Abstract: The present disclosure discloses a pixel structure, a manufacturing method thereof, and a display device. The pixel structure includes a base layer, a first metal layer, an insulating layer, and a second metal layer. The first metal layer includes a plurality of first functional wires spaced apart from each other, and the second metal layer includes a plurality of second functional wires spaced apart from each other, wherein at least one of the second functional wire crosses at least two of the first functional wires, and at least one edge of the at least two first functional wires is defined with a space gap.

Abstract: The invention provides an array substrate and manufacturing method thereof.

Abstract: The invention provides an array substrate and manufacturing method thereof. The array substrate comprises: a substrate; a plurality of data lines and scan lines disposed on one side of the substrate, the data lines and the scan lines defining a plurality of sub-pixel areas, the data lines and the scan lines being mutually insulated; a color-resist layer disposed on the same side of the substrate with the data lines and the scan lines, the color-resist layer comprising a plurality of color-resists, and two adjacent color-resists having an overlapping area corresponding to the data line area; a DBS common electrode wire disposed on a side of the overlapping area of the color-resist layer away from the substrate to shield the data line, and uniform slits disposed at an edge of the DBS common electrode wire in parallel with direction of the scan line.

Abstract: A method for manufacturing the top-gated thin film transistors is disclosed and includes forming a first photoresist pattern with a first shielding portion and two second shielding portions, and etching a gate metal layer by adopting the first photoresist pattern as a mask. Thus, a size of the gate pattern coincides with a size of a channel region of a conductive channel, to increase a control force of a gate to the conductive channel, thereby improving performance of device.

Abstract: A method for manufacturing the top-gated thin film transistors is disclosed and includes forming a first photoresist pattern with a first shielding portion and two second shielding portions, and etching a gate metal layer by adopting the first photoresist pattern as a mask. Thus, a size of the gate pattern coincides with a size of a channel region of a conductive channel, to increase a control force of a gate to the conductive channel, thereby improving performance of device.

Abstract: A thin film transistor array substrate, a manufacturing method thereof and a liquid crystal display using the same are provided. The array substrate includes an array substrate base, a thin film transistor (TFT) array layer, a color filter layer, a pixel electrode passivation layer, a pixel electrode connected with the TFT array layer through a via hole, and a patterned recessed microstructure disposed on a surface of the color filter layer. Thus, the patterned recessed microstructure is formed on the surface of the color filter layer through a mask forming the via hole without increasing the manufacturing cost, so that the volatiles generated by the process of the color resist and the subsequent high temperature process of the pixel electrode passivation layer are completely released to avoid gas residues, eliminate the possibility of bubbles in products in later period, and improve the quality of the product.

Abstract: A liquid crystal panel includes a first substrate, a TFT layer located on the first substrate, a color resist layer located on the TFT layer, a photospacer layer located on the color resist layer, a protective layer located on the color resist layer and the photospacer layer, a via hole penetrating the color resist layer and the protective layer, a pixel electrode layer formed on the protective layer and electrically connected to the TFT layer with the via hole and a second substrate oppositely located to the first substrate, and one or more color resist material in the photospacer layer and the color resist layer are the same, and the photospacer layer and the color resist layer are formed at the same time during a manufacture process.

Abstract: The present disclosure proposes a liquid crystal display (LCD) panel. The LCD panel includes a first glass substrate, a second glass substrate, a semiconductor active layer, a source, a drain, a second dielectric layer, and a color filter layer. A third conductive layer and constructive pads are positioned on a connection region between two resistor layers among the plurality of red color resistor layers, the green color resistor layers, and the blue color resistor layers. The third conductive layer covers top surfaces of the constructive pads and the connection region. The present disclosure avoids the bubble problem and reduces the manufacturing process for manufacturing the LCD panels.

Abstract: A method for manufacturing an array substrate is provided. The array substrate, by providing a black matrix and a color resist layer on the array substrate and providing the color resist layer on the TFT layer, prevents bad influences on the color resist layer caused by a high temperature TFT process so as to provide a liquid crystal panel with improved displaying quality. The method includes, firstly, forming a black matrix on a substrate, and secondly, implementing a TFT manufacture process on the black matrix, and then forming a color resist layer after the TFT manufacture process. Accordingly, forming both the black matrix and the color resist layer on the array substrate can be achieved, where the color resist layer is formed after the TFT manufacture process to prevent bad phenomenon caused by the high temperature of the TFT process.

Abstract: A method for manufacturing an array substrate is provided. The array substrate, by providing a black matrix and a color resist layer on the array substrate and providing the color resist layer on the TFT layer, prevents bad influences on the color resist layer caused by a high temperature TFT process so as to provide a liquid crystal panel with improved displaying quality. The method includes, firstly, forming a black matrix on a substrate, and secondly, implementing a TFT manufacture process on the black matrix, and then forming a color resist layer after the TFT manufacture process. Accordingly, forming both the black matrix and the color resist layer on the array substrate can be achieved, where the color resist layer is formed after the TFT manufacture process to prevent bad phenomenon caused by the high temperature of the TFT process.

