Patents by Inventor Leonid M. Tertitski
Leonid M. Tertitski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110095007Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: ApplicationFiled: December 29, 2010Publication date: April 28, 2011Applicant: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
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Patent number: 7904821Abstract: An embodiment provides a method to change a graphical user interface in a way that supports runtime modification of an application's GUI without access to the application source code and/or needs no recompilation/restart of the application executable. This method allows the end-user to make runtime modifications of a widget's attributes and/or runtime conversion of widgets into different types of widgets.Type: GrantFiled: November 30, 2007Date of Patent: March 8, 2011Inventors: Leonid M. Tertitski, Andrei Ivanov
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Patent number: 7875829Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: November 20, 2006Date of Patent: January 25, 2011Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
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Patent number: 7872209Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: October 25, 2007Date of Patent: January 18, 2011Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
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Patent number: 7778533Abstract: During fabrication, a rotating semiconductor substrate is radiated in accordance with a thermal recipe. Temperature measurements of the semiconductor substrate are obtained along with the position of the semiconductor substrate at the time of each temperature measurement. It is then determined for the position of the semiconductor substrate whether at least one particular temperature measurement of the temperature measurements should be filtered. If so, at least one filtered temperature measurement is obtained. The radiation of the semiconductor substrate is subsequently controlled based on the temperature measurements, the at least one filtered temperature measurement, and the thermal recipe.Type: GrantFiled: September 12, 2002Date of Patent: August 17, 2010Assignee: Applied Materials, Inc.Inventors: Wolfgang R. Aderhold, Balasubramanian Ramachandran, Leonid M. Tertitski, Patrick F. Stone
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Publication number: 20100193154Abstract: Methods for cooling a substrate are provided herein. In some embodiments, a method for cooling a substrate includes heating a substrate in a process chamber from an introductory temperature to a peak temperature of greater than about 900 degrees Celsius; and cooling the substrate from within about 50 degrees Celsius of the peak temperature by moving the substrate at a rate of at least about 3 millimeters/second in a direction normal to an upper surface of the substrate. In some embodiments, cooling the substrate by moving the substrate further comprises moving the substrate to a first position having a first distance from an upper surface of the process chamber; and subsequently moving the substrate to a second position having a second distance that is further away from the upper surface than the first distance. In some embodiments, a residence time proximate the peak temperature is about 0.6 seconds or less.Type: ApplicationFiled: January 27, 2010Publication date: August 5, 2010Applicant: APPLIED MATERIALS, INC.Inventors: WOLFGANG R. ADERHOLD, LEONID M. TERTITSKI, AARON MUIR HUNTER, MARTIN TRAN
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Semiconductor thermal process control utilizing position oriented temperature generated thermal mask
Patent number: 7667162Abstract: During fabrication, a rotating semiconductor substrate is radiated in accordance with a thermal recipe. Temperature measurements of the semiconductor substrate are obtained along with the position of the semiconductor substrate at the time of each temperature measurement. It is then determined for the position of the semiconductor substrate whether at least one particular temperature measurement of the temperature measurements should be filtered. If so, at least one filtered temperature measurement is obtained. The radiation of the semiconductor substrate is subsequently controlled based on the temperature measurements, the at least one filtered temperature measurement, and the thermal recipe.Type: GrantFiled: April 11, 2005Date of Patent: February 23, 2010Assignee: Applied Materials, Inc.Inventors: Wolfgang R. Aderhold, Balasubramanian Ramachandran, Leonid M. Tertitski, Patrick F. Stone -
Patent number: 6987240Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: December 18, 2002Date of Patent: January 17, 2006Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
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Publication number: 20040052512Abstract: During fabrication, a rotating semiconductor substrate is radiated in accordance with a thermal recipe. Temperature measurements of the semiconductor substrate are obtained along with the position of the semiconductor substrate at the time of each temperature measurement. It is then determined for the position of the semiconductor substrate whether at least one particular temperature measurement of the temperature measurements should be filtered. If so, at least one filtered temperature measurement is obtained. The radiation of the semiconductor substrate is subsequently controlled based on the temperature measurements, the at least one filtered temperature measurement, and the thermal recipe.Type: ApplicationFiled: September 12, 2002Publication date: March 18, 2004Applicant: Applied Materials, Inc.Inventors: Wolfgang R. Aderhold, Balasubramanian Ramachandran, Leonid M. Tertitski, Patrick F. Stone
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Publication number: 20030196996Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: ApplicationFiled: December 18, 2002Publication date: October 23, 2003Applicant: APPLIED MATERIALS, INC.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin