Patents by Inventor Makoto Shimizu
Makoto Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11217705Abstract: A semiconductor element capable of adjusting a barrier height ?Bn and performing zero-bias operation and impedance matching with an antenna for improving detection sensitivity of high-frequency RF electric signals, a method of manufacturing the same, and a semiconductor device having the same. In the semiconductor element, a concentration of InGaAs (n-type InGaAs layer) is intentionally set to be high over a range for preventing the “change of the barrier height caused by the bias” described above up to a deep degeneration range. An electron Fermi level (EF) increases from a band edge of InGaAs (n-type InGaAs layer) to a band edge of InP (InP depletion layer).Type: GrantFiled: June 6, 2019Date of Patent: January 4, 2022Assignee: NTT ELECTRONICS CORPORATIONInventors: Makoto Shimizu, Hiroki Itoh, Tadao Ishibashi, Isamu Kotaka
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Patent number: 10978253Abstract: A capacitor circuit (capacitor device 20, 30, 34, 50) in which a plurality of capacitors (41 to 45) are connected to each other is included, one or two or more capacitors (overvoltage short-circuiting capacitors 40, 40a, 40b, 40c, 40d) in the capacitor circuit have a dielectric breakdown voltage made lower than that of another capacitor, and the one or two or more capacitors having the lower dielectric breakdown voltage are subjected to dielectric breakdown due to application of an overvoltage earlier than the other capacitor so that the capacitor circuit is short-circuited. As a result, the safety of the capacitor device and a device connected thereto can be enhanced.Type: GrantFiled: March 12, 2018Date of Patent: April 13, 2021Assignee: NIPPON CHEMI-CON CORPORATIONInventors: Makoto Shimizu, Kenichi Onda
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Publication number: 20200401043Abstract: A pattern forming method includes applying a photoresist composition onto a substrate to form a resist film. The resist film is exposed to an ArF excimer laser. The exposed resist film is developed with a developer. the photoresist composition includes a polymer and a radiation-sensitive acid generator. The polymer has a structural unit having an acid-dissociable group, does not have a phenolic hydroxyl group and exhibits decreased solubility in the developer by dissociation of the acid-dissociable group. The developer includes a nitrogen-containing compound, and the nitrogen-containing compound is at least one of: a condensed ring compound or bridged cyclic compound including at least two nitrogen atoms as ring-forming atoms, a compound having a nitrogen-containing aromatic heterocyclic structure and an acyclic tertiary amine structure in a molecule thereof, an onium salt compound represented by Formula (A-1), or a compound represented by Formula (A-2).Type: ApplicationFiled: September 3, 2020Publication date: December 24, 2020Applicant: JSR CORPORATIONInventors: Ryo KAWAJIRI, Noboru OOTSUKA, Makoto SHIMIZU
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Patent number: 10870765Abstract: The objective of the present invention is to provide an aqueous coating composition which has excellent curability at low temperatures. The present invention provides an aqueous coating composition which contains an aqueous resin having a hydroxyl group and a carboxyl group (A), a water-dispersible blocked polyisocyanate compound (B), a hydrophilicized carbodiimide compound (C), and an aqueous polyurethane resin (D), wherein the aqueous resin having a hydroxyl group and a carboxyl group (A) has a hydroxyl value of 80 to 200 mgKOH/g and an acid value of 10 to 40 mgKOH/g in terms of resin solid content, the aqueous polyurethane resin (D) has a glass transition point (Tg) of ?50° C. or less, and a cured film of the aqueous polyurethane resin (D) has an elongation at break of 400% or more at ?20° C.Type: GrantFiled: December 27, 2016Date of Patent: December 22, 2020Assignee: NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD.Inventors: Miho Nishioka, Makoto Shimizu
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Publication number: 20200328806Abstract: A measurement device includes a memory, and circuitry coupled to the memory and configured to obtain first time stamp information transmitted from the first transmission device and added to a first frame in which an error has occurred in the transmission line, obtain second time stamp information transmitted from the second transmission device and added to a second frame in which an error has occurred in the transmission line, and specifies the error occurrence position in the transmission line on the basis of the first time stamp information, the second time stamp information, and a light speed, wherein the first time stamp information is added to the first frame by the first transmission device in time synchronization with the second transmission device, and the second time stamp information is added to the second frame by the second transmission device in time synchronization with the first transmission device.Type: ApplicationFiled: March 12, 2020Publication date: October 15, 2020Applicant: FUJITSU LIMITEDInventors: Makoto SHIMIZU, Naoki AINAKA, Kenji Ota