Abstract: A COA type liquid crystal display panel and a method for manufacturing the same are disclosed. The photoresist layer comprises a white, a red, a green, and a blue photoresist. The spacer layer is formed with at least one color of photoresists at the same time, and the material is the same. The photo spacer layer using photoresist as material of the prior art is eliminated. Thus the production requires less time and the efficiency is higher. The method comprises forming a photoresist layer composed of a white, a red, a green, and a blue photoresist on the TFT layer, and forming a spacer layer at the same time when forming the corresponding photoresist using at least one color of photoresist material. The manufacture process for making the photo spacer layer of the prior art is eliminated to save the mask, shorten the production time and increase the production efficiency.

Abstract: The present invention provides an array substrate and a manufacture method thereof. The array substrate, by locating both a black matrix and a color resist layer on the array substrate, and locating the color resist layer on the TFT layer prevents the bad influence to the color resist layer from the high temperature TFT process, and accordingly to make the liquid crystal panel with higher display quality. The manufacture method of the array substrate, first forms a black matrix on the substrate, and second implements TFT manufacture process on the black matrix, and then forms a color resist layer after the TFT manufacture.

Abstract: A COA type liquid crystal display panel and a method for manufacturing the same are disclosed. The photoresist layer comprises a white, a red, a green, and a blue photoresist. The spacer layer is formed with at least one color of photoresists at the same time, and the material is the same. The photo spacer layer using photoresist as material of the prior art is eliminated. Thus the production requires less time and the efficiency is higher. The method comprises forming a photoresist layer composed of a white, a red, a green, and a blue photoresist on the TFT layer, and forming a spacer layer at the same time when forming the corresponding photoresist using at least one color of photoresist material. The manufacture process for making the photo spacer layer of the prior art is eliminated to save the mask, shorten the production time and increase the production efficiency.

Abstract: The present invention provides a liquid crystal panel and a manufacture method thereof. The liquid crystal panel comprises: a first substrate (1), a TFT layer (2) located on the first substrate (1), a color resist layer (3) located on the TFT layer (2), a photospacer layer (4) located on the color resist layer (3), a protective layer (5) located on the color resist layer (3) and the photospacer layer (4), a via hole (6) penetrating the color resist layer (3) and the protective layer (5), a pixel electrode layer (7) formed on the protective layer (5) and electrically connected to the TFT layer (2) with the via hole (6) and a second substrate (8) oppositely located to the first substrate (1), and one or more color resist material in the photospacer layer (4) and the color resist layer (3) are the same, and the photospacer layer (4) and the color resist layer (3) are formed at the same time during a manufacture process.

Abstract: A liquid crystal panel includes a first substrate, a TFT layer located on the first substrate, a color resist layer located on the TFT layer, a photospacer layer located on the color resist layer, a protective layer located on the color resist layer and the photospacer layer, a via hole penetrating the color resist layer and the protective layer, a pixel electrode layer formed on the protective layer and electrically connected to the TFT layer with the via hole and a second substrate oppositely located to the first substrate, and one or more color resist material in the photospacer layer and the color resist layer are the same, and the photospacer layer and the color resist layer are formed at the same time during a manufacture process.

Abstract: The present invention provides an array substrate and a manufacture method thereof. The array substrate, by locating both a black matrix and a color resist layer on the array substrate, and locating the color resist layer on the TFT layer prevents the bad influence to the color resist layer from the high temperature TFT process, and accordingly to make the liquid crystal panel with higher display quality. The manufacture method of the array substrate, first forms a black matrix on the substrate, and second implements TFT manufacture process on the black matrix, and then forms a color resist layer after the TFT manufacture.

Abstract: The present invention provides a liquid crystal panel and a manufacture method thereof. The liquid crystal panel comprises: a first substrate (1), a TFT layer (2) located on the first substrate (1), a color resist layer (3) located on the TFT layer (2), a photospacer layer (4) located on the color resist layer (3), a protective layer (5) located on the color resist layer (3) and the photospacer layer (4), a via hole (6) penetrating the color resist layer (3) and the protective layer (5), a pixel electrode layer (7) formed on the protective layer (5) and electrically connected to the TFT layer (2) with the via hole (6) and a second substrate (8) oppositely located to the first substrate (1), and one or more color resist material in the photospacer layer (4) and the color resist layer (3) are the same, and the photospacer layer (4) and the color resist layer (3) are formed at the same time during a manufacture process.

Abstract: A color filter on array (COA) substrate and a manufacturing method thereof are provided. The method comprises: forming a first metal layer, a gate insulation layer, an active layer, an ohmic contact layer, a second metal layer, a first passivation layer, a color resist layer, a second passivation layer, a through hole, and a transparent conductive layer on a substrate in order; and forming a spacer and/or a black matrix on a surface of the COA substrate, and filling a material of the spacer or an organic material of the black matrix into the through hole.