Abstract: A movement detection device includes a signal transmission device configured to transmit a radar signal transmission toward a target area and to receive reflected radar signals, and a signal analysis device configured to analyze the reflected radar signals to detect a movement in the target area that is indicative of micro-shivering. In response to detecting the micro-shivering, the movement detection device generates an alarm.

Abstract: A filter includes a housing having an interior space, in which the housing has at least one opening end. The filter further includes a membrane disposed within the housing that has a length that extends along a length direction of the housing, and a baffle provided at least in the interior space of the housing. The baffle includes at least two baffle partitions that extend along at least a portion of the length of the membrane to divide the interior space of the housing into at least a first portion and a second portion so that when a fluid is supplied to the filter, the fluid is directed to first flow in the first portion and then to the second portion.

Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

Abstract: Methods for imaging a substrate include: inducing an electrospray from a nanopipette probe; varying a distance between the nanopipette probe and a surface of the substrate until a predefined electrospray current and/or a predefined distance threshold is reached; and determining a topography of the surface of the substrate based on feedback derived from distance dependency of the electrospray current. Apparatuses for performing scanning electrospray microscopy and methods for spatially controlled deposition of material on surfaces of substrates are described.

Abstract: A theta pipette is provided having an outer barrel defining a cavity. A first inner barrel may be positioned within the cavity of the outer barrel and may contain an aqueous solution. An electrode may be inserted into the acidified aqueous solution. A second inner barrel may be positioned within the cavity of the outer barrel and may contain an immiscible phase solution. The second inner barrel may be positioned adjacent the first inner barrel.

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.

Abstract: Methods for imaging a substrate include: inducing an electrospray from a nanopipette probe; varying a distance between the nanopipette probe and a surface of the substrate until a predefined electrospray current and/or a predefined distance threshold is reached; and determining a topography of the surface of the substrate based on feedback derived from distance dependency of the electrospray current. Apparatuses for performing scanning electrospray microscopy and methods for spatially controlled deposition of material on surfaces of substrates are described.

Abstract: A tester, systems and method for testing hydrocarbons are provided. The tester includes a test module supporting the component thereabout. The test module is operatively connectable to a fluid source to receive the hydrocarbon therefrom. A recirculation circuit is operatively connectable to the fluid circuit about the test module to recirculate the hydrocarbon thereabout whereby the hydrocarbon is passed over at least a portion of the component. The method involves passing the hydrocarbon over at least a portion of a plurality of the components, recirculating the hydrocarbon over the portion of each of the components, and performing a material test on each of the components.