Patents by Inventor Makoto Anan

Makoto Anan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240182463
    Abstract: The present invention provides a compound having antiviral effects, particularly having growth inhibitory activity on influenza viruses, a preferred example of the compound being a substituted 3-hydroxy-4-pyridone derivative prodrug having cap-dependent endonuclease inhibitory activity.
    Type: Application
    Filed: August 4, 2023
    Publication date: June 6, 2024
    Applicant: Shionogi & Co., Ltd.
    Inventors: Chika TAKAHASHI, Hidenori MIKAMIYAMA, Toshiyuki AKIYAMA, Kenji TOMITA, Yoshiyuki TAODA, Makoto KAWAI, Kosuke ANAN, Masayoshi MIYAGAWA, Naoyuki SUZUKI
  • Patent number: 7920274
    Abstract: A method of measuring topology of functional liquid in a pixel, in which thickness or volume of the functional liquid in the pixel is measured by a surface topology measuring apparatus comprising: measuring surface topologies in which surface topology of the functional liquid in the pixel and surface topology of the bank are measured by the surface topology measuring apparatus, and measurement parameters regarding the surface topologies are generated; adding a bank height in which a height parameter of a height of the bank is added to the measurement parameter of a surface of the functional liquid in the pixel of the measurement parameter generated; and calculating topology in which the thickness or the volume of the functional liquid in the pixel is calculated based on the added measurement parameter of the surface of the functional liquid in the pixel and the measurement parameter of the surface of the bank.
    Type: Grant
    Filed: March 9, 2010
    Date of Patent: April 5, 2011
    Assignee: Seiko Epson Corporation
    Inventors: Hirofumi Sakai, Makoto Anan
  • Publication number: 20100165354
    Abstract: A method of measuring topology of functional liquid in a pixel, in which thickness or volume of the functional liquid in the pixel is measured by a surface topology measuring apparatus comprising: measuring surface topologies in which surface topology of the functional liquid in the pixel and surface topology of the bank are measured by the surface topology measuring apparatus, and measurement parameters regarding the surface topologies are generated; adding a bank height in which a height parameter of a height of the bank is added to the measurement parameter of a surface of the functional liquid in the pixel of the measurement parameter generated; and calculating topology in which the thickness or the volume of the functional liquid in the pixel is calculated based on the added measurement parameter of the surface of the functional liquid in the pixel and the measurement parameter of the surface of the bank.
    Type: Application
    Filed: March 9, 2010
    Publication date: July 1, 2010
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hirofumi SAKAI, Makoto ANAN
  • Patent number: 7705997
    Abstract: A method of measuring topology of functional liquid in a pixel, in which thickness or volume of the functional liquid in the pixel is measured by a surface topology measuring apparatus comprising: measuring surface topologies in which surface topology of the functional liquid in the pixel and surface topology of the bank are measured by the surface topology measuring apparatus, and measurement parameters regarding the surface topologies are generated; adding a bank height in which a height parameter of a height of the bank is added to the measurement parameter of a surface of the functional liquid in the pixel of the measurement parameter generated; and calculating topology in which the thickness or the volume of the functional liquid in the pixel is calculated based on the added measurement parameter of the surface of the functional liquid in the pixel and the measurement parameter of the surface of the bank.
    Type: Grant
    Filed: January 8, 2008
    Date of Patent: April 27, 2010
    Assignee: Seiko Epson Corporation
    Inventors: Hirofumi Sakai, Makoto Anan
  • Publication number: 20080180686
    Abstract: A method of measuring topology of functional liquid in a pixel, in which thickness or volume of the functional liquid in the pixel is measured by a surface topology measuring apparatus comprising: measuring surface topologies in which surface topology of the functional liquid in the pixel and surface topology of the bank are measured by the surface topology measuring apparatus, and measurement parameters regarding the surface topologies are generated; adding a bank height in which a height parameter of a height of the bank is added to the measurement parameter of a surface of the functional liquid in the pixel of the measurement parameter generated; and calculating topology in which the thickness or the volume of the functional liquid in the pixel is calculated based on the added measurement parameter of the surface of the functional liquid in the pixel and the measurement parameter of the surface of the bank.
    Type: Application
    Filed: January 8, 2008
    Publication date: July 31, 2008
    Inventors: Hirofumi Sakai, Makoto Anan
  • Patent number: 6158648
    Abstract: High frequency electrical discharge or nonpolar discharge using microwaves is generated in a gas that is introduced into a gas duct formed by a dielectric material, such as glass or ceramic. Surface treatment is applied to the components, which are under atmospheric pressure, by exposing them to the gas flow containing the active species generated by the above mentioned electrical discharge. Components are soldered before, during, or after the application of this surface treatment. The surface of the components is exposed to the active species by either directly exposing the components to the electrical discharge, or by blasting the reactive gas flow containing the active species at them. By selecting an appropriate gas for generating the active species, it is possible to improve the wettability of the surface of the component to be soldered, or to remove the organic substances or the oxide film.
    Type: Grant
    Filed: March 11, 1998
    Date of Patent: December 12, 2000
    Assignee: Seiko Epson Corporation
    Inventors: Yoshiaki Mori, Takuya Miyakawa, Yasuhiko Asano, Osamu Kurashina, Satoshi Miyamori, Yohei Kurashima, Makoto Anan
  • Patent number: 5736349
    Abstract: There are disclosed a magnetic particle for an immunoassay method, which comprises a core and a coating layer formed on the surface of the core wherein said core comprises an organic polymer matrix and said coating layer comprises a mixed crystal ferrite represented by the formula:M.sub.x Fe.sub.(3-x) O.sub.4wherein M represents at least one metal selected from the group consisting of Mn, Ni, Zn, Co, Cu, Mg, Sn, Ca and Cd, and x is a number satisfying the relation: 0<x<3,and an antigen or an antibody is bound onto the surface of the coating layer and wherein said particle has a particle size of 0.03 to 10 .mu.m, and an immunoassay method using the same.
    Type: Grant
    Filed: May 12, 1995
    Date of Patent: April 7, 1998
    Assignees: Nippon Paint Co., Ltd., Fujirebio Inc. (Fujirebio Kabushiki Kaisha)
    Inventors: Motohiro Sasaki, Masahiko Matsukawa, Katsuaki Yoshioka, Makoto Anan, Mitsuo Isomura, Yoshihiro Ashihara, Masahisa Okada
  • Patent number: 5735451
    Abstract: High frequency electrical discharge or nonpolar discharge using microwaves is generated in a gas that is introduced into a gas duct formed by a dielectric material, such as glass or ceramic. Surface treatment is applied to components, which are under atmospheric pressure, by exposing them to the gas flow containing the active species generated by the above mentioned electrical discharge. The components are soldered before, during, or after the application of this surface treatment. The surface of the components is exposed to the active species by either directly exposing the components to the electrical discharge, or by directing the reactive gas flow containing the active species at the component surfaces. By selecting an appropriate gas for generating the active species, it is possible to improve the wettability of the surface of the component to be soldered, or to remove organic substances or oxide film surfaces.
    Type: Grant
    Filed: February 10, 1995
    Date of Patent: April 7, 1998
    Assignee: Seiko Epson Corporation
    Inventors: Yoshiaki Mori, Takuya Miyakawa, Yasuhiko Asano, Osamu Kurashina, Satoshi Miyamori, Yohei Kurashima, Makoto Anan