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Publication number: 20200312523Abstract: A coil component includes: a magnetic body part having a first compact containing a first magnetic material and a first resin, and a second compact placed on the outside of the first compact and containing a second magnetic material and a second resin; a coil formed by a conductive wire which comprises a metal conductor covered with an insulating film, and embedded in the magnetic body part; and lead parts of the coil placed on the outside of the first compact; wherein the filling rate of the first magnetic material constituting the first compact is higher than the filling rate of the second magnetic material constituting the second compact. The filling rate of magnetic grains can be improved while also ensuring the insulating property of the coil, etc.Type: ApplicationFiled: March 24, 2020Publication date: October 1, 2020Inventors: Makoto SHIMIZU, Tomoo KASHIWA
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Publication number: 20200283639Abstract: The objective of the present invention is to provide an aqueous coating composition which has excellent curability at low temperatures. The present invention provides an aqueous coating composition which contains an aqueous resin having a hydroxyl group and a carboxyl group (A), a water-dispersible blocked polyisocyanate compound (B), a hydrophilicized carbodiimide compound (C), and an aqueous polyurethane resin (D), wherein the aqueous resin having a hydroxyl group and a carboxyl group (A) has a hydroxyl value of 80 to 200 mgKOH/g and an acid value of 10 to 40 mgKOH/g in terms of resin solid content, the aqueous polyurethane resin (D) has a glass transition point (Tg) of ?50° C. or less, and a cured film of the aqueous polyurethane resin (D) has an elongation at break of 400% or more at ?20° C.Type: ApplicationFiled: December 27, 2016Publication date: September 10, 2020Applicant: NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD.Inventors: Miho NISHIOKA, Makoto SHIMIZU
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Patent number: 10696866Abstract: The present invention provides a method for forming a multilayer coating film including an intermediate coating film formation step of applying an aqueous intermediate coating composition to an object to be coated to form an uncured intermediate coating film; a base coating film formation step of applying an aqueous base coating composition onto the resulting uncured intermediate coating film to form an uncured base coating film; and a curing step of curing the resulting uncured intermediate coating film and the base coating film by heating.Type: GrantFiled: January 26, 2017Date of Patent: June 30, 2020Assignee: NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD.Inventors: Miho Oka, Makoto Shimizu, Yoshiki Takaira, Manabu Horiuchi, Daisuke Segawa
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Patent number: 10695793Abstract: The present invention provides a method for forming a multilayer coating film including an intermediate coating film formation step of applying an aqueous intermediate coating composition to an object to be coated to form an uncured intermediate coating film; a base coating film formation step of applying an aqueous base coating composition onto the resulting uncured intermediate coating film to form an uncured base coating film; and a curing step of curing the resulting uncured intermediate coating film and the base coating film by heating.Type: GrantFiled: January 26, 2017Date of Patent: June 30, 2020Assignee: NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD.Inventors: Miho Oka, Makoto Shimizu, Yoshiki Takaira, Manabu Horiuchi, Daisuke Segawa
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Publication number: 20200166843Abstract: A pattern forming method included applying a photoresist composition on a substrate to form a resist film on the substrate. The resist film is exposed. The exposed resist film is developed with a developer to form a pattern. The pattern is contacted with a processing liquid to process the pattern. The photoresist composition includes a polymer [A] and a radiation-sensitive acid generator [B]. The polymer includes a structural unit (I) including an acid-dissociable group that dissociates due to action of an acid. The polymer has solubility to the developer that reduces due to dissociation of the acid-dissociable group. The processing liquid exhibits acidity.Type: ApplicationFiled: January 31, 2020Publication date: May 28, 2020Applicant: JSR CORPORATIONInventors: Makoto SHIMIZU, Ryo KAWAJIRI, Daigo ICHINOHE
