Patents by Inventor Mabito Iguchi

Mabito Iguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Yttrium oxyfluoride sprayed coating and method for producing the same, and sprayed member
    Patent number: 10538845
    Abstract: An yttrium oxyfluoride sprayed coating contains Y5O4F7 as a main component. In the yttrium oxyfluoride sprayed coating, when the total intensity of all peaks attributable to yttrium oxyfluoride in a diffraction spectrum obtained by X-ray diffractometry is assumed to be 100, the total intensity of all peaks attributable to yttrium fluoride and yttrium oxide is less than 10. Furthermore, in an yttrium oxyfluoride-containing sprayed coating, when the total intensity of all peaks attributable to yttrium oxyfluoride and yttrium fluoride in a diffraction spectrum obtained by X-ray diffractometry is assumed to be 100, the total intensity of all peaks attributable to yttrium oxide is less than 1.
    Type: Grant
    Filed: June 19, 2017
    Date of Patent: January 21, 2020
    Assignee: NGK SPARK PLUG CO., LTD.
    Inventors: Mabito Iguchi, Yuuki Hayasaka, Yasunobu Noritake
  • YTTRIUM OXYFLUORIDE SPRAYED COATING AND METHOD FOR PRODUCING THE SAME, AND SPRAYED MEMBER
    Publication number: 20170370007
    Abstract: An yttrium oxyfluoride sprayed coating contains Y5O4F7 as a main component. In the yttrium oxyfluoride sprayed coating, when the total intensity of all peaks attributable to yttrium oxyfluoride in a diffraction spectrum obtained by X-ray diffractometry is assumed to be 100, the total intensity of all peaks attributable to yttrium fluoride and yttrium oxide is less than 10. Furthermore, in an yttrium oxyfluoride-containing sprayed coating, when the total intensity of all peaks attributable to yttrium oxyfluoride and yttrium fluoride in a diffraction spectrum obtained by X-ray diffractometry is assumed to be 100, the total intensity of all peaks attributable to yttrium oxide is less than 1.
    Type: Application
    Filed: June 19, 2017
    Publication date: December 28, 2017
    Inventors: Mabito IGUCHI, Yuuki HAYASAKA, Yasunobu NORITAKE
  • Porous Member
    Publication number: 20090169854
    Abstract: To provide a porous member that can suppress energy loss in a microwave band and can evenly disperse gas when used in a field requiring a high level of cleanness. The porous member is formed of porous ceramics and has a dielectric loss tangent of not more than 1×10?3 in a microwave band. A ceramic member has sintered ceramics including the porous member at a part thereof.
    Type: Application
    Filed: March 29, 2007
    Publication date: July 2, 2009
    Inventors: Tadahiro Ohmi, Yukio Kishi, Mabito Iguchi, Yoshitaka Ichikawa, Yusuke Komatsu
  • Member for a Plasma Processing Apparatus and Method of Manufacturing the Same
    Publication number: 20090101070
    Abstract: A member for a plasma processing apparatus, which is excellent in film-formability, durability, and reliability, is provided. On a substrate, a ceramic film having a purity not less than 98% is provided. In the ceramic film, grains constituting the film have a grain diameter not greater than 50 nm and the amount of moisture released from the film is not more than 1019 molecules/cm2.
    Type: Application
    Filed: February 20, 2007
    Publication date: April 23, 2009
    Inventors: Tadahiro Ohmi, Masafumi Kitano, Yoshihumi Tsutai, Keisuke Satou, Mabito Iguchi