Patents by Inventor Luca Furfaro

Luca Furfaro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Laser nanomachining device and method
    Patent number: 10131017
    Abstract: According to one aspect, the invention relates to a device (1, 2, 3) for laser nanomachining a sample made of a material having a given transparency band, the device comprising: a focusing module (203, 703) allowing a nondiffracting beam (210, 710) to be generated, along a focusing line generally oriented along the optical axis of the focusing module, from a given incident beam; first means (202, 702) for emitting a first light pulse (I1) of spectral band comprised in the transparency band of said material, able to generate in said material, after focusing by said focusing module, a plasma of free charges along said focusing line via multi-photon absorption, thus forming a “plasma channel”; and second means (202, 702) for emitting at least one second electromagnetic wave (I2) of spectral band comprised in the transparency band of said material, which wave(s) is/are intended to be spatially superposed on said plasma channel in order to heat said material via absorption by the free charges of the plasma.
    Type: Grant
    Filed: April 12, 2013
    Date of Patent: November 20, 2018
    Assignees: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE—CNRS, UNIVERSITE DE FRANCHE-COMTE
    Inventors: François Courvoisier, Pierre-Ambroise Lacourt, Maxime Jacquot, Luca Furfaro, John Dudley, Michel De Labachelerie
  • LASER NANOMACHINING DEVICE AND METHOD
    Publication number: 20150158120
    Abstract: According to one aspect, the invention relates to a device (1, 2, 3) for laser nanomachining a sample made of a material having a given transparency band, the device comprising: a focusing module (203, 703) allowing a nondiffracting beam (210, 710) to be generated, along a focusing line generally oriented along the optical axis of the focusing module, from a given incident beam; first means (202, 702) for emitting a first light pulse (I1) of spectral band comprised in the transparency band of said material, able to generate in said material, after focusing by said focusing module, a plasma of free charges along said focusing line via multiphoton absorption, thus forming a “plasma channel”; and second means (202, 702) for emitting at least one second electromagnetic wave (I2) of spectral band comprised in the transparency band of said material, which wave(s) is/are intended to be spatially superposed on said plasma channel in order to heat said material via absorption by the free charges of the plasma.
    Type: Application
    Filed: April 12, 2013
    Publication date: June 11, 2015
    Applicants: Université de Franche-Comté, Centre National de la Recherche Scientifique-CNRS
    Inventors: François Courvoisier, Pierre-Ambroise Lacourt, Maxime Jacquot, Luca Furfaro, John Dudley, Michel De Labachelerie