Patents by Inventor Makoto Kitoh
Makoto Kitoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7220773Abstract: A novel pyrrole derivative represented by the following formula (1) and a salt thereof: wherein R1 means substituted alkenyl, etc.; R2 means substituted benzoyl, etc.; and R3 to R5 each means hydrogen, alkyl, halogeno, etc. The derivative and salt have antidiabetic activity.Type: GrantFiled: April 17, 2002Date of Patent: May 22, 2007Assignee: Dainippon Sumitomo Pharma Co., Ltd.Inventors: Ryu Nagata, Katsunori Maruta, Kiyotaka Iwai, Makoto Kitoh, Kantaro Ushiroda, Kozo Yoshida
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Publication number: 20050227978Abstract: Medicament being useful as a fibrosis inhibitor for organs or tissues, which comprises a compound of the formula (I): wherein Ring Z is optionally substituted pyrrole ring, etc.; W2 is —CO—, —SO2—, optionally substituted C1-C4 alkylene, etc.; Ar2 is optionally substituted aryl, etc.; W1 and Ar1 mean the following (1) and (2): (1) W1 is optionally substituted C1-C4 alkylene, etc.; Ar1 is optionally substituted bicyclic heteroaryl having 1 to 4 nitrogen atoms as ring-forming atoms: (2) W1 is optionally substituted C2-C5 alkylene, optionally substituted C2-C5 alkenylene, etc.; and Ar1 is aryl or monocyclic heteroaryl, which is substituted by carboxyl, alkoxycarbonyl, etc. at the ortho- or meta-position thereof with respect to the binding position of W1, or a pharmaceutically acceptable salt thereof.Type: ApplicationFiled: January 28, 2003Publication date: October 13, 2005Applicant: Sumitomo Pharmaceuticals Co., Ltd.Inventors: Teruhisa Tokunaga, Willian Hume, Makoto Kitoh, Ryu Nagata, Michiko Kishino, Tsutomu Nakagawa, Jun Nagamine, Mutsuo Taiji
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Publication number: 20040209939Abstract: Pyrrole derivatives represented by the following formula: 1Type: ApplicationFiled: May 7, 2004Publication date: October 21, 2004Applicant: Sumitomo Pharmaceuticals Co., Ltd.Inventors: Teruhisa Tokunaga, William Ewan Hume, Makoto Kitoh, Ryu Nagata
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Publication number: 20040162331Abstract: A novel pyrrole derivative represented by the following formula (1) and a salt thereof: 1Type: ApplicationFiled: October 16, 2003Publication date: August 19, 2004Inventors: Ryu Nagata, Katsunori Maruta, Kiyotaka Iwai, Makoto Kitoh, Kantaro Ushiroda, Kozo Yoshida
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Patent number: 6759429Abstract: Pyrrole derivatives represented by the following formula: wherein Ring Z is an optionally substituted pyrrole ring, etc.; W2 is —CO—, —SO2—, an optionally substituted C1-C4 alkylene, etc.; Ar2 is an optionally substituted aryl, etc.; W1 and Ar1 mean the following (1) and (2): (1) W1 is an optionally substituted C1-C4 alkylene, etc.; Ar1 is an optionally substituted bicyclic heteroaryl having 1 to 4 nitrogen atoms as ring-forming atoms: (2) W1 is an optionally substituted C2-C5 alkylene, an optionally substituted C2-C5 alkenylene, etc.; and Ar1 is an aryl or monocyclic heteroaryl, which are substituted by carboxyl, an alkoxycarbonyl, etc. at the ortho- or meta-position thereof with respect to the binding position of W1, or a pharmaceutically acceptable salt thereof. These compounds are useful as medicaments such as a fibrosis inhibitor for organs or tissues.Type: GrantFiled: January 28, 2003Date of Patent: July 6, 2004Assignee: Sumitomo Pharmaceuticals Co., Ltd.Inventors: Teruhisa Tokunaga, William Ewan Hume, Makoto Kitoh, Ryu Nagata
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Publication number: 20030181496Abstract: Pyrrole derivatives represented by the following formula: 1Type: ApplicationFiled: January 28, 2003Publication date: September 25, 2003Inventors: Teruhisa Tokunaga, William Ewan Hume, Makoto Kitoh, Ryu Nagata
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Patent number: 5651867Abstract: A plasma processing apparatus comprising: a vacuum container; an evacuation means for keeping the interior of the vacuum container at a pressure not higher than atmospheric pressure; a substrate support device for supporting a substrate to be subjected to plasma processing; an electrode for generating plasma in cooperation with the substrate support; a voltage supply for applying a voltage to the electrode; a gas introducing system for introducing a gaseous material into a space where the plasma is produced; a surrounding member for enclosing the space above the substrate support, and a drive for relatively moving the surrounding member to space an end of the surrounding member proximate from the substrate from at least one of the substrate support and the substrate supported thereon by a distance which is short enough to suppress plasma leakage during the plasma processing and to position the end of the surrounding member away from said at least one of the substrate support and the substrate thereon for charType: GrantFiled: October 2, 1990Date of Patent: July 29, 1997Assignee: Hitachi, Ltd.Inventors: Yuichi Kokaku, Hiroyuki Kataoka, Makoto Kitoh, Shigehiko Fujimaki, Satoshi Matsunuma, Kenji Furusawa, Nobuo Nakagawa, Katsuo Abe, Masaaki Hayashi
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Patent number: 5409738Abstract: Disclosed are a recording medium comprising a substrate, a thin film for recording formed on at least one side of the substrate, a protective layer formed on the thin film, and a lubricative film formed on the protective layer, the lubricative film comprising an oxidative polymerization product having main molecular chains chemically bonded to the protective film; and a process for producing the recording medium. This recording medium is excellent in lubricity and durability, and the layers formed thereon can be very thin.Type: GrantFiled: March 23, 1994Date of Patent: April 25, 1995Assignee: Hitachi, Ltd.Inventors: Satoshi Matsunuma, Yuichi Kokaku, Makoto Kitoh, Shigehiko Fujimaki
