Patents by Inventor Mahesh Adinath KANAWADE

Mahesh Adinath KANAWADE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate support cover for high-temperature corrosive environment
    Patent number: 11866821
    Abstract: Embodiments of the present disclosure generally relate to an apparatus and a method for cleaning a processing chamber. In one embodiment, a substrate support cover includes a bulk member coated with a fluoride coating. The substrate support cover is placed on a substrate support disposed in the processing chamber during a cleaning process. The fluoride coating does not react with the cleaning species. The substrate support cover protects the substrate support from reacting with the cleaning species, leading to reduced condensation formed on chamber components, which in turn leads to reduced contamination of the substrate in subsequent processes.
    Type: Grant
    Filed: March 2, 2020
    Date of Patent: January 9, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Shuran Sheng, Lin Zhang, Jiyong Huang, Joseph C. Werner, Stanley Wu, Mahesh Adinath Kanawade, Yikai Chen, Yixing Lin, Ying Ma
  • SUBSTRATE SUPPORT COVER FOR HIGH-TEMPERATURE CORROSIVE ENVIRONMENT
    Publication number: 20200370174
    Abstract: Embodiments of the present disclosure generally relate to an apparatus and a method for cleaning a processing chamber. In one embodiment, a substrate support cover includes a bulk member coated with a fluoride coating. The substrate support cover is placed on a substrate support disposed in the processing chamber during a cleaning process. The fluoride coating does not react with the cleaning species. The substrate support cover protects the substrate support from reacting with the cleaning species, leading to reduced condensation formed on chamber components, which in turn leads to reduced contamination of the substrate in subsequent processes.
    Type: Application
    Filed: March 2, 2020
    Publication date: November 26, 2020
    Inventors: Shuran SHENG, Lin ZHANG, Jiyong HUANG, Joseph C. WERNER, Stanley WU, Mahesh Adinath KANAWADE, Yikai CHEN, Yixing LIN, Ying MA