Patents by Inventor Mahadevan GanapathiSubramanian
Mahadevan GanapathiSubramanian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11020894Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.Type: GrantFiled: October 30, 2018Date of Patent: June 1, 2021Assignee: Molecular Imprints, Inc.Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung Jin Choi, Sidlgata V. Sreenivasan
-
Patent number: 10578964Abstract: Systems and methods for partial field imprinting are provided such that imprint templates are asymmetrically modulated to allow initial contact with a partial field on a substrate at a location spaced apart from the template center.Type: GrantFiled: December 31, 2014Date of Patent: March 3, 2020Assignee: Canon Nanotechnologies, Inc.Inventors: Mahadevan Ganapathisubramanian, Matthew M. Kincaid, Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Patent number: 10409156Abstract: A mold includes a pattern portion in which a pattern is formed, and a concave portion formed in the back surface of the pattern portion and having a size to include the pattern portion in a planar view. The edge of the pattern portion has an almost rectangular shape in the planar view. The concave portion has an almost rectangular shape with four rounded corners in the planar view. The shortest distance from each point on a side of the edge of the pattern portion to the edge of the concave portion is constant.Type: GrantFiled: January 21, 2016Date of Patent: September 10, 2019Assignee: CANON KABUSHIKI KAISHAInventors: Byung-Jin Choi, Mahadevan Ganapathisubramanian, Naoki Murasato, Yoshikazu Miyajima
-
Publication number: 20190061228Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.Type: ApplicationFiled: October 30, 2018Publication date: February 28, 2019Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung Jin Choi, Sidlgata V. Sreenivasan
-
Patent number: 9616614Abstract: Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.Type: GrantFiled: February 21, 2013Date of Patent: April 11, 2017Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Se Hyun Ahn, Mahadevan GanapathiSubramanian, Michael N. Miller, Sidlgata V. Sreenivasan
-
Patent number: 9529274Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.Type: GrantFiled: December 15, 2014Date of Patent: December 27, 2016Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
-
Publication number: 20160236400Abstract: A mold includes a pattern portion in which a pattern is formed, and a concave portion formed in the back surface of the pattern portion and having a size to include the pattern portion in a planar view. The edge of the pattern portion has an almost rectangular shape in the planar view. The concave portion has an almost rectangular shape with four rounded corners in the planar view. The shortest distance from each point on a side of the edge of the pattern portion to the edge of the concave portion is constant.Type: ApplicationFiled: January 21, 2016Publication date: August 18, 2016Inventors: Byung-Jin Choi, Mahadevan Ganapathisubramanian, Naoki Murasato, Yoshikazu Miyajima
-
Patent number: 9164375Abstract: A template chuck includes multiple zones to provide 1) an imprint bend optimized to provide high curvature and provide contact at middle radius of substrate and/or, 2) separation bend zone with an increased free span zone and high crack angle.Type: GrantFiled: June 17, 2010Date of Patent: October 20, 2015Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.Inventors: Mahadevan Ganapathisubramanian, Byung-Jin Choi
-
Publication number: 20150183151Abstract: Systems and methods for partial field imprinting are provided such that imprint templates are asymmetrically modulated to allow initial contact with a partial field on a substrate at a location spaced apart from the template center.Type: ApplicationFiled: December 31, 2014Publication date: July 2, 2015Inventors: Mahadevan Ganapathisubramanian, Matthew M. Kincaid, Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Publication number: 20150165671Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.Type: ApplicationFiled: February 26, 2015Publication date: June 18, 2015Inventors: Se-Hyuk Im, Mahadevan Ganapathisubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Publication number: 20150091230Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.Type: ApplicationFiled: December 15, 2014Publication date: April 2, 2015Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
-
Patent number: 8968620Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.Type: GrantFiled: April 27, 2011Date of Patent: March 3, 2015Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Patent number: 8913230Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.Type: GrantFiled: July 1, 2010Date of Patent: December 16, 2014Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
-
Publication number: 20130214452Abstract: Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.Type: ApplicationFiled: February 21, 2013Publication date: August 22, 2013Applicant: MOLECULAR IMPRINTS, INC.Inventors: Byung-Jin Choi, Se Hyun Ahn, Mahadevan GanapathiSubramanian, Michael N. Miller, Sidlgata V. Sreenivasan
-
Patent number: 8309008Abstract: Systems, methods, and processes for separating a template from a substrate retained on an air cavity chuck during an imprint lithography process. Generally, vacuum level provided by air cavity chuck may be controlled during conforming of polymerizable material between the template and the substrate and during separation of the template and the substrate.Type: GrantFiled: October 21, 2009Date of Patent: November 13, 2012Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Mahadevan Ganapathisubramanian
-
Patent number: 8237133Abstract: Energy sources and methods for curing in an imprint lithography system are described. The energy sources may include one or more energy elements positioned outside of the viewing range of an imaging unit monitoring elements of the imprint lithography system. Each energy source is configured to provide energy along a path to solidify polymerizable material on a substrate.Type: GrantFiled: July 29, 2009Date of Patent: August 7, 2012Assignee: Molecular Imprints, Inc.Inventors: Mahadevan Ganapathisubramanian, Byung-Jin Choi, Liang Wang, Alex Ruiz
-
Patent number: 8231821Abstract: Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate.Type: GrantFiled: November 2, 2009Date of Patent: July 31, 2012Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Mahadevan GanapathiSubramanian
-
Patent number: 8215946Abstract: System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.Type: GrantFiled: October 20, 2009Date of Patent: July 10, 2012Assignee: Molecular Imprints, Inc.Inventors: Mahadevan GanapathiSubramanian, Byung-Jin Choi, Mario Johannes Meissl
-
Publication number: 20110260361Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.Type: ApplicationFiled: April 27, 2011Publication date: October 27, 2011Applicant: Molecular Imprints, Inc.Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Patent number: 7906058Abstract: A method for spreading a conformable material between a substrate and a template having a mold. The method comprises positioning the mold to be in superimposition with the substrate defining a volume therebetween. A first sub-portion of the volume is charged with the conformable material through capillary action between the conformable material and one of the mold and the substrate. A second sub-portion of the volume is filled with the conformable material by creating a deformation in the mold.Type: GrantFiled: December 16, 2005Date of Patent: March 15, 2011Assignee: Molecular Imprints, Inc.Inventors: Mahadevan GanapathiSubramanian, Byung-Jin Choi, Michael N. Miller, Nicholas A. Stacey, Michael P. C. Watts