the electrodes so as to prevent arc extinguishment while the variable reactors maintain predetermined power set-points.Type: ApplicationFiled: September 1, 2005Publication date: March 9, 2006Inventor: Thomas Lai Wai Ma
-
Publication number: 20050077723Abstract: A kind of fitting for liquid or steam, the threads are not necessary to form on the matching pipe to be coupled, the fitting comprising: a traditional elastic sealing ring, which contacts the inner end face of said traditional fitting head; a locating sleeve placed around said sealing ring; an internal teethed lock ring located on the outer end face of said locating ring; an inner ring located outside said internal teethed lock ring, the inner surface of the inner ring matches with the outer surface of the pipe to be coupled, a tapered surface is formed on the inner ring toward said internal teethed lock ring and external threads are made on the outer surface of the inner ring; an outer ring with threads on its internal surface for matching the external thread on said inner ring, the external cylindrical surface of the outer ring sliding matches said inner cylindrical surface of said traditional fitting head, the external thread on the external surface of the outer ring matches said internal thread of said trType: ApplicationFiled: August 26, 2004Publication date: April 14, 2005Inventor: Lai Wai
-
Patent number: 6762456Abstract: A lateral RF MOS transistor with at least one conductive plug structure comprising: (1) a semiconductor material of a first conductivity type having a first dopant concentration and a top surface; (2) a conductive gate overlying and insulated from the top surface of the semiconductor material; (3) at least two enhanced drain drift regions of the second conductivity type of the RF MOS transistor; the first region laying partially underneath the gate; the second enhanced drain drift region contacting the first enhanced drain drift region, the dopant concentration of the second enhanced drain drift region is higher than the dopant concentration of the first enhanced drain drift region; (4) a drain region of the second conductivity type contacting the second enhanced drain drift region; (5) a body region of said RF MOS transistor of the first conductivity type with the dopant concentration being at least equal to the dopant concentration of the semiconductor epi layer; (6) a source region of the second conductiviType: GrantFiled: February 8, 2003Date of Patent: July 13, 2004Assignee: Sirenza Microdevices, Inc.Inventors: Pablo D'Anna, Alan Lai-Wai Yan
-
Publication number: 20040124462Abstract: A lateral RF MOS transistor with at least one conductive plug structure comprising: (1) a semiconductor material of a first conductivity type having a first dopant concentration and a top surface; (2) a conductive gate overlying and insulated from the top surface of the semiconductor material; (3) at least two enhanced drain drift regions of the second conductivity type of the RF MOS transistor; the first region laying partially underneath the gate; the second enhanced drain drift region contacting the first enhanced drain drift region, the dopant concentration of the second enhanced drain drift region is higher than the dopant concentration of the first enhanced drain drift region; (4) a drain region of the second conductivity type contacting the second enhanced drain drift region; (5) a body region of said RF MOS transistor of the first conductivity type with the dopant concentration being at least equal to the dopant concentration of the semiconductor epi layer; (6) a source region of the second conductiviType: ApplicationFiled: February 8, 2003Publication date: July 1, 2004Applicant: SIRENZA MICRODEVICES, INC.Inventors: Pablo D'Anna, Alan Lai-Wai Yan
-
Patent number: 6686627Abstract: A lateral RF MOS transistor with at least one conductive plug structure comprising: (1) a semiconductor material of a first conductivity type having a first dopant concentration and a top surface; (2) a conductive gate overlying and insulated from the top surface of the semiconductor material; (3) at least two enhanced drain drift regions of the second conductivity type of the RF MOS transistor; the first region laying partially underneath the gate; the second enhanced drain drift region contacting the first enhanced drain drift region, the dopant concentration of the second enhanced drain drift region is higher than the dopant concentration of the first enhanced drain drift region; (4) a drain region of the second conductivity type contacting the second enhanced drain drift region; (5) a body region of said RF MOS transistor of the first conductivity type with the dopant concentration being at least equal to the dopant concentration of the semiconductor epi layer; (6) a source region of the second conductiviType: GrantFiled: December 26, 2001Date of Patent: February 3, 2004Assignee: Sirenza Microdevices, Inc.Inventors: Pablo D'Anna, Alan Lai-Wai Yan
-
Patent number: 6603795Abstract: A power control system for an AC electric arc furnace. The control system includes variable reactors located intermediate a furnace power supply and arc electrodes that are height adjustable. The control system monitors operating characteristics of the furnace that are indicative of the active power consumption of the furnace and adjusts the variable reactors and the electrode height so as to minimize variations in the active power consumption. Loss of electrode arc can be predicted and countered by lowering the electrodes and decreasing the reactance of the variable reactors.Type: GrantFiled: February 8, 2001Date of Patent: August 5, 2003Assignees: Hatch Associates Ltd., Satcon Power Systems Canada Ltd.Inventors: Thomas Lai Wai Ma, Mohammad Sedighy, Brian Kenneth Perkins, Theodorus Anthonius Gerritsen, Janos Rajda
