Patents by Inventor Liuhe Li

Liuhe Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120279449
    Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.
    Type: Application
    Filed: February 16, 2012
    Publication date: November 8, 2012
    Inventors: Paul K. Chu, Liuhe Li
  • Patent number: 8119208
    Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.
    Type: Grant
    Filed: April 18, 2008
    Date of Patent: February 21, 2012
    Assignee: City University of Hong Kong
    Inventors: Paul K. Chu, Liuhe Li
  • Patent number: 7741621
    Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: June 22, 2010
    Assignee: City University of Hong Kong
    Inventors: Paul K. Chu, Liuhe Li
  • Publication number: 20080193666
    Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.
    Type: Application
    Filed: April 18, 2008
    Publication date: August 14, 2008
    Applicant: CITY UNIVERSITY OF HONG KONG
    Inventors: Paul K. CHU, Liuhe LI
  • Publication number: 20060013964
    Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.
    Type: Application
    Filed: July 14, 2004
    Publication date: January 19, 2006
    Applicant: City University of Hong Kong
    Inventors: Paul Chu, Liuhe Li
  • Patent number: 6740843
    Abstract: An apparatus and method are disclosed whereby if the arc in a DC or long-pulse AC vacuum arc plasma process (eg in vacuum deposition) starts to extinguish, this is automatically detected and a re-ignition process is activated. Detection of a tendency for the arc to extinguish is detected by monitoring the main power supply voltage, which will increase if the arc is extinguished.
    Type: Grant
    Filed: September 12, 2002
    Date of Patent: May 25, 2004
    Assignee: City University of Hong Kong
    Inventors: Paul K. Chu, Liuhe Li
  • Publication number: 20030226827
    Abstract: An apparatus and method are disclosed whereby if the arc in a DC or long-pulse AC vacuum arc plasma process (eg in vacuum deposition) starts to extinguish, this is automatically detected and a re-ignition process is activated. Detection of a tendency for the arc to extinguish is detected by monitoring the main power supply voltage, which will increase if the arc is extinguished.
    Type: Application
    Filed: September 12, 2002
    Publication date: December 11, 2003
    Applicant: City University of Hong Kong
    Inventors: Paul K. Chu, Liuhe Li