Patents by Inventor Luai Nasser

Luai Nasser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for compensating measured IDDQ values
    Patent number: 9007079
    Abstract: An IDDQ test system and method that, in one embodiment, includes 1) an empirical extraction subsystem operable to generate an IDDQ versus temperature model for a given semiconductor device design, 2) an automatic test equipment (ATE) test subsystem operable to obtain a measured IDDQ value (IDDQm) at a measured temperature (Tm) for a specific semiconductor device embodying the given semiconductor device design, the measured temperature (Tm) obtained within 5 seconds of obtaining the measured IDDQ value (IDDQm), and 3) a scaling subsystem operable to scale the measured IDDQ value (IDDQm) at the measured temperature (Tm) to a compensated IDDQ value (IDDQc) at a desired temperature (Td) using the IDDQ versus temperature model.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: April 14, 2015
    Assignee: Nvidia Corporation
    Inventors: Dushyant Narayen, Nerinder Singh, Gunaseelan Ponnuvel, Hemant Kumar, Luai Nasser, Craig Nishizaki
  • SYSTEM AND METHOD FOR COMPENSATING MEASURED IDDQ VALUES
    Publication number: 20140125364
    Abstract: An IDDQ test system and method that, in one embodiment,deg includes 1) an empirical extraction subsystem operable to generate an IDDQ versus temperature model for a given semiconductor device design, 2) an automatic test equipment (ATE) test subsystem operable to obtain a measured IDDQ value (IDDQm) at a measured temperature (Tm) for a specific semiconductor device embodying the given semiconductor device design, the measured temperature (Tm) obtained within 5 seconds of obtaining the measured IDDQ value (IDDQm), and 3) a scaling subsystem operable to scale the measured IDDQ value (IDDQm) at the measured temperature (Tm) to a compensated IDDQ value (IDDQc) at a desired temperature (Td) using the IDDQ versus temperature model.
    Type: Application
    Filed: November 2, 2012
    Publication date: May 8, 2014
    Applicant: NVIDIA CORPORATION
    Inventors: Dushyant Narayen, Nerinder Singh, Gunaseelan Ponnuvel, Hemant Kumar, Luai Nasser, Craig Nishizaki
  • System, method and apparatus for in-situ substrate inspection
    Patent number: 7542134
    Abstract: A system for inspecting a substrate includes a camera and a light source. The camera is oriented toward a field of view. The field of view encompasses at least a first portion of a first surface of the substrate. The light source is oriented toward the field of view at a first angle ? relative to the first surface of the substrate. A method for inspecting a substrate is also included.
    Type: Grant
    Filed: June 2, 2008
    Date of Patent: June 2, 2009
    Assignee: Lam Research Corporation
    Inventors: Aleksander Owczarz, Jaroslaw W. Winniczek, Luai Nasser, Alan Schoepp, Fred C. Redeker, Erik Edelberg
  • SYSTEM, METHOD AND APPARATUS FOR IN-SITU SUBSTRATE INSPECTION
    Publication number: 20080273195
    Abstract: A system for inspecting a substrate includes a camera and a light source. The camera is oriented toward a field of view. The field of view encompasses at least a first portion of a first surface of the substrate. The light source is oriented toward the field of view at a first angle ? relative to the first surface of the substrate. A method for inspecting a substrate is also included.
    Type: Application
    Filed: June 2, 2008
    Publication date: November 6, 2008
    Inventors: Aleksander Owczarz, Jaroslaw W. Winniczek, Luai Nasser, Alan Schoepp, Fred C. Redeker, Erik Edelberg
  • System, method and apparatus for in-situ substrate inspection
    Patent number: 7397555
    Abstract: A system for inspecting a substrate includes a camera and a light source. The camera is oriented toward a field of view. The field of view encompasses at least a first portion of a first surface of the substrate. The light source is oriented toward the field of view at a first angle ? relative to the first surface of the substrate. A method for inspecting a substrate is also included.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: July 8, 2008
    Assignee: Lam Research Corporation
    Inventors: Aleksander Owczarz, Jaroslaw W. Winniczek, Luai Nasser, Alan Schoepp, Fred C. Redeker, Erik Edelberg
  • System, method and apparatus for in-situ substrate inspection
    Publication number: 20060139450
    Abstract: A system for inspecting a substrate includes a camera and a light source. The camera is oriented toward a field of view. The field of view encompasses at least a first portion of a first surface of the substrate. The light source is oriented toward the field of view at a first angle ? relative to the first surface of the substrate. A method for inspecting a substrate is also included.
    Type: Application
    Filed: December 17, 2004
    Publication date: June 29, 2006
    Applicant: Lam Research Corp.
    Inventors: Aleksander Owczarz, Jaroslaw Winniczek, Luai Nasser, Alan Schoepp, Fred Redeker, Erik Edelberg