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Publication number: 20200135385Abstract: A coil component includes: a core part including: a winding shaft; and a flange part provided on an axial-direction end of the winding shaft, which has an exterior face on the opposite side of the winding shaft, first and second side faces, and first and second groove parts provided on the exterior face and having a cut-out part on each the first and second side faces; a coil part including: a winding part of a conductor wound around the winding shaft; and two lead parts of the conductor led out from the winding part; and two terminal parts formed on the exterior face of the flange part; wherein the two lead parts are led in from the cut-out parts on the first and second side faces and fitted inside the groove parts, respectively, on the exterior face, and included in the pair of terminal parts, respectively.Type: ApplicationFiled: October 16, 2019Publication date: April 30, 2020Inventors: Makoto SHIMIZU, Tomoo KASHIWA
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Publication number: 20200035411Abstract: A drum-type magnetic body includes: a pair of flange parts that are facing each other; and a shaft part connecting the pair of flange parts, wherein an outer periphery of a cross section of the shaft part in a direction orthogonal to an axis of the shaft part has an oval shape constituted by a pair of parallel straight parts and a pair of arc parts connecting end parts of the pair of parallel straight parts, and the flange parts each have an outer principal face running orthogonal to the axis of the shaft part, and the pair of parallel straight parts are running in parallel with a longitudinal direction of the principal face of the flange part.Type: ApplicationFiled: October 4, 2019Publication date: January 30, 2020Inventors: Makoto SHIMIZU, Yusuke NAGAI
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Publication number: 20190362900Abstract: A capacitor circuit (capacitor device 20, 30, 34, 50) in which a plurality of capacitors (41 to 45) are connected to each other is included, one or two or more capacitors (overvoltage short-circuiting capacitors 40, 40a, 40b, 40c, 40d) in the capacitor circuit have a dielectric breakdown voltage made lower than that of another capacitor, and the one or two or more capacitors having the lower dielectric breakdown voltage are subjected to dielectric breakdown due to application of an overvoltage earlier than the other capacitor so that the capacitor circuit is short-circuited. As a result, the safety of the capacitor device and a device connected thereto can be enhanced.Type: ApplicationFiled: March 12, 2018Publication date: November 28, 2019Applicant: NIPPON CHEMI-CON CORPORATIONInventors: Makoto Shimizu, Kenichi Onda
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Patent number: 10475572Abstract: A magnetic material is pressure-molded using dies into a compact having an H-shaped cross section, constituted by a pair of flange parts that are facing each other and a web part connecting the pair of flange parts. Next, a cured product of the compact is turned around a rotational shaft passing through the center parts of the principal faces of the flange parts, and the web part is ground, to form a drum-type ground product having a pair of flange parts on both ends of a shaft part in a manner facing each other. Then, the ground product is heat-treated to obtain a drum core of a magnetic body. On the drum core, terminal electrodes are provided and a conductive wire with sheath is wound around the shaft part, after which an exterior part is given, to obtain a coil component.Type: GrantFiled: September 26, 2016Date of Patent: November 12, 2019Assignee: TAIYO YUDEN CO., LTDInventors: Makoto Shimizu, Yusuke Nagai
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Publication number: 20190312150Abstract: A semiconductor element capable of adjusting a barrier height ?Bn and performing zero-bias operation and impedance matching with an antenna for improving detection sensitivity of high-frequency RF electric signals, a method of manufacturing the same, and a semiconductor device having the same. In the semiconductor element, a concentration of InGaAs (n-type InGaAs layer) is intentionally set to be high over a range for preventing the “change of the barrier height caused by the bias” described above up to a deep degeneration range. An electron Fermi level (EF) increases from a band edge of InGaAs (n-type InGaAs layer) to a band edge of InP (InP depletion layer).Type: ApplicationFiled: June 6, 2019Publication date: October 10, 2019Inventors: Makoto Shimizu, Hiroki Itoh, Tadao Ishibashi, Isamu Kotaka
