Abstract: A method and apparatus for characterizing an object with a wavefront from the object is disclosed. In one embodiment, the apparatus includes: a reticle positioned in a path of the wavefront, the reticle comprising two superimposed linear grating patterns; at least one light detector positioned relative to the reticle to receive a self-image diffraction pattern of the reticle produced by the wavefront; and at least one processor receiving signals from the light detector representative of the self-image diffraction pattern and deriving derivatives associated therewith, the processor using the derivatives to characterize said object.

Abstract: A wavefront measuring system and method for detecting phase aberrations in wavefronts that are reflected from, transmitted through or internally reflected within objects sought to be measured, e.g., optical systems, the human eye, etc. includes placing a reticle in the path of a return beam from the object, and placing a detector at a diffraction pattern self-imaging plane relative to the reticle. The diffraction pattern is analyzed and results in a model of the wavefront phase characteristics. A set of known polynomials is fitted to the wavefront phase gradient to obtain polynomial coefficients that describe aberrations in the object or within the wavefront source being measured.

Abstract: A wavefront measuring system and method for detecting phase aberrations in wavefronts that are reflected from, transmitted through or internally reflected within objects sought to be measured, e.g., optics systems, the human eye, etc. includes placing a reticle in the path of a return beam from the object, and placing a detector at a diffraction pattern self-imaging plane relative to the reticle. The diffraction pattern is analyzed and results in a model of the wavefront phase characteristics. A set of known polynomials is fitted to the wavefront phase gradient to obtain polynomial coefficients that describe aberrations in the object or within the wavefront source being measured.

Abstract: A wavefront measuring system and method for detecting phase aberrations in wavefronts that are reflected from, transmitted through or internally reflected within objects sought to be measured, e.g., optics systems, the human eye, etc. includes placing a reticle in the path of a return beam from the object, and placing a detector at a diffraction pattern self-imaging plane relative to the reticle. The diffraction pattern is analyzed and results in a model of the wavefront phase characteristics. A set of known polynomials is fitted to the wavefront phase gradient to obtain polynomial coefficients that describe aberrations in the object or within the wavefront source being measured.

Abstract: A wavefront measuring system and method for detecting phase aberrations in wavefronts that are reflected from, transmitted through or internally reflected within objects sought to be measured, e.g., optical systems, the human eye, etc. includes placing a reticle in the path of a return beam from the object, and placing a detector at a diffraction pattern self-imaging plane relative to the reticle. The diffraction pattern is analyzed and results in a model of the wavefront phase characteristics. A set of known polynomials is fitted to the wavefront phase gradient to obtain polynomial coefficients that describe aberrations in the object or within the wavefront source being measured.

Abstract: An ocular biometer utilizing a light emitting source (7) and corresponding optics to illuminate areas of the eye in order to analyze the wavefront of the reflected light. Aperture sharing elements, such as "hot mirrors" (4) are used to allow the eyes (1) to view the world, as the ocular biometer measures various characteristics of the eye such as the refractive (i.e., accommodative) state, the gaze angle and the pupil diameter at any instant of time and continuously. Optical wavefront conditioning and wavefront sensing techniques are used to determine the refractive power of the eye and the instantaneous accommodative state. Reflected light is projected through a reticle (26) or plurality of reticles (26, 28). Spatial characteristics of the resulting shadow pattern uniquely determine the characteristics of the eye. These shadow patterns can be measured directly or by causing a modulation of the lines with a second identical reticle placed appropriately between the first and the imaging plane.