Patents by Inventor Makiko Umezaki
Makiko Umezaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11479627Abstract: A film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process, and a method for forming the film. A film forming composition for use in a lithography process includes a surfactant containing a polymer and an oligomer having a C3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure may further include an alkyl partial structure. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further includes a coating film resin, the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.Type: GrantFiled: January 30, 2015Date of Patent: October 25, 2022Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko Umezaki, Ryo Karasawa, Shuhei Shigaki, Ryuta Mizuochi
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Patent number: 11459414Abstract: Methods for forming a film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process. A film forming composition for use in a lithography process includes a surfactant containing a polymer and an oligomer having a C3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure may further include an alkyl partial structure. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further includes a coating film resin, the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acrylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.Type: GrantFiled: December 18, 2020Date of Patent: October 4, 2022Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko Umezaki, Ryo Karasawa, Shuhei Shigaki, Ryuta Mizuochi
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Publication number: 20210102088Abstract: Methods for forming a film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process. A film forming composition for use in a lithography process includes a surfactant containing a polymer and an oligomer having a C3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure may further include an alkyl partial structure. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further includes a coating film resin, the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acrylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.Type: ApplicationFiled: December 18, 2020Publication date: April 8, 2021Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko UMEZAKI, Ryo KARASAWA, Shuhei SHIGAKI, Ryuta MIZUOCHI
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Patent number: 10724028Abstract: The invention provides a ligand-bonded fiber in which a ligand having affinity for a cell membrane receptor is immobilized on a fiber precursor, and a cell culture substrate capable of repeating ex vivo amplification of a cell expressing a cell membrane receptor by using the ligand-bonded fiber.Type: GrantFiled: October 30, 2015Date of Patent: July 28, 2020Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko Umezaki, Takahiro Kishioka, Taito Nishino, Ayako Aihara, Shunsuke Iwamoto, Daisuke Sakuma
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Patent number: 10240122Abstract: A composition for producing a fiber, containing (A) a polymer compound containing a unit structure represented by the formula (1) and a unit structure represented by the formula (2), (B) a crosslinking agent, (C) an acid compound, and (D) a solvent wherein each symbol in the formulas (1) and (2) is as described in the DESCRIPTION.Type: GrantFiled: February 13, 2015Date of Patent: March 26, 2019Assignees: NISSAN CHEMICAL INDUSTRIES, LTD., KYOTO UNIVERSITYInventors: Makiko Umezaki, Takahiro Kishioka, Taito Nishino, Ayako Otani, Kenichiro Kamei, Li Liu, Yong Chen
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Patent number: 9957644Abstract: The invention provides a composition for the production of a fiber having organic solvent resistance, a fiber obtained by spinning the composition, and a biocompatible material containing the fiber. The composition contains (A) a polymer compound containing a unit structure represented by the formula (1) wherein each symbol is as described herein, (B) a crosslinking agent, (C) an acid compound, and (D) a solvent.Type: GrantFiled: August 29, 2014Date of Patent: May 1, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko Umezaki, Takahiro Kishioka, Taito Nishino, Ayako Otani
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Publication number: 20180010115Abstract: The invention provides a ligand-bonded fiber in which a ligand having affinity for a cell membrane receptor is immobilized on a fiber precursor, and a cell culture substrate capable of repeating ex vivo amplification of a cell expressing a cell membrane receptor by using the ligand-bonded fiber.Type: ApplicationFiled: October 30, 2015Publication date: January 11, 2018Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko UMEZAKI, Takahiro KISHIOKA, Taito NISHINO, Ayako AIHARA, Shunsuke IWAMOTO, Daisuke SAKUMA
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Publication number: 20170044491Abstract: A composition for producing a fiber, containing (A) a polymer compound containing a unit structure represented by the formula (1) and a unit structure represented by the formula (2), (B) a crosslinking agent, (C) an acid compound, and (D) a solvent wherein each symbol in the formulas (1) and (2) is as described in the DESCRIPTION.Type: ApplicationFiled: February 13, 2015Publication date: February 16, 2017Applicants: NISSAN CHEMICAL INDUSTRIES, LTD., KYOTO UNIVERSITYInventors: Makiko UMEZAKI, Takahiro KISHIOKA, Taito NISHINO, Ayako OTANI, Kenichiro KAMEI, Li LIU, Yong CHEN
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Publication number: 20160347965Abstract: A film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process, and a method for forming the film. A film forming composition for use in a lithography process includes a surfactant containing a polymer and an oligomer having a C3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure may further include an alkyl partial structure. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further includes a coating film resin, the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.Type: ApplicationFiled: January 30, 2015Publication date: December 1, 2016Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko UMEZAKI, Ryo KARASAWA, Shuhei SHIGAKI, Ryuta MIZUOCHI
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Publication number: 20160305044Abstract: The invention provides a fiber which is superior in safety, can be conveniently produced, and has organic solvent resistance, as well as a starting material composition for producing the fiber and a biocompatible material containing the fiber. The fiber is produced by spinning a composition containing (A) a condensation product obtained by condensing one or more kinds of a compound represented by the formula (1), and (B) an acid compound: wherein each symbol is as defined herein.Type: ApplicationFiled: December 19, 2014Publication date: October 20, 2016Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Takahiro KISHIOKA, Makiko UMEZAKI, Ayako OTANI
