Patents by Inventor Lingjie Guo

Lingjie Guo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240091263
    Abstract: The present disclosure provides a chimeric antigen receptor (CAR) specific for albumin. The present disclosure also provides compositions comprising the CAR, polynucleotides encoding the CAR, vectors comprising a polynucleotide encoding the CAR, engineered cells comprising the CAR, and method using the same.
    Type: Application
    Filed: October 2, 2023
    Publication date: March 21, 2024
    Inventors: Lingjie KONG, Gong CHEN, Jean WANG, Tianwei GUO, Shicheng ZHU
  • Publication number: 20070196589
    Abstract: A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.
    Type: Application
    Filed: June 1, 2005
    Publication date: August 23, 2007
    Applicants: DOW CORNING CORPORATION, THE REGENTS OF THE UNIVERSITY OF MICHIGAN
    Inventors: Peng Fu, Lingjie Guo, Xing Cheng
  • Publication number: 20070122749
    Abstract: A method of nanopatterning includes the steps of providing a resist film (12) and forming a pattern in the resist film (12). The resist film (12) includes a copolymer consisting of an organosilicone component and an organic component. An article (10) includes a substrate (14) and the resist film (12) disposed on the substrate (14). The copolymer of the organosilicone component and the organic component is sufficiently elastic, due to the presence of the organosilicone component, to be capable of resisting fracture and delamination during mold release. Furthermore, during pattern formation, the copolymer develops relatively low surface energy at an interface with the surface of a mold, as compared to conventional polymeric materials, and preferentially adheres to the substrate (14) rather than the mold, which provides for relatively easy mold release. The presence of the organosilicone component in the copolymer also allows the resist film (12) to exhibit excellent resistance to oxygen plasma etching.
    Type: Application
    Filed: November 30, 2005
    Publication date: May 31, 2007
    Inventors: Peng Fu, Lingjie Guo
  • Publication number: 20070059497
    Abstract: The present invention relates to a method for imprinting a micro-/nano-structure on a substrate, the method comprising (a) providing a mold containing a desired pattern or relief for a microstructure; (b) applying a polymer coating to the mold; and (c) transferring the polymer coating from the mold to a substrate under suitable temperature and pressure conditions to form an imprinted substrate having a desired micro-/nano-structure thereon.
    Type: Application
    Filed: May 8, 2002
    Publication date: March 15, 2007
    Inventors: Xudong Huang, Li-Rong Bao, Xing Cheng, Lingjie Guo, Stella Pang
  • Publication number: 20060237881
    Abstract: A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a mask member positioned generally adjacent the resist layer. Radiation energy is then transmitted through the mold and into the resist layer; however, the mask member substantially prevents transmission of the radiation energy therethrough, thereby defining an unexposed area in the resist layer. Once the mold is removed from the substrate, which consequently forms a first feature from nanoimprinting, the unexposed area of resist layer is removed through dissolving in a developer solution.
    Type: Application
    Filed: February 13, 2004
    Publication date: October 26, 2006
    Inventors: Lingjie Guo, Xing Cheng
  • Publication number: 20060194252
    Abstract: A support for immobilizing target molecules comprises a substrate having a plurality of binding regions for binding select target molecules, with target-molecule-capturing agent immobilized at the binding regions. The binding regions are intersperse among other non-binding regions. The binding regions are of sub-micron size, have high selectivity and high binding capacity, and prevent or at least minimize loss of target molecule activity.
    Type: Application
    Filed: February 25, 2005
    Publication date: August 31, 2006
    Applicant: The Regents of the University of Michigan
    Inventors: Alan Hunt, Lingjie Guo, Jeremy Hoff, Li-Jing Cheng, Edgar Meyhofer
  • Publication number: 20060170931
    Abstract: A biochemical sensor. The biochemical sensor includes a microcavity resonator including a sensing element defining a closed loop waveguide. The biochemical sensor is operable to detect a measurand by measuring a resonance shift in the microcavity resonator.
    Type: Application
    Filed: February 13, 2006
    Publication date: August 3, 2006
    Applicant: The Regents of the University of Michigan
    Inventors: Lingjie Guo, Chung-Yen Chao
  • Publication number: 20060062523
    Abstract: A polymer micro-ring resonator and a method of manufacturing the same that is capable of providing reduced surface roughness and improved submicron gap separation between a waveguide and a micro-ring. The microresonator includes a waveguide and an optical resonator optically coupled to the waveguide. The optical resonator includes a core and a cladding surrounding at least a portion of the core, wherein the cladding is a fluid.
    Type: Application
    Filed: September 19, 2005
    Publication date: March 23, 2006
    Inventors: Lingjie Guo, Chung-Yen Chao
  • Patent number: 6069380
    Abstract: A Single Electron MOS Memory (SEMM), in which one bit of information is represented by storing only one electron, has been demonstrated at room temperature. The SEMM is a floating gate Metal-Oxide-Semiconductor (MOS) transistor in silicon with a channel width (about 10 nanometers) which is smaller than the Debye screening length of a single electron stored on the floating gate, and a nanoscale polysilicon dot (about 7 nanometers by 7 nanometers by 2 nanometers) as the floating gate which is positioned between the channel and the control gate. An electron stored on the floating gate can screen the entire channel from the potential on the control gate, and lead to: (i) a discrete shift in the threshold voltage; (ii) a staircase relation between the charging voltage and the shift; and (iii) a self-limiting charging process. The structure and fabrication of the SEMM is well adapted to the manufacture of ultra large-scale integrated circuits.
    Type: Grant
    Filed: July 25, 1997
    Date of Patent: May 30, 2000
    Assignee: Regents of the University of Minnesota
    Inventors: Stephen Y. Chou, Lingjie Guo, Effendi Leobandung