Patents by Inventor Man-Lin Chen

Man-Lin Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10759148
    Abstract: A wood adhesive, a method for adhering wood materials using the same, and a composite wood structure using the same are disclosed. The wood adhesive comprises a first agent and a second agent, wherein the first agent comprises sodium carboxymethyl cellulose having a molecular weight from about 15,000 to about 500,000 and a degree of substitution from about 0.4 to about 2, and the second agent comprises polymeric quaternary amine.
    Type: Grant
    Filed: August 9, 2018
    Date of Patent: September 1, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Man-Lin Chen, Hsien-Kuang Lin, Sue-May Chen, Su-Huey Chen
  • Patent number: 10351737
    Abstract: A wood adhesive is provided. The wood adhesive includes a first agent and a second agent. The first agent includes a sodium carboxymethyl cellulose and a styrene-butadiene rubber polymer. The sodium carboxymethyl cellulose has a molecular weight between 15,000 and 500,000 and a degree of substitution of from 0.4 to 2.00 of the sodium salt. The second agent includes a polymeric quaternary amine.
    Type: Grant
    Filed: August 17, 2018
    Date of Patent: July 16, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Man-Lin Chen, Hsien-Kuang Lin, Der-Jaw Chan, Sue-May Chen
  • Patent number: 10190026
    Abstract: A wood adhesive is provided. The wood adhesive includes a first agent and a second agent. The first agent includes a sodium carboxymethyl cellulose and a styrene-butadiene rubber polymer. The sodium carboxymethyl cellulose has a molecular weight between 15,000 and 500,000 and a degree of substitution of from 0.4 to 2.00 of the sodium salt. The second agent includes a polymeric quaternary amine.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: January 29, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Man-Lin Chen, Hsien-Kuang Lin, Der-Jaw Chan, Sue-May Chen
  • Publication number: 20180355225
    Abstract: A wood adhesive is provided. The wood adhesive includes a first agent and a second agent. The first agent includes a sodium carboxymethyl cellulose and a styrene-butadiene rubber polymer. The sodium carboxymethyl cellulose has a molecular weight between 15,000 and 500,000 and a degree of substitution of from 0.4 to 2.00 of the sodium salt. The second agent includes a polymeric quaternary amine.
    Type: Application
    Filed: August 17, 2018
    Publication date: December 13, 2018
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Man-Lin CHEN, Hsien-Kuang LIN, Der-Jaw CHAN, Sue-May CHEN
  • Publication number: 20180345632
    Abstract: A wood adhesive, a method for adhering wood materials using the same, and a composite wood structure using the same are disclosed. The wood adhesive comprises a first agent and a second agent, wherein the first agent comprises sodium carboxymethyl cellulose having a molecular weight from about 15,000 to about 500,000 and a degree of substitution from about 0.4 to about 2, and the second agent comprises polymeric quaternary amine.
    Type: Application
    Filed: August 9, 2018
    Publication date: December 6, 2018
    Inventors: Man-Lin Chen, Hsien-Kuang Lin, Sue-May Chen, Su-Huey Chen
  • Publication number: 20170081563
    Abstract: A wood adhesive is provided. The wood adhesive includes a first agent and a second agent. The first agent includes a sodium carboxymethyl cellulose and a styrene-butadiene rubber polymer. The sodium carboxymethyl cellulose has a molecular weight between 15,000 and 500,000 and a degree of substitution of from 0.4 to 2.00 of the sodium salt. The second agent includes a polymeric quaternary amine.
    Type: Application
    Filed: January 29, 2016
    Publication date: March 23, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Man-Lin CHEN, Hsien-Kuang LIN, Der-Jaw CHAN, Sue-May CHEN
  • Patent number: 9392688
    Abstract: A method of forming a biomass photosensitive material is provided, which includes (1) polymerizing (a) itaconic anhydride and (b) acrylate to form a copolymer, and (2) mixing the copolymer and (c) monomer with a single hydroxy group and a carbon-carbon double bond for a ring-opening addition reaction, wherein the (a) itaconic anhydride and the single hydroxy group of the (c) monomer with the single hydroxy group and the carbon-carbon double bond are reacted in the ring-opening addition reaction.
