Patents by Inventor Louise R. Giam

Louise R. Giam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8753813
    Abstract: The disclosure relates to a method of forming a pattern having pattern elements with a plurality of sizes on a substrate surface with a tilted pen array that includes choosing a tilt geometry for a pen array with respect to a substrate, inducing the tilt geometry between the pen array and the substrate surface, and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. For example, the tilt geometry is in reference to the substrate surface and comprises a first angle with respect to a first axis of the substrate and a second angle with respect to a second axis of the substrate, the second axis being perpendicular to the first axis, and at least one of the first and second angles being non-zero.
    Type: Grant
    Filed: December 2, 2010
    Date of Patent: June 17, 2014
    Assignee: Northwestern University
    Inventors: Chad A. Mirkin, Adam B. Braunschweig, Jinan Chai, Dan J. Eichelsdoerfer, Louise R. Giam, Xing Liao, Lu Shin Wong
  • Publication number: 20140038849
    Abstract: The disclosure relates to a method of analyzing an analyte that includes forming a combinatorial pattern comprising pattern elements with a plurality of sizes and/or structures on a substrate surface with a tilted pen array, applying an analyte to the combinatorial pattern, and identifying a pattern element size and/or structure having a desired effect on an analyte parameter using the combinatorial pattern. The method further includes forming a uniform pattern comprising pattern elements each having substantially the same size and/or structure corresponding to the identified pattern element size and/or structure, and analyzing the effect of pattern element size and/or structure on the analyte parameter using the uniform pattern.
    Type: Application
    Filed: March 17, 2012
    Publication date: February 6, 2014
    Applicant: NORTHWESTERN UNIVERSITY
    Inventors: Chad A. Mirkin, Louise R. Giam, Matthew D. Massich
  • Publication number: 20130040856
    Abstract: The disclosure relates to a method of forming a pattern having pattern elements with a plurality of sizes on a substrate surface with a tilted pen array that includes choosing a tilt geometry for a pen array with respect to a substrate, inducing the tilt geometry between the pen array and the substrate surface, and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. For example, the tilt geometry is in reference to the substrate surface and comprises a first angle with respect to a first axis of the substrate and a second angle with respect to a second axis of the substrate, the second axis being perpendicular to the first axis, and at least one of the first and second angles being non-zero.
    Type: Application
    Filed: December 2, 2010
    Publication date: February 14, 2013
    Applicant: NORTHEWESTERN UNIVERSITY
    Inventors: Chad A. Mirkin, Adam B. Braunschweig, Jinan Chai, Dan J. Eichelsdoerfer, Louise R. Giam, Xing Liao, Lu Shin Wong
  • Publication number: 20120097058
    Abstract: Methods of patterning multiple biomolecules on a surface are disclosed. The method includes inking a polymer pen array, where tips are inked with selected inks comprising the biomolecules, and transferring the biomolecules to a surface using a polymer pen lithography technique. Methods of using the multiple patterned biomolecules on a surface are also disclosed.
    Type: Application
    Filed: April 23, 2010
    Publication date: April 26, 2012
    Applicant: NORTHWESTERN UNIVERSITY
    Inventors: Chad A. Mirkin, Fengwei Huo, Zijian Zheng, Louise R. Giam, Weston L. Daniel
  • Publication number: 20110165341
    Abstract: In accordance with an embodiment of the disclosure, a method for forming submicron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1 ?m.
    Type: Application
    Filed: December 2, 2010
    Publication date: July 7, 2011
    Applicant: NORTHWESTERN UNIVERSITY
    Inventors: Chad A. Mirkin, Jinan Chai, Fengwei Huo, Zijian Zheng, Louise R. Giam
  • Patent number: 7954166
    Abstract: An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: May 31, 2011
    Assignee: Northwestern University
    Inventors: Chad A. Mirkin, Yuhuang Wang, Louise R. Giam, Matthew Park
  • Publication number: 20100115672
    Abstract: A dual tip probe for scanning probe epitaxy and a method of forming the dual tip probe are disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The first tip can remain in contact with a substrate during writing and provide in situ characterization of the substrate and or structures written, while the second tip can perform in non-contact mode to write and synthesis nanostructures. This feature can allow the dual tip probe to detect errors in a printed pattern using the first tip and correct the errors using the second tip.
    Type: Application
    Filed: May 13, 2009
    Publication date: May 6, 2010
    Applicant: NORTHWESTERN UNIVERSITY
    Inventors: Chad A. Mirkin, Chang Liu, Yuhuang Wang, Adam B. Braunschweig, Xing Liao, Louise R. Giam, Byung Y. Lee, Shifeng Li
  • Publication number: 20100071098
    Abstract: A dual tip probe for scanning probe epitaxy is disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The dual tip probe further includes a rib disposed on the cantilever arm between the first and second tips. The dual tip probe can also include a strain gauge disposed along the length of the cantilever arm.
    Type: Application
    Filed: May 13, 2009
    Publication date: March 18, 2010
    Applicants: NORTHWESTERN UNIVERSITY, Nanolnk, Inc.
    Inventors: Chad A. Mirkin, Chang Liu, Yuhuang Wang, Adam B. Braunschweig, Xing Liao, Louise R. Giam, Byung Y. Lee, Shifeng Li, Joseph S. Fragala, Albert K. Henning
  • Publication number: 20090133169
    Abstract: An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.
    Type: Application
    Filed: August 8, 2008
    Publication date: May 21, 2009
    Inventors: Chad A. Mirkin, Yuhuang Wang, Louise R. Giam, Matthew Park