Abstract: The system described herein provides a method for deploying, managing, scaling, configuring, upgrading, and modifying large complicated systems that are made-up of many different network resources. These network resources may be virtual machines or containers. The system constructs a hierarchical SNS by building up layers from the inside of an outer SNS. The system conducts health checks at each layer to ensure the system is properly functioning and the deployment is healthy. Lastly, third party vendors input logic in each layer to identify a desired state for the system. Once the desired state is identified, each layer can determine the necessary actions to upgrade from the current state to the desired state. This system simplifies, adds efficiency, and increases security when deploying, scaling, configuring, upgrading, or modifying the system.

Abstract: A filter housing for containing a cartridge assembly having a filter cartridge secured to a filter cover, the filter housing has a peripheral wall extending around a longitudinal axis, and end wall secured to the peripheral wall, the filter housing defining a cavity partially enclosed by the peripheral wall and the end wall, the peripheral wall defining a cartridge-receiving section extending from the end wall along the longitudinal axis and sized for receiving the filter cartridge and a cover-receiving section extending along the longitudinal axis from the cartridge-receiving section to an open end of the filter housing opposed to the end wall and sized for receiving the filter cover, a portion of the cover-receiving section recessed radially outwardly from the cartridge-receiving section relative to the longitudinal axis, a lubricant outlet of the filter housing extending through the portion of the cover-receiving section of the peripheral wall.

Abstract: A semiconductor processing device is disclosed. The device can include a reactor and a solid source vessel configured to supply a vaporized solid reactant to the reactor. A process control chamber can be disposed between the solid source vessel and the reactor. The device can include a valve upstream of the process control chamber. A control system can be configured to control operation of the valve based at least in part on feedback of measured pressure in the process control chamber.

Abstract: An apparatus and method are disclosed for monitoring and/or detecting concentrations of a chemical precursor in a reaction chamber. The apparatus and method have an advantage of operating in a high temperature environment. An optical emissions spectrometer (OES) is coupled to a gas source, such as a solid source vessel, in order to monitor or detect an output of the chemical precursor to the reaction chamber. Alternatively, a small sample of precursor can be periodically monitored flowing into the OES and into a vacuum pump, thus bypassing the reaction chamber.

Abstract: Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.

Abstract: Embodiments of the invention provide a hollow cable for transmitting radiofrequency and/or microwave frequency energy to an electrosurgical instrument, wherein the hollow cable is provided with electrical connectors for forming a bipolar electrical connection with an electrosurgical instrument that fits within, e.g. slides relative to, the hollow cable. The connectors can be conductive protrusions extending in an axial direction on opposite sides of the cable. The protrusions can be tabs, fins, rods, pins, or wires. The protrusions can be strips which engage corresponding terminals on the instrument. The transmission line structure of the invention can have a greater diameter then convention coaxial cables, which can minimise loss whilst still providing access for control wires and/or fluid to reach an surgical instrument. The cable can be used with multiple instruments.

Abstract: A site network service (SNS) design is deployed in a computing system. A network function (NF) design is received and transferred to a data store. A network service (NS) design is generated that includes a reference to a NF design from the data store and a NS configuration including information for partially configuring the referenced NF design. The NS design is transferred to the data store. A SNS design is deployed that includes a reference to the NS design from the data store and a SNS configuration.

Abstract: A service orchestrator receives a definition of a change to a network service to be deployed over a plurality of sites of a communications network. The definition comprises a configuration schema with a plurality of fields, which are partitioned into a plurality of different configuration group types. The service orchestrator receives an instance of the configuration group type. The service orchestrator receives conditional convergence logic specifying the received instance each site is to use conditional on a current state instance of the configuration group type used at the site. The service orchestrator sends instructions to each of the sites based on the conditional convergence logic, the instructions comprising the received instance. The instructions are configured to trigger a site convergence agent at each site to deploy the change to the network service according to the received instance of the configuration group type and the conditional convergence logic.

Abstract: An apparatus, computer-implemented method and media for instantiating a network service, comprising: receiving a request for a required network service; determining a required network service (NS) design for the required network service storing a required NS state configured to create a list of required resources in a required order for instantiating the required network service sequencing, through the list of required resources in the required order and identifying a sequence of required resources based on the order; converging towards the sequence of required resources, via a SCA convergence by: (a) implementing the required resource by calling for the required resource to be created, updated or deleted; (b) determining a next required resource to implement; repeating steps (a) and (b) to convergence; comparing the implemented resources with the list of required resource to determine convergence; instantiating, via a controller, the or each implemented resource.

Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.

Abstract: The present disclosure pertains to embodiments of a semiconductor deposition reactor manifold and methods of using the semiconductor deposition reactor manifold which can be used to deposit semiconductor layers using processes such as atomic layer deposition (ALD). The semiconductor deposition reactor manifold has a bore, a first supply channel, and a second supply channel. Advantageously, the first supply channel and the second supply channel merge with the bore in an offset fashion which leads to reduced cross-contamination within the supply channels.

Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.

Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.

Abstract: Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include a movable susceptor assembly and a moveable plate. The movable susceptor assembly and movable plate can move vertically between reaction zones of a reactor to expose a substrate to multiple processes or reactants.

Abstract: Systems and methods related to temperature zone control systems can include a reactant source cabinet that is configured to be at least partially evacuated, a vessel base that is configured to hold solid source chemical reactant therein, and a lid that is coupled to a distal portion of the vessel base. The lid may include one or more lid valves. The system may further include a plurality of gas panel valves that are configured to deliver gas from a gas source to the vessel. The system may include a heating element that is configured to heat the one or more lid valves. The system may include a heat shield, a first portion of which is disposed between the one or more lid valves and the vessel base. A second portion of the heat shield may be disposed between the first heating element and the plurality of gas panel valves.

Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.

Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.

Abstract: Lifecycle management is implemented in a data processing system. A first workload is provided in a first workload environment. The first workload is used to align one or more first lifecycle management states of the first workload in the first workload environment and one or more second lifecycle management states of a second workload. The second workload is in a second, different workload environment.

Abstract: The present disclosure relates to a semiconductor processing apparatus having a reaction chamber which can include a baseplate having an opening; a moveable substrate support configured to support a substrate; a movement element configured to move a substrate held on the substrate support towards the opening of the baseplate; a plurality of gas inlets positioned above and configured to direct gas downwardly towards the substrate support; and a sealing element configured to form a seal between the baseplate and the substrate support, the seal positioned at a greater radial distance from a center of the substrate support than an outer edge of the substrate support. In some embodiments, the sealing element can also include a plurality of apertures extend through the sealing element, the apertures configured to provide a flow path between a position below the sealing element to a position above the sealing element.

Abstract: Systems and methods related to temperature zone control systems can include a reactant source cabinet that is configured to be at least partially evacuated, a vessel base that is configured to hold solid source chemical reactant therein, and a lid that is coupled to a distal portion of the vessel base. The lid may include one or more lid valves. The system may further include a plurality of gas panel valves that are configured to deliver gas from a gas source to the vessel. The system may include a heating element that is configured to heat the one or more lid valves. The system may include a heat shield, a first portion of which is disposed between the one or more lid valves and the vessel base. A second portion of the heat shield may be disposed between the first heating element and the plurality of gas panel valves.