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Patent number: 9436085Abstract: A composition for forming a resist underlayer film to be used in a lithography process, that includes: a polymer containing unit structures of Formula (1), Formula (2), and Formula (3): the polymer being a polymer in which the unit structure of Formula (1) has a ratio of mole number (a) within a range of 0.20?a?0.90, the unit structure of Formula (2) has a ratio of mole number (b) within a range of 0.05?b?0.60, and the unit structure of Formula (3) has a ratio of mole number (c) within a range of 0.001?c?0.40, when a total mole number of all unit structures constituting the polymer is 1.0, and the polymer having a weight average molecular weight of 3,000 to 100,000; a crosslinkable compound; a photoacid generator; and a solvent.Type: GrantFiled: December 6, 2010Date of Patent: September 6, 2016Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yusuke Horiguchi, Makiko Umezaki, Noriaki Fujitani, Hirokazu Nishimaki, Takahiro Kishioka, Takahiro Hamada
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Publication number: 20160201226Abstract: The invention provides a composition for the production of a fiber having organic solvent resistance, a fiber obtained by spinning the composition, and a biocompatible material containing the fiber. The composition contains (A) a polymer compound containing a unit structure represented by the formula (1) wherein each symbol is as described herein, (B) a crosslinking agent, (C) an acid compound, and (D) a solvent.Type: ApplicationFiled: August 29, 2014Publication date: July 14, 2016Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko UMEZAKI, Takahiro KISHIOKA, Taito NISHINO, Ayako OTANI
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Patent number: 9340561Abstract: There is provided a novel organic silicon compound that can be used for a silane coupling agent. An organic silicon compound of Formula (1): (where A? is Formula (2) or Formula (3): E is Formula (4) or Formula (5): R1 and R2 are each independently a C1-5 alkyl group, R3 is a hydrogen atom or a methyl group, R4 and R5 are each independently a C1-5 alkyl group, m, n, and p are each independently an integer of 1 to 5, and q is an integer of 1 to 3).Type: GrantFiled: August 28, 2012Date of Patent: May 17, 2016Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko Umezaki, Daisuke Sakuma, Taito Nishino, Takahiro Kishioka, Yoshiomi Hiroi, Shigeo Kimura, Tomoya Ohashi, Yuki Usui
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Patent number: 9140989Abstract: A material forms a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition includes water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the water-soluble organic particles of the photosensitive composition includes a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further includes a photoacid generator.Type: GrantFiled: April 11, 2012Date of Patent: September 22, 2015Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Takahiro Kishioka, Makiko Umezaki, Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi, Yuki Usui
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Publication number: 20140370182Abstract: There is provided a novel organic silicon compound that can be used for a silane coupling agent. An organic silicon compound of Formula (1): (where A? is Formula (2) or Formula (3): E is Formula (4) or Formula (5): R1 and R2 are each independently a C1-5 alkyl group, R3 is a hydrogen atom or a methyl group, R4 and R5 are each independently a C1-5 alkyl group, m, n, and p are each independently an integer of 1 to 5, and q is an integer of 1 to 3).Type: ApplicationFiled: August 28, 2012Publication date: December 18, 2014Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko Umezaki, Daisuke Sakuma, Taito Nishino, Takahiro Kishioka, Yoshiomi Hiroi, Shigeo Kimura, Tomoya Ohashi, Yuki Usui
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Publication number: 20140045119Abstract: A material forms a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition includes water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the water-soluble organic particles of the photosensitive composition includes a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further includes a photoacid generator.Type: ApplicationFiled: April 11, 2012Publication date: February 13, 2014Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Takahiro Kishioka, Makiko Umezaki, Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi, Yuki Usui
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Publication number: 20120288795Abstract: A composition for forming a photosensitive resist underlayer film and a method for forming a resist pattern. The composition for forming a photosensitive resist underlayer film includes a polymer having a structural unit of Formula (1), a compound having at least two vinyl ether groups, a photo-acid generator; and a solvent: where R1 is a hydrogen atom or a methyl group, R2 is a C1-4 alkyl group, and i is an integer of 0 to 4.Type: ApplicationFiled: November 16, 2010Publication date: November 15, 2012Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Makiko Umezaki, Takahiro Kishioka, Yusuke Horiguchi, Hirokazu Nishimaki, Tomoya Ohashi, Yuki Usui
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Publication number: 20120251950Abstract: A composition for forming a resist underlayer film to be used in a lithography process, that includes: a polymer containing unit structures of Formula (1), Formula (2), and Formula (3): the polymer being a polymer in which the unit structure of Formula (1) has a ratio of mole number (a) within a range of 0.20?a?0.90, the unit structure of Formula (2) has a ratio of mole number (b) within a range of 0.05?b?0.60, and the unit structure of Formula (3) has a ratio of mole number (c) within a range of 0.001?c?0.40, when a total mole number of all unit structures constituting the polymer is 1.0, and the polymer having a weight average molecular weight of 3,000 to 100,000; a crosslinkable compound; a photoacid generator; and a solvent.Type: ApplicationFiled: December 6, 2010Publication date: October 4, 2012Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yusuke Horiguchi, Makiko Umezaki, Noriaki Fujitani, Hirokazu Nishimaki, Takahiro Kishioka, Takahiro Hamada