Patents by Inventor Makoto Fukutomi

Makoto Fukutomi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4690887
    Abstract: Disclosed is a method for forming micro-patterns on base plates such as for semiconductor integrated circuits, particularly by development, wherein a radiation sensitive negative resist film is formed on the base plate and irradiated according to pattern designs, and the non-irradiated portions of the film is dissolved by a liquid developer comprising a mixture of a good solvent selected from the group of alkyl esters of acetic acid, having an alkyl group containing 1 to 5 carbon atoms, and a poor solvent selected from the group consisting of alicyclic compounds and alkyl ethers of ethyleneglycol having an alkyl group containing 1 to 5 carbon atoms. The method can minimize swelling of irradiated portions of the resist film and can accelerate dissolution of non-irradiated portions of the resist film, so that desired micro-patterns with excellent edge shape quality can be obtained.
    Type: Grant
    Filed: November 22, 1985
    Date of Patent: September 1, 1987
    Assignees: Nippon Telegraph and Telephone Corporation, Toyo Soda Manufacturing Co., Ltd.
    Inventors: Mitsutoshi Fukuda, Makoto Fukutomi, Osamu Kogure, Kazunori Miyoshi