Patents by Inventor Long Bian

Long Bian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9111931
    Abstract: A method of forming an interconnect structure with high process margin. The present invention provides higher aligning margin for the connection of via parts and line parts. The method for forming the interconnect structure includes the steps of: forming a first mask layer with a plurality of first openings over the first insulating layer; forming a second insulating layer over the mask layer; forming a second mask layer with a plurality of second openings over the second insulating layer; performing an etching process by using the second mask layer to form a plurality of cavities penetrating through the second insulating layer, the first mask layer, and the first insulating layer; and filling the plurality of cavities with at least one conductive material.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: August 18, 2015
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventor: Zai Long Bian
  • Publication number: 20150206836
    Abstract: A method of forming an interconnect structure with high process margin. The present invention provides higher aligning margin for the connection of via parts and line parts. The method for forming the interconnect structure includes the steps of: forming a first mask layer with a plurality of first openings over the first insulating layer; forming a second insulating layer over the mask layer; forming a second mask layer with a plurality of second openings over the second insulating layer; performing an etching process by using the second mask layer to form a plurality of cavities penetrating through the second insulating layer, the first mask layer, and the first insulating layer; and filling the plurality of cavities with at least one conductive material.
    Type: Application
    Filed: January 22, 2014
    Publication date: July 23, 2015
    Applicant: NANYA TECHNOLOGY CORPORATION
    Inventor: ZAI LONG BIAN
  • Publication number: 20070285537
    Abstract: A system for the automated analysis of image quality obtained by a camera in a camera tunnel system includes a test pattern on an item for placement in the camera tunnel system and an imaging subsystem configured to capture an image of the item using the camera tunnel system, wherein the image includes an image of the test pattern. The system further includes an image analysis tool configured to automatically identify and analyze the image of the test pattern for generating one or more image quality metrics.
    Type: Application
    Filed: April 20, 2007
    Publication date: December 13, 2007
    Inventors: John Dwinell, Long Bian
  • Publication number: 20070237356
    Abstract: A parcel imaging system includes means for transporting parcels and image sensors oriented to image the parcels. An image construction subsystem is configured to stitch together outputs of the image sensors to produce at least one two-dimensional images of a parcel, and to construct, using the at least one two-dimensional image, at least one displayable three-dimensional image of the parcel.
    Type: Application
    Filed: April 4, 2007
    Publication date: October 11, 2007
    Inventors: John Dwinell, Long Bian