Patents by Inventor Larry Lam Chau

Larry Lam Chau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integrated circuit designed and manufactured using diagonal minimum-width patterns
    Patent number: 8952546
    Abstract: An integrated circuit comprising a plurality of standard cell circuit elements is disclosed, wherein for at least one layer of the integrated circuit, a majority of minimum-width patterns are in a preferred diagonal orientation.
    Type: Grant
    Filed: May 5, 2014
    Date of Patent: February 10, 2015
    Assignee: D2S, Inc.
    Inventors: Akira Fujimura, Larry Lam Chau, Tam Dinh Thanh Nguyen
  • Integrated Circuit Designed and Manufactured Using Diagonal Minimum-Width Patterns
    Publication number: 20140245247
    Abstract: An integrated circuit comprising a plurality of standard cell circuit elements is disclosed, wherein for at least one layer of the integrated circuit, a majority of minimum-width patterns are in a preferred diagonal orientation.
    Type: Application
    Filed: May 5, 2014
    Publication date: August 28, 2014
    Applicant: D2S, INC.
    Inventors: Akira Fujimura, Larry Lam Chau, Tam Dinh Thanh Nguyen
  • Method for integrated circuit design and manufacture using diagonal minimum-width patterns
    Patent number: 8745555
    Abstract: Methods for designing and manufacturing an integrated circuit are disclosed, in which the physical design process for a standard cell or cells utilizes a preferred diagonal direction for minimum-width patterns on at least one layer, where the standard cell or cells are used in the layout of an integrated circuit. The methods also include forming the patterns on a photomask using model-based fracturing techniques with charged particle beam simulation, and forming the patterns on a substrate such a silicon wafer using the photomask and an optical lithographic process with directional illumination which is optimized for the preferred diagonal direction.
    Type: Grant
    Filed: May 12, 2010
    Date of Patent: June 3, 2014
    Assignee: D2S, Inc.
    Inventors: Akira Fujimura, Larry Lam Chau, Tam Dinh Thanh Nguyen
  • Cell projection charged particle beam lithography
    Patent number: 8426832
    Abstract: The present invention increases the number of characters available on a stencil for charged particle beam lithography. A stencil for charged particle beam lithography is disclosed, comprising two character projection (CP) characters, wherein the blanking areas for the two CP characters overlap. A stencil is also disclosed comprising two CP characters with one or more optional characters between the two characters, wherein the optional characters can form meaningful patterns on a surface only in combination with one of the two characters. A stencil is also disclosed wherein the blanking area of a CP character extends beyond the boundary of the stencil's available character area. Methods for design of the aforementioned stencils are also disclosed.
    Type: Grant
    Filed: September 2, 2009
    Date of Patent: April 23, 2013
    Assignee: D2S, Inc.
    Inventors: Kenji Yoshida, Takashi Mitsuhashi, Shohei Matsushita, Larry Lam Chau, Tam Dinh Thanh Nguyen, Donald MacMillen, Akira Fujimura
  • METHOD FOR INTEGRATED CIRCUIT DESIGN AND MANUFACTURE USING DIAGONAL MINIMUM-WIDTH PATTERNS
    Publication number: 20110278731
    Abstract: Methods for designing and manufacturing an integrated circuit are disclosed, in which the physical design process for a standard cell or cells utilizes a preferred diagonal direction for minimum-width patterns on at least one layer, where the standard cell or cells are used in the layout of an integrated circuit. The methods also include forming the patterns on a photomask using model-based fracturing techniques with charged particle beam simulation, and forming the patterns on a substrate such a silicon wafer using the photomask and an optical lithographic process with directional illumination which is optimized for the preferred diagonal direction.
    Type: Application
    Filed: May 12, 2010
    Publication date: November 17, 2011
    Applicant: D2S, INC.
    Inventors: Akira Fujimura, Larry Lam Chau, Tam Dinh Thanh Nguyen
  • STENCIL DESIGN AND METHOD FOR IMPROVING CHARACTER DENSITY FOR CELL PROJECTION CHARGED PARTICLE BEAM LITHOGRAPHY
    Publication number: 20090325085
    Abstract: The present invention increases the number of characters available on a stencil for charged particle beam lithography. A stencil for charged particle beam lithography is disclosed, comprising two character projection (CP) characters, wherein the blanking areas for the two CP characters overlap. A stencil is also disclosed comprising two CP characters with one or more optional characters between the two characters, wherein the optional characters can form meaningful patterns on a surface only in combination with one of the two characters. A stencil is also disclosed wherein the blanking area of a CP character extends beyond the boundary of the stencil's available character area. Methods for design of the aforementioned stencils are also disclosed.
    Type: Application
    Filed: September 2, 2009
    Publication date: December 31, 2009
    Applicant: D2S, INC.
    Inventors: Kenji Yoshida, Takashi Mitsuhashi, Shohei Matsushita, Larry Lam Chau, Tam Dinh Thanh Nguyen, Donald MacMillen, Akira Fujimura