    Type: Grant
    Filed: July 7, 2015
    Date of Patent: July 12, 2016
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Man-Lin Chen, Hsien-Kuang Lin, Sue-May Chen, Su-Huey Chen, Yu-Lin Liu
  • Publication number: 20160004158
    Abstract: A method of forming a biomass photosensitive material is provided, which includes (1) polymerizing (a) itaconic anhydride and (b) acrylate to form a copolymer, and (2) mixing the copolymer and (c) monomer with a single hydroxy group and a carbon-carbon double bond for a ring-opening addition reaction, wherein the (a) itaconic anhydride and the single hydroxy group of the (c) monomer with the single hydroxy group and the carbon-carbon double bond are reacted in the ring-opening addition reaction.
    Type: Application
    Filed: July 7, 2015
    Publication date: January 7, 2016
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Man-Lin CHEN, Hsien-Kuang LIN, Sue-May CHEN, Su-Huey CHEN, Yu-Lin LIU
  • Publication number: 20150232724
    Abstract: A wood adhesive, a method for adhering wood materials using the same, and a composite wood structure using the same are disclosed. The wood adhesive comprises a first agent and a second agent, wherein the first agent comprises sodium carboxymethyl cellulose having a molecular weight from about 15,000 to about 500,000 and a degree of substitution from about 0.4 to about 2, and the second agent comprises polymeric quaternary amine.
    Type: Application
    Filed: October 8, 2014
    Publication date: August 20, 2015
    Inventors: Man-Lin Chen, Hsien-Kuang Lin, Sue-May Chen, Su-Huey Chen
  • Publication number: 20130084454
    Abstract: A resin composition, a resin and a method for manufacturing the same. The resin composition includes a plant oil derivative, and a multifunctional carboxylic acid, anhydride compound or a copolymer containing anhydride. The multifunctional carboxylic acid, the anhydride compound or the copolymer containing anhydride has an amount of 5-60 parts by weight relative to 100 parts by weight of the plant oil derivative.
    Type: Application
    Filed: July 20, 2012
    Publication date: April 4, 2013
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsien-Kuang Lin, Man-Lin Chen, Sue-May Chen, Jauder Jeng
  • Patent number: 8193258
    Abstract: A sealant composition is provided. The sealant composition includes (a) an oligomer including an unsaturated mono-carboxylic acid modified bisphenol A epoxy resin and an unsaturated mono-carboxylic acid modified bisphenol F epoxy resin, wherein an equivalence ratio of the bisphenol A epoxy resin to the bisphenol F epoxy resin is 0.05:0.95 to 0.3:0.7, the bisphenol A epoxy resin has a melting point higher than 40° C. and the bisphenol F epoxy resin has a melting point lower than 40° C.; (b) an epoxy resin having at least two or more than two epoxy groups; and (c) a photoinitiator.
    Type: Grant
    Filed: August 25, 2009
    Date of Patent: June 5, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Jauder Jeng, Man-Lin Chen, Pei-Ching Liu, Tien-Shou Shieh
  • Publication number: 20100280143
    Abstract: A sealant composition is provided. The sealant composition includes (a) an oligomer including an unsaturated mono-carboxylic acid modified bisphenol A epoxy resin and an unsaturated mono-carboxylic acid modified bisphenol F epoxy resin, wherein an equivalence ratio of the bisphenol A epoxy resin to the bisphenol F epoxy resin is 0.05:0.95 to 0.3:0.7, the bisphenol A epoxy resin has a melting point higher than 40° C. and the bisphenol F epoxy resin has a melting point lower than 40° C.; (b) an epoxy resin having at least two or more than two epoxy groups; and (c) a photoinitiator.
    Type: Application
    Filed: August 25, 2009
    Publication date: November 4, 2010
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jauder Jeng, Man-Lin Chen, Pei-Ching Liu, Tien-Shou Shieh
  • Patent number: 6841266
    Abstract: Fabrication device of organic light emitting diode (OLED) includes a Substrate, a transparent conductive layer, an insulating film layer, an organic light-emitting layer, and a conductive layer; when a suitable potential is applied thereto, an organic light-emitting layer emits a visible light, however, it usually occurs breakdown between cathode and anode or bad signal, therefore, the present invention provides a positive insulating film photoresist with an easily inclining obtuse angle, smooth surface, and easily controlled fabrication condition to cover the edge of a transparent electrode (anode) in order to avoid that when the edge of ITO transparent electrode is sharp it causes an organic light-emitting layer film breakdown and results from signal lost or weaken to increase the yields.
