Patents by Inventor Lydia L. Y. Hwang

Lydia L. Y. Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Analytical method for particulate silicon
    Patent number: 5436164
    Abstract: The instant invention is a method for converting particulate silicon into monocrystalline silicon suitable for the determination of contaminates present in the particulate silicon. The method uses a silicon vessel, with known levels of the contaminates to be determined, to contain the particulate silicon. The silicon vessel, containing the particulate silicon, is float-zone processed to form a monolithic unit of monocrystalline silicon. The concentration of contaminates in the monocrystalline silicon can then be determined by the more sensitive analytical methods known for analysis of monolithic, monocrystalline silicon. The instant method is especially useful for measuring very low levels of aluminum, boron, phosphorous, and carbon in particulate silicon.
    Type: Grant
    Filed: November 15, 1990
    Date of Patent: July 25, 1995
    Assignee: Hemlock Semi-Conductor Corporation
    Inventors: Richard C. Dumler, Lydia L.-Y. Hwang, Maurice D. Lovay, Daniel P. Rice
  • Sulfur free small-particle production of technetium sulfur colloid
    Patent number: 4406876
    Abstract: There is disclosed a sterile, non-pyrogenic composition and method for preparing technetium 99m colloidal material substantially free of sulfur utilized in the scanning of organs of the body.
    Type: Grant
    Filed: October 14, 1980
    Date of Patent: September 27, 1983
    Assignee: Research Foundation of the State Univ. of New York
    Inventors: Joseph Steigman, Nathan A. Solomon, Lydia L. Y. Hwang