Patents by Inventor Lu SIQING

Lu SIQING has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma generator, cleaning liquid processing apparatus, semiconductor device cleaning apparatus, cleaning liquid processing method, and method of manufacturing semiconductor device
    Patent number: 11545372
    Abstract: A plasma generator, a cleaning liquid processing apparatus including the same, a semiconductor cleaning apparatus, and a cleaning liquid processing method are provided. The cleaning liquid processing apparatus comprising a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid, a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid, and a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.
    Type: Grant
    Filed: May 24, 2019
    Date of Patent: January 3, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Beom Jin Yoo, Min Hyoung Kim, Sang Ki Nam, Lu Siqing, Won Hyuk Jang, Kyu Hee Han
  • PLASMA GENERATOR, CLEANING LIQUID PROCESSING APPARATUS, SEMICONDUCTOR DEVICE CLEANING APPARATUS, CLEANING LIQUID PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    Publication number: 20200020551
    Abstract: A plasma generator, a cleaning liquid processing apparatus including the same, a semiconductor cleaning apparatus, and a cleaning liquid processing method are provided. The cleaning liquid processing apparatus comprising a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid, a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid, and a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.
    Type: Application
    Filed: May 24, 2019
    Publication date: January 16, 2020
    Inventors: Beom Jin YOO, Min Hyoung KIM, Sang Ki NAM, Lu SIQING, Won Hyuk JANG, Kyu Hee HAN