Abstract: A device for generating an ion beam, particularly for the continuous processing of large surfaces, includes an ionising chamber with a gas being fed thereinto to be acted upon by a high frequency alternating electrical field, extraction optics capable of extracting ions from the ionising chamber and generating an ion beam from the device, and excitation means capable of creating the high frequency alternating electrical field within the ionising chamber through a connection, by a waveguide, to a microwave generator. The excitation means include a conductive enclosure engaging one wall of the ionising chamber, wherein the inner space of the conductive enclosure is divided into a first portion, opposite the ionising chamber, to which the waveguide is connected, and a second portion, adjacent the ionising chamber, in which cylindrical conductive cavities are uniformly distributed, with each cavity comprising an adjusting means for adjusting the amount of microwave energy passing through that cavity.

Abstract: A device for forming a microwave plasma including an ionizing chamber wherein a gas can be introduced so as to undergo excitation induced by the presence of a high frequency alternating electric field produced by a plurality of metal antennas. The device includes a gas-free volume wherein metal antennas are arranged parallel to one another and are distributed at the nodes of a regular plane array, an end of each antenna extending from the gas-free volume in the ionizing chamber and an induction loop producing microwaves in the gas-free volume.