Patents by Inventor Liyuan Bao

Liyuan Bao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for cleaning deposition chamber parts using selective spray etch
    Patent number: 8691023
    Abstract: In one aspect, a method of cleaning an electronic device manufacturing process chamber part is provided, including a) spraying the part with an acid; b) spraying the part with DI water; and c) treating the part with potassium hydroxide. Other aspects are provided.
    Type: Grant
    Filed: August 14, 2012
    Date of Patent: April 8, 2014
    Assignee: Quantum Global Technologies, LLP
    Inventors: Liyuan Bao, Samantha S. H. Tan, Anbei Jiang
  • Non destructive selective deposition removal of non-metallic deposits from aluminum containing substrates
    Patent number: 8398779
    Abstract: Non-metallic deposits are selectively removed from aluminum containing substrates such as aluminum faceplates using a selective deposition removal (SDR) solution. The SDR solution does not substantially etch the faceplate holes, thereby preserving the hole diameter integrity and increasing the number of times the faceplate may be cleaned or refurbished while remaining within processing hole diameter tolerances. In an embodiment, the SDR solution comprises, in wt % of the solution, 15.5%+/?2% HF or buffered HF acid, 3.8%+/?0.5% NH4F pH buffer, 59.7%+/?5% ethylene glycol, and the balance H2O.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: March 19, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Liyuan Bao, Anbei Jiang, Sio On Lo, Yukari Nishimura, Joseph F. Sommers, Samantha S. H. Tan
  • METHODS AND APPARATUS FOR CLEANING DEPOSITION CHAMBER PARTS USING SELECTIVE SPRAY ETCH
    Publication number: 20130037062
    Abstract: In one aspect, a method of cleaning an electronic device manufacturing process chamber part is provided, including a) spraying the part with an acid; b) spraying the part with DI water; and c) treating the part with potassium hydroxide. Other aspects are provided.
    Type: Application
    Filed: August 14, 2012
    Publication date: February 14, 2013
    Applicant: Quantum Global Technologies, LLC
    Inventors: Liyuan Bao, Smantha S.H. Tan, Anbei Jiang
  • NON DESTRUCTIVE SELECTIVE DEPOSITION REMOVAL OF NON-METALLIC DEPOSITS FROM ALUMINUM CONTAINING SUBSTRATES
    Publication number: 20100218788
    Abstract: Non-metallic deposits are selectively removed from aluminum containing substrates such as aluminum faceplates using a selective deposition removal (SDR) solution. The SDR solution does not substantially etch the faceplate holes, thereby preserving the hole diameter integrity and increasing the number of times the faceplate may be cleaned or refurbished while remaining within processing hole diameter tolerances. In an embodiment, the SDR solution comprises, in wt % of the solution, 15.5%+/?2% HF or buffered HF acid, 3.8%+/?0.5% NH4F pH buffer, 59.7%+/?5% ethylene glycol, and the balance H2O.
    Type: Application
    Filed: February 19, 2010
    Publication date: September 2, 2010
    Inventors: Liyuan Bao, Anbei Jiang, Sio On Lo, Yukari Nishimura, Joseph F. Sommers, Samantha S.H. Tan
  • METHODS AND APPARATUS FOR CLEANING DEPOSITION CHAMBER PARTS USING SELECTIVE SPRAY ETCH
    Publication number: 20090000641
    Abstract: In one aspect, a method of cleaning an electronic device manufacturing process chamber part is provided, including a) spraying the part with an acid; b) spraying the part with DI water; and c) treating the part with potassium hydroxide. Other aspects are provided.
    Type: Application
    Filed: June 26, 2008
    Publication date: January 1, 2009
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Liyuan Bao, Ken Mun Loo, Samantha S.H. Tan