Abstract: A process for producing a natural sweetening enhancer composition comprising at least an Rebaudioside C (RC) extract, said process comprises the steps of preparing a saccharide mother liquor comprising an RC mass content of at least 15%; preparing feed liquid from about 8-25 mg/L of the mother liquor; flowing feed liquid through a porous adsorption column, having a pore size of between about 0.001 to 0.2 micron, and at a flow rate of between 25 to 35 L/m2h and at a pH of between 6 to 8; eluting RC extract with alcohol, said RC extract having a mass concentration of at least 10%; fractionally collecting eluate based on chromatographic critical point for RC extract; concentrating the RC extract and drying the extract so formed. Another process for preparing a crude RC extract which comprises the steps of preparing a saccharide mother liquor into a feedstock solution with a mass concentration of about 0.

Abstract: A substrate having a patterned mask and exposed openings is provided in a process chamber having process electrodes. In a plasma ignition stage, a process gas is provided in the process chamber and is energized by maintaining the process electrodes at a plasma ignition bias power level. In an etch-passivating stage, an etch-passivating material is formed on at least portions of the substrate by maintaining the process electrodes at an etch-passivating bias power level. In an etching stage, the exposed openings on the substrate are etched by maintaining the process electrodes at an etching bias power level.

Abstract: A substrate having a patterned mask and exposed openings is provided in a process chamber having process electrodes. In a plasma ignition stage, a process gas is provided in the process chamber and is energized by maintaining the process electrodes at a plasma ignition bias power level. In an etch-passivating stage, an etch-passivating material is formed on at least portions of the substrate by maintaining the process electrodes at an etch-passivating bias power level. In an etching stage, the exposed openings on the substrate are etched by maintaining the process electrodes at an etching bias power level.

Abstract: A substrate 20 is placed in a process zone 115 of a process chamber 110, process gas is introduced into the process zone 115, and an energized gas is formed in the process zone 115. First process conditions are set to form etch-passivating deposits onto a surface 22 of the substrate 20. Second process conditions are set to etch the surface 22 of the substrate 20. The etch-passivating deposits formed before the etching process improve etching uniformity and reduce etch-rate microloading.

Abstract: A method is provided for increasing insulin responsiveness and improving glucose tolerance in a mammal comprising administration of an effective amount of a cholinergic agonist; pharmaceutical compositions are also provided.