Abstract: The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising: a step of depositing the or each functional layer, then a step of depositing a sacrificial layer on said at least one functional layer, then a step of heat treatment by means of radiation chosen from laser radiation or radiation from at least one flash lamp, said radiation having at least one treatment wavelength between 200 and 2500 nm, said sacrificial layer being in contact with the air during this heat treatment step, then a step of removing the sacrificial layer using a solvent, said sacrificial layer being a monolayer and being such that, before heat treatment, it absorbs at least one part of said radiation at said at least one treatment wavelength and that, after heat treatment, it is capable of being removed by dissolution and/or dispersion in said solvent.

Abstract: A process for obtaining an item including a substrate made of glass or glass ceramic coated on at least one portion of at least one of its faces with a stack of thin-layers including no silver layers and including at least one thin layer of a transparent electrically conductive oxide, the process including: a step of depositing the stack, in which step the thin layer of a transparent electrically conductive oxide and at least one thin homogenizing layer are deposited, the thin homogenizing layer being a metal layer or a layer based on a metal nitride other than aluminum nitride, or a layer based on metal carbide; then a heat treatment step in which the stack is exposed to radiation.

Abstract: A substrate is coated on one face with a thin-films stack having reflection properties in the infrared and/or in solar radiation including at least one metallic functional layer, based on silver or on a metal alloy containing silver, and at least two antireflection coatings. The coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflection coatings. The stack also includes a terminal layer which is the layer of the stack which is furthest from the face. The terminal layer is a metallic layer consisting of zinc and tin, made of SnxZny with a ratio of 0.1?x/y?2.4 and having a physical thickness of between 0.5 nm and 5.0 nm excluding these values, or even between 0.6 nm and 2.7 nm excluding these values.

Abstract: The present invention relates to a laser device for annealing coatings deposited on large-width substrates, said device being formed from a plurality of laser modules that may be juxtaposed without particular limitation, wherein the laser modules generate elementary laser lines that combine with one another in the length direction to form a single laser line, each elementary line having an overlap in the length direction with one or two adjacent elementary laser lines; and at least two adjacent elementary laser lines have an offset with respect to one another in the width direction, said offset being smaller than half the sum of the widths of said at least two adjacent elementary laser lines; the overlap of said at least two adjacent elementary laser lines is such that, in the absence of offset, the power-per-unit-length profile of the single laser line has a local maximum level with the zone of overlap.

Abstract: The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising: a step of depositing the or each functional layer, then a step of depositing a sacrificial layer on said at least one functional layer, then a step of heat treatment by means of radiation chosen from laser radiation or radiation from at least one flash lamp, said radiation having at least one treatment wavelength between 200 and 2500 nm, said sacrificial layer being in contact with the air during this heat treatment step, then a step of removing the sacrificial layer using a solvent, said sacrificial layer being a monolayer and being such that, before heat treatment, it absorbs at least one part of said radiation at said at least one treatment wavelength and that, after heat treatment, it is capable of being removed by dissolution and/or dispersion in said solvent.

Abstract: A process that anneals a surface of a substrate bearing a coating includes running the substrate under a flash lamp emitting intense pulsed light and irradiating the coating with the pulsed light through a mask located between the flash lamp and the coating. A frequency of the flash lamp and a run speed of the substrate are adjusted so that each point of the coating to be annealed receives at least one light pulse. A distance between a lower face of the mask and the surface of the coating to be annealed is at most equal to 1 mm. A shape and extent of a slit in the mask are such that the mask occults the coating to be annealed in all zones where the light intensity that, in an absence of the mask, would arrive at the coating to be annealed is lower than a threshold light intensity.

Abstract: A substrate is coated on one face with a thin-films stack having reflection properties in the infrared and/or in solar radiation including at least one metallic functional layer, based on silver or on a metal alloy containing silver, and at least two antireflection coatings. The coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflection coatings. The stack also includes a terminal layer which is the layer of the stack which is furthest from the face. The terminal layer is a metallic layer consisting of zinc and tin, made of SnxZny with a ratio of 0.1?x/y?2.4 and having a physical thickness of between 0.5 nm and 5.0 nm excluding these values, or even between 0.6 nm and 2.7 nm excluding these values.

Abstract: A process for obtaining an item including a substrate made of glass or glass ceramic coated on at least one portion of at least one of its faces with a stack of thin-layers including no silver layers and including at least one thin layer of a transparent electrically conductive oxide, the process including: a step of depositing the stack, in which step the thin layer of a transparent electrically conductive oxide and at least one thin homogenizing layer are deposited, the thin homogenizing layer being a metal layer or a layer based on a metal nitride other than aluminum nitride, or a layer based on metal carbide; then a heat treatment step in which the stack is exposed to radiation.

Abstract: The invention relates to a device for measuring the concentration of a molecule, such as CO, NO or NO2, in a gaseous atmosphere at a temperature above 1200° C. in a chamber, said molecule having an absorption line at a wavelength between 4 and 8 ?m, said device comprising an emitter that emits laser radiation with a wavelength corresponding to that of the absorption line, said emitter emitting the laser radiation through a first window and then through said atmosphere, said window being made of a solid material having, for a material thickness of 1 mm, a transmittance greater than 50% at the wavelength of the laser radiation, the laser radiation being analyzed after having passed through said atmosphere by an analyzer that determines the absorption of the laser radiation by the molecule in the gaseous atmosphere, the window being placed on or in a wall of the chamber, where appropriate via an insert, in order to prevent the hot atmosphere of the chamber escaping therefrom.

Abstract: A process for the heat treatment of a coating deposited on at least one portion of a first face of a substrate including a first face and a second face opposite the first face, wherein the coating is treated by a laser radiation focused on the coating in the form of a laser line extending along a first direction, the heat treatment being such that, in a second direction transverse to the first direction, a relative displacement movement is created between the substrate and the laser line, wherein the second face is heated locally at a temperature of at least 30° C. in an additional heating zone extending facing the laser line over a length of at least 10 cm along the second direction, with the aid of at least one additional heater positioned on the side opposite the laser line with respect to the substrate.

Abstract: The invention relates to a device for measuring the concentration of a molecule, such as CO, NO or NO2, in a gaseous atmosphere at a temperature above 1200° C. in a chamber, said molecule having an absorption line at a wavelength between 4 and 8 ?m, said device comprising an emitter that emits laser radiation with a wavelength corresponding to that of the absorption line, said emitter emitting the laser radiation through a first window and then through said atmosphere, said window being made of a solid material having, for a material thickness of 1 mm, a transmittance greater than 50% at the wavelength of the laser radiation, the laser radiation being analyzed after having passed through said atmosphere by an analyzer that determines the absorption of the laser radiation by the molecule in the gaseous atmosphere, the window being placed on or in a wall of the chamber, where appropriate via an insert, in order to prevent the hot atmosphere of the chamber escaping therefrom.