Abstract: A device for producing a plasma, configured to generate a plasma from a reaction gas, wherein the device for producing a plasma comprises a microwave generator operating at a given source frequency comprised within a microwave frequency range and a waveguide coupled to the microwave generator and configured to guide an excitation wave. The device also includes a dielectric tube extending longitudinally along an axis of extension, the dielectric tube being configured to receive the plasma, such as the dielectric tube passes right through the waveguide; and a reaction gas injection unit configured to introduce the reaction gas into the dielectric tube.

Abstract: A microwave coupling/combining device for coupling and combining at least two microwave sources includes a waveguide provided with a sleeve extending longitudinally along a main axis and having two opposing ends having a first end provided with an element forming a short-circuit and a second open end. The device further includes at least one transverse bar extending inside the sleeve along a transverse axis orthogonal to the main axis; and at least two coaxial connectors provided for being connected respectively to microwave sources. Each coaxial connector is mounted externally on the sleeve and has a central conductive core connected to and extended by a conductive antenna extending in a direction orthogonal to the transverse axis and to the main axis inside the sleeve and ending by an end attached to a transverse bar.

Abstract: A microwave reactor having a flow tube, transparent to microwave, extending longitudinally along a flow axis for a fluid medium flow; an input waveguide extending along a propagation axis orthogonal to the flow axis, having a rectangular cross-section with two large sides parallel to the flow axis and two small sides orthogonal to the flow axis; and an enclosure inside which the flow tube extends, made of a material reflective to microwaves, having a lateral dimension greater than the small dimension of the small sides of the input waveguide. The input waveguide is transversely fixed on the enclosure which has an input window surrounded by the input waveguide for propagation of microwaves through the input window to the inside of the enclosure.

Abstract: The present disclosure relates to an elementary device for producing a plasma. The elementary device includes a coaxial applicator of microwave power that includes a conductive central core, a conductive external shield surrounding the central core, a medium located between the central core and the shield to propagate microwave energy, and an insulating body. The elementary device further includes a system to couple to a microwave generator and is disposed at the shield. The shield has a proximal end plugged with the insulating body made of dielectric material that is transparent to the microwave energy. The insulating body has an external surface configured to contact and excite a gas located in the interior of a chamber. The insulating body extends exterior wise from the shield and its external surface is nonplanar and protrudes from the shield. The outside diameter of the body decreases from the shield to its tip.

Abstract: A microwave coupling/combining device for coupling and combining at least two microwave sources includes a waveguide provided with a sleeve extending longitudinally along a main axis and having two opposing ends having a first end provided with an element forming a short-circuit and a second open end. The device further includes at least one transverse bar extending inside the sleeve along a transverse axis orthogonal to the main axis; and at least two coaxial connectors provided for being connected respectively to microwave sources. Each coaxial connector is mounted externally on the sleeve and has a central conductive core connected to and extended by a conductive antenna extending in a direction orthogonal to the transverse axis and to the main axis inside the sleeve and ending by an end attached to a transverse bar.

Abstract: An elementary device of the present disclosure includes a coaxial applicator that includes a connector disposed at a distal end of the applicator, a shielding, a microwave energy propagation medium disposed between a central core and the shielding, and an insulating body disposed at a proximal end of the applicator. The shielding surrounds the central core and has a bottom wall provided at the distal end. The connector includes an external conductor connected to the shielding and an internal conductor connected to the central core. The connector is disposed at the bottom wall with the external conductor fixed to the bottom wall and the internal conductor linked to a connecting element that extends through the bottom wall and parallel to the main axis with a predefined spacing provided between the central core and a free end connected to the central core at a predefined distance from the bottom wall.

Abstract: The present disclosure relates to an elementary device for producing a plasma. The elementary device includes a coaxial applicator of microwave power that includes a conductive central core, a conductive external shield surrounding the central core, a medium located between the central core and the shield to propagate microwave energy, and an insulating body. The elementary device further includes a system to couple to a microwave generator and is disposed at the shield. The shield has a proximal end plugged with the insulating body made of dielectric material that is transparent to the microwave energy. The insulating body has an external surface configured to contact and excite a gas located in the interior of a chamber. The insulating body extends exterior wise from the shield and its external surface is nonplanar and protrudes from the shield. The outside diameter of the body decreases from the shield to its tip.

Abstract: An elementary device of the present disclosure includes a coaxial applicator that includes a connector disposed at a distal end of the applicator, a shielding, a microwave energy propagation medium disposed between a central core and the shielding, and an insulating body disposed at a proximal end of the applicator. The shielding surrounds the central core and has a bottom wall provided at the distal end. The connector includes an external conductor connected to the shielding and an internal conductor connected to the central core. The connector is disposed at the bottom wall with the external conductor fixed to the bottom wall and the internal conductor linked to a connecting element that extends through the bottom wall and parallel to the main axis with a predefined spacing provided between the central core and a free end connected to the central core at a predefined distance from the bottom wall.

Abstract: The invention relates to a facility (1) for microwave treatment of a load, including: at least one application device (30); at least one solid-state generator (4) in the field of microwaves, connected to at least one application device by a means for guiding (5) the electromagnetic wave; at least one frequency adjustment system (40) designed for adjusting the frequency of the wave produced by the corresponding generator (4); a measurement system (31) for the or each application device (30), designed for measuring the power reflected PR(i) by the application device (30); an automated control means (6) connected to each frequency adjustment system (40) and to each measurement system (31) in order to control the adjustment of the frequency f(i) of the electromagnetic wave according to the reflected power, in order to adjust the reflected power PR(i) and/or to adjust the transmitted power PT(i).

Abstract: The invention relates to a facility (1) for microwave treatment of a load, including: at least one application device (30); at least one solid-state generator (4) in the field of microwaves, connected to at least one application device by a means for guiding (5) the electromagnetic wave; at least one frequency adjustment system (40) designed for adjusting the frequency of the wave produced by the corresponding generator (4); a measurement system (31) for the or each application device (30), designed for measuring the power reflected PR(i) by the application device (30); an automated control means (6) connected to each frequency adjustment system (40) and to each measurement system (31) in order to control the adjustment of the frequency f(i) of the electromagnetic wave according to the reflected power, in order to adjust the reflected power PR(i) and/or to adjust the transmitted power PT(i).