Patents by Inventor Loc Vinh Tran

Loc Vinh Tran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • GAS DISTRIBUTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME
    Publication number: 20230313377
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas distribution system coupled to a reaction chamber.
    Type: Application
    Filed: June 8, 2023
    Publication date: October 5, 2023
    Inventors: Sonti Sreeram, Junwei Su, Loc Vinh Tran
  • Gas distribution system and reactor system including same
    Patent number: 11718913
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas distribution system coupled to a reaction chamber.
    Type: Grant
    Filed: June 4, 2018
    Date of Patent: August 8, 2023
    Assignee: ASM IP Holding B.V.
    Inventors: Sonti Sreeram, Junwei Su, Loc Vinh Tran
  • SYSTEMS AND METHODS FOR PURGING REACTOR LOWER CHAMBERS WITH ETCHANTS DURING FILM DEPOSITION
    Publication number: 20230116427
    Abstract: A semiconductor processing system includes a gas delivery module, and a chamber body connected to the gas delivery module. The divider has an aperture, is fixed within an interior of the chamber body, and separates an interior of the chamber body into upper and lower chambers, the aperture fluidly coupling the lower chamber to the upper chamber. A susceptor is arranged within the aperture. A controller is operably connected to the gas delivery module to purge the lower chamber with a first purge flow including an etchant while etching the upper chamber, purge the lower chamber with a second purge flow including the etchant while depositing a precoat in the upper chamber, and purge the lower chamber with a third purge flow including the etchant while depositing a film onto a substrate in the upper chamber. Film deposition methods and lower chamber etchant purge kits are also described.
    Type: Application
    Filed: October 7, 2022
    Publication date: April 13, 2023
    Inventors: Junwei Su, Jiwen Xiang, Shujin Huang, Loc Vinh Tran, Wentao Wang, Xing Lin
  • GAS DISTRIBUTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME
    Publication number: 20190368041
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas distribution system coupled to a reaction chamber.
    Type: Application
    Filed: June 4, 2018
    Publication date: December 5, 2019
    Inventors: Sonti Sreeram, Junwei Su, Loc Vinh Tran