Patents by Inventor Lav Ivanovic

Lav Ivanovic has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040120578
    Abstract: A computer-implemented method is disclosed for recognizing edges in a digital image having a plurality of pixels with gray-scale values defining features. The method includes recognizing edges of the features by cearting a new image in which pixels in the new image corresponding to pixels in the gray-scale image that have a brightness value meeting a predetermined threshold are assigned a first binary value to represent edge regions, while remaining pixels in the new image are assigned a second value to represent both background and internal areas of the features. Area recognition is then performed to distinguish internal feature areas from background areas. The method further includes detecting edge lines from the edge regions that separate features from background and internal feature areas.
    Type: Application
    Filed: December 20, 2002
    Publication date: June 24, 2004
    Inventors: Mikhail Grinchuk, Lav Ivanovic, Paul Filseth
  • Publication number: 20040123265
    Abstract: A method and system for performing optical proximity correction (OPC) on an integrated circuit (IC) chip design is disclosed. The system and method of the present invention includes dividing the IC chip into a plurality of local task regions, identifying congruent local task regions, classifying congruent local task regions into corresponding groups, and performing OPC for each group of congruent local task regions.
    Type: Application
    Filed: December 20, 2002
    Publication date: June 24, 2004
    Inventors: Alexandre Andreev, Ivan Pavisic, Lav Ivanovic
  • Publication number: 20040102912
    Abstract: A method and system for automatically calibrating a masking process simulator are disclosed. The method and system include performing a masking process using a calibration mask and process parameters to produce a calibration pattern on a wafer. A digital image is created of the calibration pattern, and the edges of the pattern are detected from the digital image using pattern recognition. Data defining the calibration mask and the process parameters are then input to a process simulator to produce an alim image estimating the calibration pattern that would be produced by the masking process. The method and system further include overlaying the alim image and the detected edges of the digital image, and measuring a distance between contours of the pattern in the alim image and the detected edges.
    Type: Application
    Filed: November 26, 2002
    Publication date: May 27, 2004
    Inventors: Lav Ivanovic, Paul Filseth, Marlo Garza
  • Patent number: 6467067
    Abstract: A test signal is propagated through at least a portion of the circuit from a respective input. The test signal is based on a row of a k-wise, &egr;-discrepant matrix. Cells are identified whose outputs have a constant response to the test signal and the inputs of the identified cells are combined with the inputs of the circuit. The process is iteratively repeated until the output of the circuit is reached. The circuit inputs and inputs of identified cells are selected as test points.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: October 15, 2002
    Assignee: LSI Logic Corporation
    Inventors: Alexander E. Andreev, Ranko Scepanovic, Lav Ivanovic