-
Publication number: 20030116785Abstract: A lateral RF MOS transistor with at least one conductive plug structure comprising: (1) a semiconductor material of a first conductivity type having a first dopant concentration and a top surface; (2) a conductive gate overlying and insulated from the top surface of the semiconductor material; (3) at least two enhanced drain drift regions of the second conductivity type of the RF MOS transistor; the first region laying partially underneath the gate; the second enhanced drain drift region contacting the first enhanced drain drift region, the dopant concentration of the second enhanced drain drift region is higher than the dopant concentration of the first enhanced drain drift region; (4) a drain region of the second conductivity type contacting the second enhanced drain drift region; (5) a body region of said RF MOS transistor of the first conductivity type with the dopant concentration being at least equal to the dopant concentration of the semiconductor epi layer; (6) a source region of the second conductiviType: ApplicationFiled: December 26, 2001Publication date: June 26, 2003Applicant: XEMOD, Inc.Inventors: Pablo D'Anna, Alan Lai-Wai Yan
-
Patent number: 6573691Abstract: Variable shunt and series connected reactors are used in a complimentary combination in an electric arc furnace to provide improved flicker control. A power control system for an time-varying AC load, such as an electric arc furnace, connected to an AC power supply line includes a first variable reactance intermediate the power supply line and the load, and a second variable reactance connected in parallel with the power supply line. A control system is provided for (i) monitoring load current and adjusting the first variable reactance in response to changes in the monitored load current; and (ii) monitoring reactive power draw by the load and adjusting the second variable reactance in response to changes in the monitored reactive power draw. The first variable reactance and second variable reactance are each primarily used to mitigate flicker at different times during the load operation.Type: GrantFiled: October 17, 2001Date of Patent: June 3, 2003Assignees: Hatch Associates Ltd., Satcon Power Systems Canada Ltd.Inventors: Thomas Lai Wai Ma, Brooke Armstrong Stratton
-
Publication number: 20030076075Abstract: Variable shunt and series connected reactors are used in a complimentary combination in an electric arc furnace to provide improved flicker control. A power control system for an time-varying AC load, such as an electric arc furnace, connected to an AC power supply line includes a first variable reactance intermediate the power supply line and the load, and a second variable reactance connected in parallel with the power supply line. A control system is provided for (i) monitoring load current and adjusting the first variable reactance in response to changes in the monitored load current; and (ii) monitoring reactive power draw by the load and adjusting the second variable reactance in response to changes in the monitored reactive power draw. The first variable reactance and second variable reactance are each primarily used to mitigate flicker at different times during the load operation.Type: ApplicationFiled: October 17, 2001Publication date: April 24, 2003Inventors: Thomas Lai Wai Ma, Brooke Armstrong Stratton
-
Patent number: 6519274Abstract: A power control system for an AC electric arc furnace. The control system includes variable reactors located intermediate a furnace power supply and arc electrodes that are height adjustable. The control system monitors operating characteristics of the furnace that are indicative of the active power consumption of the furnace and adjusts the variable reactors and the electrode height so as to minimize variations in the active power consumption. Loss of electrode arc can be predicted and countered by lowering the electrodes and decreasing the reactance of the variable reactors.Type: GrantFiled: February 8, 2001Date of Patent: February 11, 2003Assignees: Hatch Associates Ltd., Satcon Power Systems Canada Ltd.Inventors: Thomas Lai Wai Ma, Mohammad Sedighy, Brian Kenneth Perkins, Theodorus Anthonius Gerritsen, Janos Rajda
-
Publication number: 20020136260Abstract: A power control system for an AC electric arc furnace. The control system includes variable reactors located intermediate a furnace power supply and arc electrodes that are height adjustable. The control system monitors operating characteristics of the furnace that are indicative of the active power consumption of the furnace and adjusts the variable reactors and the electrode height so as to minimize variations in the active power consumption.Type: ApplicationFiled: February 8, 2001Publication date: September 26, 2002Inventors: Thomas Lai Wai Ma, Mohammad Sedighy, Brian Kenneth Perkins, Theodorus Anthonius Gerritsen, Janos Rajda
-
Patent number: 5867523Abstract: An improved return path for electric current through a conductive hearth of a direct current arc furnace is provided by pressing a ring of water cooled copper blocks into the periphery of a sidewall of the hearth of the furnace, the hearth having zones of conductive refractory providing an electrical path between the contents of the furnace of the copper blocks. The hearth is compressed by a tensioned peripheral band which may also support the blocks. The peripheral water cooled copper blocks may be divided into multiple groups, each group connected to one pole of a direct current power supply, the opposite pole of which is connected to a suspended electrode, permitting control of arc deflection.Type: GrantFiled: May 28, 1996Date of Patent: February 2, 1999Assignee: Hatch Associates Ltd.Inventors: Bert Orland Wasmund, Thomas Lai Wai Ma, Nils Walter Voermann