Patents by Inventor Lun-Hung Chen

Lun-Hung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240186459
    Abstract: A light emitting structure includes a carrying unit, a light emitting unit and a light transmitting unit. The light emitting unit is arranged on the carrying unit, and includes a light emitting surface. The light transmitting unit directly contacts the light emitting unit, and includes a first surface and a second surface opposite to each other. The first surface covers at least part of the light emitting surface, and the second surface directly contacts a gas.
    Type: Application
    Filed: December 4, 2023
    Publication date: June 6, 2024
    Inventors: Chen-Lun HSING CHEN, Jung-Hao HUNG, Yung-Chun YANG
  • Publication number: 20240097080
    Abstract: A light emitting module includes a carrier, a light emitting element, a reflection layer, and a fluorescent layer. The light emitting element is disposed on the carrier. The reflection layer is disposed on the carrier and surrounds the light emitting element. The fluorescent layer covers at least part of the light emitting element. The disadvantages of over broad light emitting angle and low illuminance may be solved. Comparing with the related art, the present disclosure achieves an object of increasing the illuminance by at least 10%.
    Type: Application
    Filed: July 6, 2023
    Publication date: March 21, 2024
    Inventors: Chen-Lun HSING CHEN, Jung-Hao HUNG, Ya-Yu HUNG, Yi-Ting KUO
  • Patent number: 8042069
    Abstract: A method to selectively amend a layout pattern is disclosed. First, a layout pattern including at least a first group and a second group is provided, wherein each one of the first group and the second group respectively includes multiple members. Second, a simulation procedure and an amendment procedure are respectively performed on all the members of the first group and the second group to obtain an amended first group and an amended second group. Then, the amended first group and the amended second group are verified as being on target or not. Afterwards, the layout pattern including the on target amended first group and the on target amended second group is output.
    Type: Grant
    Filed: August 7, 2008
    Date of Patent: October 18, 2011
    Assignee: United Microelectronics Corp.
    Inventors: Yu-Shiang Yang, Te-Hung Wu, Yung-Feng Cheng, Chuen Huei Yang, Hsiang-Yun Huang, Hui-Fang Kuo, Shih-Ming Kuo, Lun-Hung Chen
  • Publication number: 20100036644
    Abstract: A method to selectively amend a layout pattern is disclosed. First, a layout pattern including at least a first group and a second group is provided, wherein each one of the first group and the second group respectively includes multiple members. Second, a simulation procedure and an amendment procedure are respectively performed on all the members of the first group and the second group to obtain an amended first group and an amended second group. Then, the amended first group and the amended second group are verified as being on target or not. Afterwards, the layout pattern including the on target amended first group and the on target amended second group is output.
    Type: Application
    Filed: August 7, 2008
    Publication date: February 11, 2010
    Inventors: Yu-Shiang Yang, Te-Hung Wu, Yung-Feng Cheng, Chuen Huei Yang, Hsiang-Yun Huang, Hui-Fang Kuo, Shih-Ming Kuo, Lun-Hung Chen