Patents by Inventor Leo Kuipers

Leo Kuipers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050281638
    Abstract: A robot arm is presented, which inserts and removes an object from a conditioned environment using a carrier connected to the robot arm. The robot arm is positioned in a conditionable vessel, a wall of which vessel may deform when the interior is conditioned. Since the trajectory of the robot arm needs to be accurate, the robot arm is flexibly coupled to the vessel wall such that an orientation of the robot arm is independent from an orientation of the vessel wall. Further, a docking system is disclosed for use in a device comprising a robot arm having a carrier connected thereto.
    Type: Application
    Filed: May 24, 2004
    Publication date: December 22, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Leo Kuipers, Johannes Franssen
  • Publication number: 20050117794
    Abstract: A method to determine a rotation of a substrate with respect to the patterning device without using a reference mark on the substrate is presented. At least two structures having corresponding features and present on the substrate, e.g. previously projected patterns, are imaged with a known position with respect to a measurement coordinate system. A distance vector between the at least two structures is determined. From the distance vector, a rotation angle is calculated. In an embodiment of the invention, there is provided a method to estimate a position of the substrate from the acquired image(s). A position is measured and used as a reference position for subsequent substrates of which the rotation angle is to be determined.
    Type: Application
    Filed: September 8, 2004
    Publication date: June 2, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raimond Visser, Leo Kuipers
  • Publication number: 20050054217
    Abstract: A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.
    Type: Application
    Filed: March 11, 2004
    Publication date: March 10, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Albert Klomp, Jan Hoogkamp, Raimond Visser, Josephus Cornelius Vugts, Henricus Marie Vullings, Leo Kuipers, Johannes Franssen