    Type: Grant
    Filed: March 8, 2002
    Date of Patent: January 11, 2005
    Assignee: Industrial Technology Research Institute
    Inventors: Man-Lin Chen, Hsien-Kuang Lin, Pa-Yen Lu, Wen-Kuo Weng, Chun-Neng Ku
  • Patent number: 6632372
    Abstract: The invention discloses a method of forming via-holes in multilayer circuit boards. The process includes forming covering substances in predetermined spots in a multilayer circuit board and thereafter applying an insulating layer upon the circuit board. The predetermined spots are then uncovered and the covering substances are removed to form via-holes.
    Type: Grant
    Filed: November 22, 2000
    Date of Patent: October 14, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Man-Lin Chen, Hsien-Kuang Lin, Chuang-Shin Chiou, Tien-Shou Shieh, Pey-Ching Liou
  • Publication number: 20030170493
    Abstract: Fabrication device of organic light emitting diode (OLED) includes a Substrate, a transparent conductive layer, an insulating film layer, an organic light-emitting layer, and a conductive layer; when a suitable potential is applied thereto, an organic light-emitting layer emits a visible light, however, it usually occurs breakdown between cathode and anode or bad signal, therefore, the present invention provides a positive insulating film photoresist with an easily inclining obtuse angle, smooth surface, and easily controlled fabrication condition to cover the edge of a transparent electrode (anode) in order to avoid that when the edge of ITO transparent electrode is sharp it causes an organic light-emitting layer film breakdown and results from signal lost or weaken to increase the yields.
    Type: Application
    Filed: March 8, 2002
    Publication date: September 11, 2003
    Applicant: Industrial Technology Research Institute
    Inventors: Man-Lin Chen, Hsien-Kuang Lin, Pa-Yen Lu, Wen-Kuo Weng, Chun-Neng Ku
  • Patent number: 6432613
    Abstract: The present invention discloses a photo-sensitive composition, used as a solder resist or a photosensitive material for insulation layers in the production of printed circuit boards. The photo-sensitive composition comprises a prepolymer containing carboxylic groups and unsaturated vinyl groups; photoinitiator; unsaturated photo-monomer; and the reaction adduct of bismaleimide derivative, barbituric acid derivative and epoxy compounds. The obtained photosensitive composition exhibits high adhesion towards PI substrates, in addition, it can be developed with alkaline water. The photosensitive composition obtained in the invention is very useful in packaging substrates, such as P-BGA, T-BGA and F-CSP due to its high heat resistance and solder resistance.
    Type: Grant
    Filed: May 30, 2001
    Date of Patent: August 13, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Man-Lin Chen, Jing-Pin Pan, Hsien-Kuang Lin, Shur-Fen Liu
  • Publication number: 20020086239
    Abstract: The present invention discloses a photo-sensitive composition, used as a solder resist or a photosensitive material for insulation layers in the production of printed circuit boards. The photo-sensitive composition comprises a prepolymer containing carboxylic groups and unsaturated vinyl groups; photoinitiator; unsaturated photo-monomer; and the reaction adduct of bismaleimide derivative, barbituric acid derivative and epoxy compounds. The obtained photosensitive composition exhibits high adhesion towards PI substrates, in addition, it can be developed with alkaline water. The photosensitive composition obtained in the invention is very useful in packaging substrates, such as P-BGA, T-BGA and F-CSP due to its high heat resistance and solder resistance.
    Type: Application
    Filed: May 30, 2001
    Publication date: July 4, 2002
    Inventors: Man-Lin Chen, Jing-Pin Pan, Hsien-Kuang Lin, Shur-Fen Liu
  • Patent number: 6119338
    Abstract: A method for making high-density multilayer printed circuit boards is disclosed.
    Type: Grant
    Filed: March 19, 1998
    Date of Patent: September 19, 2000
    Assignee: Industrial Technology Research Institute
    Inventors: Tsung-Hsiung Wang, Man-Lin Chen, Chuang-Shin Chiou, Ming-Shun Chan, Pei-Wen Ding