Patents by Inventor Makoto Murayama
Makoto Murayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240189284Abstract: The present invention aims to provide a composition for promoting lipolysis and a method of promoting lipolysis. The present invention relates to a composition for promoting lipolysis, the composition containing L-ergothioneine or a salt thereof as an active ingredient.Type: ApplicationFiled: March 25, 2022Publication date: June 13, 2024Applicant: SUNTORY HOLDINGS LIMITEDInventors: Makoto Katsube, Hiroshi Watanabe, Norihito Murayama
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Publication number: 20240180876Abstract: The present invention aims to provide a composition for increasing at least one of red blood cell count or hemoglobin level, a composition for preventing or reducing anemia, a composition for improving endurance, an antifatigue composition, a method of increasing at least one of red blood cell count or hemoglobin level, a method of preventing or reducing anemia, a method of improving endurance, and a method of reducing, alleviating, or preventing fatigue or recovering from fatigue. The present invention relates to a composition for increasing at least one of red blood cell count or hemoglobin level, containing L-ergothioneine or a salt thereof as an active ingredient.Type: ApplicationFiled: March 25, 2022Publication date: June 6, 2024Applicant: SUNTORY HOLDINGS LIMITEDInventors: Makoto Katsube, Hiroshi Watanabe, Norihito Murayama
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Publication number: 20240180877Abstract: The present invention aims to provide an anxiolytic composition for humans and a method of preventing or reducing an anxiety symptom. The present invention relates to an anxiolytic composition for humans, containing L-ergothioneine or a salt thereof as an active ingredient.Type: ApplicationFiled: March 25, 2022Publication date: June 6, 2024Applicant: SUNTORY HOLDINGS LIMITEDInventors: Makoto Katsube, Hiroshi Watanabe, Norihito Murayama
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Publication number: 20240173298Abstract: The present invention aims to provide a composition for reducing renal function decline or ameliorating renal function and a method of reducing renal function decline or ameliorating renal function. The present invention relates to a composition for reducing renal function decline or ameliorating renal function, the composition containing L-ergothioneine or a salt thereof as an active ingredient.Type: ApplicationFiled: March 25, 2022Publication date: May 30, 2024Applicant: SUNTORY HOLDINGS LIMITEDInventors: Makoto Katsube, Hiroshi Watanabe, Norihito Murayama
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Publication number: 20240156785Abstract: The present invention aims to provide a composition for improving a blood cholesterol level and a method of improving a blood cholesterol level. The present invention relates to a composition for improving a human blood cholesterol level, which contains L-ergothioneine or a salt thereof as an active ingredient.Type: ApplicationFiled: March 25, 2022Publication date: May 16, 2024Applicant: SUNTORY HOLDINGS LIMITEDInventors: Makoto Katsube, Hiroshi Watanabe, Norihito Murayama
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Patent number: 11915084Abstract: An antenna device is provided as a near-field communication antenna device that is configured by arranging a plurality of loop antennas. Each loop antenna includes a plurality of parallel circuits each having a capacitor and a resistance element; and a plurality of looped conductors in a shape of a loop that is divided. The divided looped conductors are connected to each other via the parallel circuits, and the plurality of looped conductors and the plurality of parallel circuits form a loop.Type: GrantFiled: April 21, 2022Date of Patent: February 27, 2024Assignee: MURATA MANUFACTURING CO., LTD.Inventors: Hiromi Murayama, Noboru Kato, Noriyuki Ueki, Yoichi Saito, Makoto Yasutake
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Patent number: 7632132Abstract: A module connector reliably locks a module such as a camera module, which is accommodated, to prevent the module from falling and make a module connector in lower profile. This module connector has contact pins (120) that electrically connect with the module inside a container (110) in which the camera module is inserted. Retaining members (150) are provided in sides of the container (110), elastically deform when the module is inserted such that claw parts (159), which form the tip parts of arm parts (158) projecting toward the container (110), move to the sides of the container (110), and engage with an engaged part (230) of the camera module accommodated in the container (110). An arm part (158) connects with an upper end part of a second body part (156) bent from the tip of a first body part (154), which projects toward the container (110) in the side of the container (110), in the direction going away from the container (110) and extends upward.Type: GrantFiled: June 13, 2008Date of Patent: December 15, 2009Assignee: Mitsumi Electric Co., Ltd.Inventors: Atsushi Nishio, Takashi Kawasaki, Makoto Murayama
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Patent number: 7604925Abstract: A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing the light pattern is formed by illuminating a mask with excimer laser light having an annular shape.Type: GrantFiled: April 29, 2005Date of Patent: October 20, 2009Assignee: Renesas Technology CorporationInventors: Minori Noguchi, Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama
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Patent number: 7598020Abstract: A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device through an object lens, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing, the light pattern projected on the substrate is formed by excimer laser light which is emitted from an annular shaped light source and which is passed through a mask having a phase shifter.Type: GrantFiled: April 29, 2005Date of Patent: October 6, 2009Assignee: Renesas Technology CorporationInventors: Minori Noguchi, Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama
