Abstract: The invention relates to an optical article provided with antireflection properties, comprising a substrate having at least one main surface coated with an antireflection coating comprising, starting from the substrate: a sub-layer comprising two adjacent layers formed from the same material, the sum of the thicknesses of the two adjacent layers being greater than or equal to 75 nm; and a multilayered antireflection stack comprising at least one high refractive index layer and at least one low refractive index layer, the deposition of the first of said two adjacent layers of the sub-layer having been carried out without ion assistance and the deposition of the second of said two adjacent layers of the sub-layer having been carried out under ion assistance. The invention also relates to a process for manufacturing such an optical article.

Abstract: The invention relates to an optical article provided with antireflection properties, comprising a substrate having at least one main surface coated with an antireflection coating comprising, starting from the substrate: a sub-layer comprising two adjacent layers formed from the same material, the sum of the thicknesses of the two adjacent layers being greater than or equal to 75 nm; and a multilayered antireflection stack comprising at least one high refractive index layer and at least one low refractive index layer, the deposition of the first of said two adjacent layers of the sub-layer having been carried out without ion assistance and the deposition of the second of said two adjacent layers of the sub-layer having been carried out under ion assistance. The invention also relates to a process for manufacturing such an optical article.

Abstract: The invention relates to an optical article provided with antireflection properties, comprising a substrate having at least one main surface coated with an antireflection coating comprising, starting from the substrate: a sub-layer comprising two adjacent layers formed from the same material, the sum of the thicknesses of the two adjacent layers being greater than or equal to 75 nm; and a multilayered antireflection stack comprising at least one high refractive index layer and at least one low refractive index layer, the deposition of the first of said two adjacent layers of the sub-layer having been carried out without ion assistance and the deposition of the second of said two adjacent layers of the sub-layer having been carried out under ion assistance. The invention also relates to a process for manufacturing such an optical article.

Abstract: The present invention relates to an optical article having anti-reflection properties and high thermal resistance, comprising a substrate having at least one main face coated with a multi-layer anti-reflection coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer, wherein the ratio: R T = sum ? ? of ? ? the ? ? physical ? ? thicknesses ? ? of ? ? the low ? ? refractive ? ? index ? ? layers ? ? of ? ? the ? anti ? - ? reflection ? ? coating sum ? ? of ? ? the ? ? physical ? ? thicknesses ? ? of ? ? the high ? ? refractive ? ? index ? ? layers ? ? of ? ? the ? anti ? - ? reflection ? ? coating is higher than 2.1.

Abstract: The present invention relates to an optical article having anti-reflection properties and high thermal resistance, comprising a substrate having at least one main face coated with a multi-layer anti-reflection coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer, wherein the ratio: R T = sum ? ? of ? ? the ? ? physical ? ? thicknesses ? ? of ? ? the low ? ? refractive ? ? index ? ? layers ? ? of ? ? the ? anti ? - ? reflection ? ? coating sum ? ? of ? ? the ? ? physical ? ? thicknesses ? ? of ? ? the high ? ? refractive ? ? index ? ? layers ? ? of ? ? the ? anti ? - ? reflection ? ? coating is higher than 2.1.

Abstract: In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.

Abstract: Source evaporation machine for covering samples optionally by a mixture produced by several sources (3).Mobile covers (6) are placed between the sources (3) and the sample. The covers (6) are designed so as to ensure that the solid parts (23,24) and the openings (21,25) alternate and the sources (3) move relative to the covers in such a way that different circumferences of the covers pass in front of them. As the angular sectors surrounded by the openings differ for each circumference, the degree of hiding of the sources (3) can be regulated in a very accurate and reliable manner. It is possible to modify the flow of the source on the sample or, in the case of several sources, vary the composition of the deposited mixture.