Abstract: In a method, a media delivery server may receive indication information that indicates a man-machine interaction environment of a user corresponding to UE during a call service execution period and that is sent by the UE. Then, the media delivery server may determine, based on the indication information, whether to deliver media content to the UE during the call service execution period. Alternatively, after receiving the indication information, the media delivery server may determine to-be-delivered media content based on the indication information, and deliver the to-be-delivered media content to the UE during the call service execution period. The indication information can reflect the man-machine interaction environment of the user during the call service execution period.

Abstract: The present invention belongs to the medical field, and relates to novel ?-lactamase inhibitors, for the treatment of bacterial infections in combination with ?-lactam antibiotics, including infection caused by drug resistant organisms and especially multi-drug resistant organisms. The present invention includes compounds according to formula (I): or pharmaceutically acceptable salts thereof, wherein M and R are as defined herein.

Abstract: A display panel includes an array substrate having a first substrate, a gate line, a data line, and a thin film transistor (TFT); and a plurality of sub-pixel regions defined by the gate and data lines; and an opposite substrate including a second substrate, a plurality of additional electrodes arranged on a side of the second substrate facing the array substrate; at least one sub-pixel region including at least one of: a first overlap region at an intersection region by the gate and data lines, a second overlap region between the TFT gate and source electrodes, or a third overlap region between the TFT gate and drain electrodes; and an orthographic projection of the additional electrodes on the first substrate substantially overlaps with orthographic projections of at least one of the first, second, or third overlap regions on the first substrate.

Abstract: A display panel includes an array substrate having a first substrate, a gate line, a data line, and a thin film transistor (TFT); and a plurality of sub-pixel regions defined by the gate and data lines; and an opposite substrate including a second substrate, a plurality of additional electrodes arranged on a side of the second substrate facing the array substrate; at least one sub-pixel region including at least one of: a first overlap region at an intersection region by the gate and data lines, a second overlap region between the TFT gate and source electrodes, or a third overlap region between the TFT gate and drain electrodes; and an orthographic projection of the additional electrodes on the first substrate substantially overlaps with orthographic projections of at least one of the first, second, or third overlap regions on the first substrate.

Abstract: An array substrate and a manufacturing method thereof are provided. The array substrate includes a display area (02) and a fan-out area (01) disposed at the periphery of the display area (02), the manufacturing method comprising forming a line pattern (212) disposed in at least one of the display area (02) and the fan-out area (01), wherein forming a line pattern disposed in at least one of the display area and the fan-out area includes the following steps: forming a metal layer (210); forming an intermediate pattern (211) by performing a first patterning process on the metal layer; and forming the line pattern disposed in at least one of the display area (02) and the fan-out area (01) by performing a second patterning process on the intermediate pattern.

Abstract: An array substrate and a manufacturing method thereof are provided. The array substrate includes a display area (02) and a fan-out area (01) disposed at the periphery of the display area (02), the manufacturing method comprising forming a line pattern (212) disposed in at least one of the display area (02) and the fan-out area (01), wherein forming a line pattern disposed in at least one of the display area and the fan-out area includes the following steps: forming a metal layer (210); forming an intermediate pattern (211) by performing a first patterning process on the metal layer; and forming the line pattern disposed in at least one of the display area (02) and the fan-out area (01) by performing a second patterning process on the intermediate pattern.

Abstract: This invention relates to a supported nonmetallocene catalyst and preparation thereof. The supported nonmetallocene catalyst can be produced with a simple and feasible process and is characterized by an easily controllable polymerization activity. This invention further relates to use of the supported nonmetallocene catalyst in olefin homopolymerization/copolymerization, which is characterized by a lowered assumption of the co-catalyst as compared with the prior art.

Abstract: This invention relates to a supported nonmetallocene catalyst and preparation thereof. The supported nonmetallocene catalyst can be produced with a simple and feasible process and is characterized by an easily controllable polymerization activity. This invention further relates to use of the supported nonmetallocene catalyst in olefin homopolymerization/copolymerization, which is characterized by a lowered assumption of the co-catalyst as compared with the prior art.

Abstract: This invention relates to a supported nonmetallocene catalyst and preparation thereof. The supported nonmetallocene catalyst can be produced with a simple and feasible process and is characterized by an easily controllable polymerization activity. This invention further relates to use of the supported nonmetallocene catalyst in olefin homopolymerization/copolymerization, which is characterized by a lowered assumption of the co-catalyst as compared with the prior art.

Abstract: This invention relates to a supported nonmetallocene catalyst and preparation thereof. The supported nonmetallocene catalyst can be produced with a simple and feasible process and is characterized by an easily controllable polymerization activity. This invention further relates to use of the supported nonmetallocene catalyst in olefin homopolymerization/copolymerization, which is characterized by a lowered assumption of the co-catalyst as compared with the prior art.