Patents by Inventor lnyong KANG

lnyong KANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR INSPECTING A RETICLE, A METHOD FOR MANUFACTURING A RETICLE, AND A METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20210033958
    Abstract: A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer.
    Type: Application
    Filed: February 25, 2020
    Publication date: February 4, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Seulgi KIM, Hyonseok SONG, lnyong KANG, Kangwon LEE, JuHyoung LEE, Eunsik JANG