Abstract: An integrated circuit includes an electrostatic discharge (ESD) detection circuit which detects an ESD event and generates an event signal. In response to that event signal, a control circuit controls the operation of a buffer circuit to function in an additional mode wherein the normal differential operation of the buffer circuit is disabled and the buffer circuit is instead configured to form a conduction path between supply rails to discharge the ESD event. Preferably, a plurality of buffer circuits are driven in parallel by the control circuit to function in the additional mode to form parallel discharge paths for the ESD event. Multiple ESD detection circuits may be provided, and any one of those detection circuits can trigger the control circuitry to place all of the buffer circuits in the additional mode.

Abstract: An integrated circuit includes an electrostatic discharge (ESD) detection circuit which detects an ESD event and generates an event signal. In response to that event signal, a control circuit controls the operation of a buffer circuit to function in an additional mode wherein the normal differential operation of the buffer circuit is disabled and the buffer circuit is instead configured to form a conduction path between supply rails to discharge the ESD event. Preferably, a plurality of buffer circuits are driven in parallel by the control circuit to function in the additional mode to form parallel discharge paths for the ESD event. Multiple ESD detection circuits may be provided, and any one of those detection circuits can trigger the control circuitry to place all of the buffer circuits in the additional mode.

Abstract: An embodiment of an integrated circuit includes a semiconductor layer, a well, first and second source/drain regions, and a guard region. The semiconductor layer has a first conductivity, and the well is disposed in the layer and has a second conductivity. The first source/drain region is formed in the well and has the first conductivity, and the second source/drain region is formed in the layer outside of the well and has the second conductivity. The guard region is disposed in the layer between the well and the second source/drain region and has the second conductivity. The guard region may prevent latch up by inhibiting the triggering of a silicon-controlled rectifier (SCR) having one of the first and second source/drain regions as an anode and the other of the first and second source/drain regions as a cathode.

Abstract: A semiconductor electronic device is described comprising a die of semiconductor material having a plurality of contact pads electrically connected to a support for example through interposition of contact wires, said plurality of contact pads comprising signal pads and power pads, the device being characterized in that said signal pads are implemented on the die of semiconductor material with a mutual pitch lower than the pitch between said power pads.

Abstract: A semiconductor electronic device is described comprising a die of semiconductor material having a plurality of contact pads electrically connected to a support for example through interposition of contact wires, said plurality of contact pads comprising signal pads and power pads, the device being characterized in that said signal pads are implemented on the die of semiconductor material with a mutual pitch lower than the pitch between said power pads.