Abstract: An apparatus and method for installing a plurality of facilities conduits in a wafer fabrication facility for subsequent coupling to a wafer-processing tool. The apparatus comprises a facilities integration plate and a gauge fixture removably inserted within the facilities integration plate. The method comprises the steps of determining a location where the wafer-processing tool is positioned in the wafer fabrication facility, forming a cutout in a floor of the fabrication facility, and providing the plurality of facilities conduits through the cutout in the floor. The facilities integration plate is mounted within the cutout in the floor, and the gauge fixture is disposed within the facilities integration plate. The facilities conduits are sized to a length defined by the gauge fixture and the wafer-processing tool is coupled to the plurality of facilities conduits.

Abstract: An apparatus and method for installing a plurality of facilities conduits in a wafer fabrication facility for subsequent coupling to a wafer-processing tool. The apparatus comprises a facilities integration plate and a gauge fixture removably inserted within the facilities integration plate. The method comprises the steps of determining a location where the wafer-processing tool is positioned in the wafer fabrication facility, forming a cutout in a floor of the fabrication facility, and providing the plurality of facilities conduits through the cutout in the floor. The facilities integration plate is mounted within the cutout in the floor, and the gauge fixture is disposed within the facilities integration plate. The facilities conduits are sized to a length defined by the gauge fixture and the wafer-processing tool is coupled to the plurality of facilities conduits.

Abstract: A wafer position error detection and correction system determines the presence of a wafer on a wafer transport robot blade. The system also determines a wafer position error by monitoring the position of the wafer with respect to the blade with one sensor which is located proximate to each entrance of a process chamber. When a wafer position error is detected, the system determines the extent of the misalignment and corrects such misalignment if correctable by the wafer transport robot or alerts an operator for operator intervention. The system incorporates a transparent cover on the surface of the wafer handling chamber and four optical detection sensors disposed on the surface of the transparent cover, in which each sensor is placed proximate to the entrance of the process chamber. In addition, an I/O sensor is placed adjacent the I/O slit valve to detect and correct wafer position errors.