Abstract: A process for forming a resistor whose dimensions can be accurately determined by a photoimaging process, thereby yielding a resistor whose size and resistance value render the resistor a viable alternative to discrete chip resistors. The resistor is formed of a photoimageable resistive thick-film material that enables the dimensions of a resistor to be determined directly by photodefinition instead of conventional screen printing. Electrically-conductive terminations are provided that determine the electrical length of the resistor. The terminations may be formed prior to depositing the resistive layer, or after the resistive layer has been photoimaged and developed. If the latter approach is used, the terminations may be formed by depositing a photoimageable layer on the resistor, photoimaging and developing the photoimageable layer so as to form openings that expose regions of the resistor, and then plating, e.g.