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Patent number: 5300189Abstract: A surface treatment method and apparatus permitting the treatment of a film with plasma with a high treatment speed and a high efficiency without uselessly complicating the construction of a device for realizing it are disclosed. The area where the counter electrode is in contact with the plasma is sufficiently larger than the area where the rotating electrode is in contact therewith. The ratio of the areas is preferably not smaller than 1.5 and the etching speed may be increased to a value more than ten times as great as that obtained by a prior art method.Type: GrantFiled: May 20, 1987Date of Patent: April 5, 1994Assignee: Hitachi, Ltd.Inventors: Yuichi Kokaku, Makoto Kitoh, Yoshinori Honda
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Patent number: 5275850Abstract: A magnetic disk comprising a nonmagnetic substrate, a metallic thin film magnetic layer provided on the substrate and a hard carbon protective layer provided on the magnetic layer, the hard carbon protective layer containing at least one metal element of silicon, germanium, tin and lead, or further containing fluorine, formed by bias plasma CVD treatment, has a high attrition resistance, a high peeling resistance and a high crack resistance or further a higher corrosion resistance.Type: GrantFiled: September 4, 1991Date of Patent: January 4, 1994Assignee: Hitachi, Ltd.Inventors: Makoto Kitoh, Yuichi Kokaku, Makiko Itoh
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Patent number: 5104709Abstract: The magnetic recording medium of the present invention comprises(a) a non-magnetic substrate,(b) a magnetic recording layer containing at least one ferromagnetic substance on at least one side of the substrate,(c) a protective layer the magnetic recording layer, and(d) a lubricant layer on the protective layer, wherein an adhesion-strengthening substance which is at least one member selected from the group consisting of metals and metal compounds is distributed substantially uniformly on the layer (c) at the interface between the layer (c) and the layer (d) so as not to cover the whole surface of the layer (c) and so as to contact also with the layer (d).Type: GrantFiled: June 19, 1990Date of Patent: April 14, 1992Assignee: Hitachi, Ltd.Inventors: Yuichi Kokaku, Satoshi Matsunuma, Shigehiko Fujimaki, Makoto Kitoh, Kenji Furusawa
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Patent number: 5073243Abstract: An optical recording medium is made by sputtering a polymeric material in an evacuated chamber to form an under layer on a substrate having a preformed grooved pattern of prepits and pregrooves, and then forming a recording layer on the underlayer in the chamber continuously after forming the underlayer. Said under layer is made of a high polymeric material which can be melted, sublimated, or decomposed at a lower temperature than the melting point, the sublimating point, or the decomposing temperature of said recording layer. Accordingly, said under layer can relax the thermal shock transferred from said substrate into said recording layer, and the deformation of said substrate can be prevented, even though a laser beam for playback is repeatedly radiated onto said recording layer, and said optical recording medium has a larger recording sensitivity than the recording sensitivity of an optical recording disc of a prior art.Type: GrantFiled: December 29, 1989Date of Patent: December 17, 1991Assignees: Hitachi Maxwell, Ltd, Hitachi, LtdInventors: Akira Gotoh, Yukinobu Yamazaki, Naoyuki Kikuchi, Shinkichi Horigome, Motoyasu Terao, Horoyuki Suzuki, Makoto Kitoh, Yuichi Kokaku, Mitsuru Shimizu
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Patent number: 4908250Abstract: In an optical recording medium, an under layer is formed between an even pattern of a substrate and a recording layer, and said under layer is made of a high polymeric material which can be melted, sublimated, or decomposed at a lower temperature than the melting point, the sublimating point, or the decomposing temperature of said recording layer. Accordingly, said under layer can relax the thermal shock transferred from said substrate into said recording layer, and the deformation of said substrate can be prevented, even through a laser beam for playback is repeatedly radiated onto said recording layer, and said optical recording medium has a larger recording sensitivity than the recording sensitivity of an optical recording disc of a prior art.Type: GrantFiled: September 19, 1988Date of Patent: March 13, 1990Assignees: Hitachi Maxell, Ltd., Hitachi, Ltd.Inventors: Akira Gotoh, Yukinobu Yamazaki, Naoyuki Kikuchi, Shinkichi Horigome, Motoyasu Terao, Hiroyuki Suzuki, Makoto Kitoh, Yuichi Kokaku, Mitsuru Shimizu
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Patent number: 4713288Abstract: Disclosed is a magnetic recording medium in which a magnetic layer of a ferromagnetic material, a layer of an organic material and a layer of carbon are formed on a substrate in this order.The magnetic recording medium has the benefit of remarkably extended life time because peeling and removing of the carbon protective layer can be prevented so that carbon can exerts its own lubricating action during the sliding contact of the magnetic recording medium with a magnetic head.Type: GrantFiled: June 4, 1986Date of Patent: December 15, 1987Assignee: Hitachi, Ltd.Inventors: Yuuichi Kokaku, Makoto Kitoh, Yoshinori Honda
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Patent number: 4460535Abstract: Good adhesion to cases or bobbins of flyback transformers is realized in the flyback transformers produced by insulation treatment with an unsaturated polyester resin adhesive.Type: GrantFiled: December 4, 1981Date of Patent: July 17, 1984Assignees: Hitachi, Ltd., Hitachi Chemical Company, Ltd.Inventors: Makoto Kitoh, Tetsuo Tajima, Noboru Terunuma, Noboru Mitsugi, Akira Kageyama