Patents by Inventor Laurent S. Vesier

Laurent S. Vesier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resilient polishing pad for chemical mechanical polishing
    Patent number: 7101275
    Abstract: A resilient, laminated polishing pad for chemical mechanical polishing is disclosed. The polishing pad includes a base layer and a polishing layer bonded by a hot-melt adhesive. The hot-melt adhesive of the present invention provides a Tpeel strength for the polishing pad of at least greater than 40 Newtons at 305 mm/min, reducing pad delamination.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: September 5, 2006
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: John V. H. Roberts, Laurent S. Vesier