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Publication number: 20080311782Abstract: A module connector reliably locks a module such as a camera module, which is accommodated, to prevent the module from falling and make a module connector in lower profile. This module connector has contact pins (120) that electrically connect with the module inside a container (110) in which the camera module is inserted. Retaining members (150) are provided in sides of the container (110), elastically deform when the module is inserted such that claw parts (159), which form the tip parts of arm parts (158) projecting toward the container (110), move to the sides of the container (110), and engage with an engaged part (230) of the camera module accommodated in the container (110). An arm part (158) connects with an upper end part of a second body part (156) bent from the tip of a first body part (154), which projects toward the container (110) in the side of the container (110), in the direction going away from the container (110) and extends upward.Type: ApplicationFiled: June 13, 2008Publication date: December 18, 2008Applicant: MITSUMI ELECTRIC CO., LTDInventors: Atsushi Nishio, Takashi Kawasaki, Makoto Murayama
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Patent number: 7277155Abstract: A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a first light pattern on the substrate of the semiconductor device the first light pattern being formed by passing light through a first mask, and exposing the resist by projecting a second light pattern on the substrate, the second light pattern being formed by passing light through a second mask. In the step of exposing the resist by projecting the second light pattern, the second light pattern is formed by excimer laser light having an annular shape and passed through the second mask.Type: GrantFiled: April 29, 2005Date of Patent: October 2, 2007Assignee: Renesas Technology Corp.Inventors: Minori Noguchi, Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama
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Patent number: 7012671Abstract: An apparatus and method for projecting a pattern includes a light source for emitting a laser; an illuminating unit which illuminates a mask on which a pattern is formed with the laser emitted from the light source and formed in a particular shape; a holder which holds the mask; an optical lens unit which projects the pattern formed on the mask onto a surface of a substrate by the laser illuminated on the mask; and a table which mounts the substrate and moves in at least one direction.Type: GrantFiled: October 29, 2002Date of Patent: March 14, 2006Assignee: Renesas Technology Corp.Inventors: Minori Noguchi, Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama
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Publication number: 20050196713Abstract: A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a first light pattern on the substrate of the semiconductor device the first light pattern being formed by passing light through a first mask, and exposing the resist by projecting a second light pattern on the substrate, the second light pattern being formed by passing light through a second mask. In the step of exposing the resist by projecting the second light pattern, the second light pattern is formed by excimer laser light having an annular shape and passed through the second mask.Type: ApplicationFiled: April 29, 2005Publication date: September 8, 2005Inventors: Minori Noguchi, Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama
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Publication number: 20050196705Abstract: A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing the light pattern is formed by illuminating a mask with excimer laser light having an annular shape.Type: ApplicationFiled: April 29, 2005Publication date: September 8, 2005Inventors: Minori Noguchi, Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama
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Publication number: 20050191583Abstract: A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device through an object lens, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing, the light pattern projected on the substrate is formed by excimer laser light which is emitted from an annular shaped light source and which is passed through a mask having a phase shifter.Type: ApplicationFiled: April 29, 2005Publication date: September 1, 2005Inventors: Minori Noguchi, Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama
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Publication number: 20030073045Abstract: An apparatus and method for projecting a pattern includes a light source for emitting a laser; an illuminating unit which illuminates a mask on which a pattern is formed with the laser emitted from the light source and formed in a particular shape; a holder which holds the mask; an optical lens unit which projects the pattern formed on the mask onto a surface of a substrate by the laser illuminated on the mask; and a table which mounts the substrate and moves in at least one direction.Type: ApplicationFiled: October 29, 2002Publication date: April 17, 2003Inventors: Minori Noguchi, Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama
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Patent number: 6485891Abstract: A production method of a semiconductor device, includes the steps of emitting an excimer laser from a light source, illuminating a pattern on a mask with the excimer laser emitted from the light source and passed through a filter, exposing a resist on a substrate of the semiconductor with the excimer laser passed through the mask, and forming a pattern on the substrate in accordance with a portion of the resist exposed with the excimer laser.Type: GrantFiled: April 3, 2000Date of Patent: November 26, 2002Assignee: Hitachi, Ltd.Inventors: Minori Noguchi, Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama
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Patent number: D539223Type: GrantFiled: May 25, 2006Date of Patent: March 27, 2007Assignee: Mitsumi Electric Co., Ltd.Inventors: Atsushi Nishio, Takashi Kawasaki, Makoto Murayama
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Patent number: D539224Type: GrantFiled: May 26, 2006Date of Patent: March 27, 2007Assignee: Mitsumi Electric Co., Ltd.Inventors: Atsushi Nishio, Takashi Kawasaki, Makoto Murayama
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Patent number: D539745Type: GrantFiled: February 23, 2006Date of Patent: April 3, 2007Assignee: Mitsumi Electric Co., Ltd.Inventors: Atsushi Nishio, Takashi Kawasaki, Makoto Murayama