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Patent number: 10367100Abstract: A semiconductor element capable of adjusting a barrier height ?Bn and performing zero-bias operation and impedance matching with an antenna for improving detection sensitivity of high-frequency RF electric signals, a method of manufacturing the same, and a semiconductor device having the same. In the semiconductor element, a concentration of InGaAs (n-type InGaAs layer) is intentionally set to be high over a range for preventing the “change of the barrier height caused by the bias” described above up to a deep degeneration range. An electron Fermi level (EF) increases from a band edge of InGaAs (n-type InGaAs layer) to a band edge of InP (InP depletion layer).Type: GrantFiled: August 13, 2015Date of Patent: July 30, 2019Assignee: NTT ELECTRONICS CORPORATIONInventors: Makoto Shimizu, Hiroki Itoh, Tadao Ishibashi, Isamu Kotaka
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Publication number: 20190030563Abstract: The present invention provides a method for forming a multilayer coating film including an intermediate coating film formation step of applying an aqueous intermediate coating composition to an object to be coated to form an uncured intermediate coating film; a base coating film formation step of applying an aqueous base coating composition onto the resulting uncured intermediate coating film to form an uncured base coating film; and a curing step of curing the resulting uncured intermediate coating film and the base coating film by heating.Type: ApplicationFiled: January 26, 2017Publication date: January 31, 2019Applicant: Nippon Paint Automotive Coatings Co., Ltd.Inventors: Miho OKA, Makoto SHIMIZU, Yoshiki TAKAIRA, Manabu HORIUCHI, Daisuke SEGAWA
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Publication number: 20190031915Abstract: The present invention provides a method for forming a multilayer coating film including an intermediate coating film formation step of applying an aqueous intermediate coating composition to an object to be coated to form an uncured intermediate coating film; a base coating film formation step of applying an aqueous base coating composition onto the resulting uncured intermediate coating film to form an uncured base coating film; and a curing step of curing the resulting uncured intermediate coating film and the base coating film by heating.Type: ApplicationFiled: January 26, 2017Publication date: January 31, 2019Applicant: NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD.Inventors: Miho OKA, Makoto SHIMIZU, Yoshiki TAKAIRA, Manabu HORIUCHI, Daisuke SEGAWA
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Patent number: 10030771Abstract: A gasket insertion method for inserting a gasket into an outer cylinder includes providing an outer cylinder having a base end opening section; providing a gasket having a recessed section that is open at a base end of the gasket and that includes a flat bottom surface; pushing the gasket into a sleeve configured to be inserted into the outer cylinder, by relatively moving an inserter in a tip end direction with respect to the sleeve while a flat tip end surface of a tip end section of the inserter abuts the bottom surface of the recessed section; inserting the sleeve into the outer cylinder through the base end opening section; and arranging the gasket inside the outer cylinder by relatively moving the sleeve in a base end direction with respect to the outer cylinder while maintaining relative axial positions of the outer cylinder, the gasket, and the inserter.Type: GrantFiled: January 28, 2016Date of Patent: July 24, 2018Assignee: TERUMO KABUSHIKI KAISHAInventors: Makoto Shimizu, Hajime Sasamoto
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Patent number: 9963157Abstract: A method of precisely measuring the track twist of a track on which a vehicle for commercial operation is travelling using this vehicle is to be provided. The method includes measuring a condition of a track (R) on which a vehicle for commercial operation (100) is travelling using this vehicle (100). The vehicle for commercial operation includes a bogie (10). The bogie includes four wheels (1) and primary springs (2) provided to correspond to the four wheels (1) and support the corresponding wheels (1), and is capable of measuring a wheel load of each of the four wheels (1). The method includes the steps of: measuring the wheel load of each wheel (1) (S13); calculating the displacement of each primary spring (2) based on the measured wheel load (S15); and calculating the track twist (h) of the track (R) based on the calculated displacements of the primary springs (2) (S18).Type: GrantFiled: September 4, 2014Date of Patent: May 8, 2018Assignee: NIPPON STEEL & SUMITOMO METAL CORPORATIONInventors: Yohei Michitsuji, Ryo Matsui, Yasuhiro Sato, Hirotaka Mori, Makoto Shimizu, Jun Kurihara, Tomohiro Seki, Hiroshi Obayashi, Masaaki Mizuno, Masuhisa Tanimoto