Patents by Inventor Manabu Hama
Manabu Hama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240099470Abstract: An easy-assembly bed includes a top plate, and a leg portion having a plurality of leg members that are linked using notched joints. The top plate is constituted of a bonded material, which includes a plate-shaped foam plate formed with a foam body, and a front board member and a rear board member having an identical shape to the foam plate and that are bonded to the rear surface and the front surface of the foam plate, respectively, and a top plate molded resin portion overing the cut ends of the bonded material with a molded resin; and the leg members are each constituted of a grooved bonded material, which includes a plate-shaped grooved foam plate having locking grooves and formed with a foam body, and a grooved front board member and a grooved rear board member on the front surface and the rear surface of the grooved foam plate.Type: ApplicationFiled: December 20, 2021Publication date: March 28, 2024Applicants: TOPPAN INC., KINKI UNIVERSITYInventors: Hajime MONZEN, Mikoto TAMURA, Masaru HAYAKAWA, Manabu TSUJINO, Takashi MIZOBUCHI, Nobuo HAMA, Yuichirou FUJIKAWA
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Patent number: 8742721Abstract: The battery charging warehouse includes a pallet rack and a battery charger. The pallet rack has a plurality of storage locations in each of which a battery is stored. At least one of the storage locations is a charging storage location in which the battery is charged. The battery charger is mounted to an upper part of the charging storage location. The battery charger is movable up and down in the charging storage location and has a charge connector. When the battery charger is moved down in the charging storage location, the charge connector is received by a battery connector of the battery stored in the charging storage location thereby to automatically connect the charge connector to the battery connector.Type: GrantFiled: March 11, 2011Date of Patent: June 3, 2014Assignee: Kabushiki Kaisha Toyota JidoshokkiInventors: Manabu Hama, Mitsutaka Shibagaki, Takanori Imai
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Publication number: 20110227526Abstract: The battery charging warehouse includes a pallet rack and a battery charger. The pallet rack has a plurality of storage locations in each of which a battery is stored. At least one of the storage locations is a charging storage location in which the battery is charged. The battery charger is mounted to an upper part of the charging storage location. The battery charger is movable up and down in the charging storage location and has a charge connector. When the battery charger is moved down in the charging storage location, the charge connector is received by a battery connector of the battery stored in the charging storage location thereby to automatically connect the charge connector to the battery connector.Type: ApplicationFiled: March 11, 2011Publication date: September 22, 2011Applicant: KABUSHIKI KAISHA TOYOTA JIDOSHOKKIInventors: Manabu HAMA, Mitsutaka Shibagaki, Takanori Imai
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Patent number: 7867926Abstract: A substrate processing apparatus is used for radiating UV rays onto a target film formed on a target surface of a substrate to perform a curing process of the target film. The apparatus includes a hot plate configured to heat the substrate to a predetermined temperature, a plurality of support pins disposed on the hot plate to support the substrate, and a UV radiating device configured to radiate UV rays onto the target surface of the substrate supported on the support pins. The support pins are preset to provide a predetermined thermal conductivity to conduct heat of the substrate to the hot plate. The hot plate is preset to have a predetermined thermal capacity sufficient to absorb heat conducted through the support pins.Type: GrantFiled: June 4, 2008Date of Patent: January 11, 2011Assignee: Tokyo Electron LimitedInventors: Naoyuki Satoh, Takeshi Tamura, Hiroyuki Ide, Manabu Hama
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Publication number: 20090156019Abstract: A substrate processing apparatus is used for radiating UV rays onto a target film formed on a target surface of a substrate to perform a curing process of the target film. The apparatus includes a hot plate configured to heat the substrate to a predetermined temperature, a plurality of support pins disposed on the hot plate to support the substrate, and a UV radiating device configured to radiate UV rays onto the target surface of the substrate supported on the support pins. The support pins are preset to provide a predetermined thermal conductivity to conduct heat of the substrate to the hot plate. The hot plate is preset to have a predetermined thermal capacity sufficient to absorb heat conducted through the support pins.Type: ApplicationFiled: June 4, 2008Publication date: June 18, 2009Inventors: Naoyuki Satoh, Takeshi Tamura, Hiroyuki Ide, Manabu Hama
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Patent number: 7534467Abstract: The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.Type: GrantFiled: September 2, 2004Date of Patent: May 19, 2009Assignee: Tokyo Electron LimitedInventors: Takahiro Kitano, Manabu Hama, Shinichi Sugimoto, Naoya Hirakawa
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Patent number: 7195936Abstract: In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an object to be processed, wherein the output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness. In the method and system, electric charges charged in a film of an object to be processed can be removed also.Type: GrantFiled: December 29, 2003Date of Patent: March 27, 2007Assignee: Tokyo Electron LimitedInventors: Tadashi Onishi, Manabu Hama, Minoru Honda, Kazuyuki Mitsuoka, Mitsuaki Iwashita
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Publication number: 20050196712Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.Type: ApplicationFiled: April 20, 2005Publication date: September 8, 2005Inventors: Tadashi Onishi, Manabu Hama
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Patent number: 6903800Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.Type: GrantFiled: December 19, 2003Date of Patent: June 7, 2005Assignee: Tokyo Electron LimitedInventors: Tadashi Onishi, Manabu Hama
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Publication number: 20050087129Abstract: The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.Type: ApplicationFiled: September 2, 2004Publication date: April 28, 2005Applicant: TOKYO ELECTRON LIMITEDInventors: Takahiro Kitano, Manabu Hama, Shinichi Sugimoto, Naoya Hirakawa
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Patent number: 6808566Abstract: The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.Type: GrantFiled: August 14, 2002Date of Patent: October 26, 2004Assignee: Tokyo Electron LimitedInventors: Takahiro Kitano, Manabu Hama, Shinichi Sugimoto, Naoya Hirakawa
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Publication number: 20040137760Abstract: In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an object to be processed, wherein the output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness. In the method and system, electric charges charged in a film of an object to be processed can be removed also.Type: ApplicationFiled: December 29, 2003Publication date: July 15, 2004Applicant: TOKYO ELECTRON LIMITEDInventors: Tadashi Onishi, Manabu Hama, Minoru Honda, Kazuyuki Mitsuoka, Mitsuaki Iwashita
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Publication number: 20040131351Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.Type: ApplicationFiled: December 19, 2003Publication date: July 8, 2004Inventors: Tadashi Onishi, Manabu Hama
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Publication number: 20030054668Abstract: The present invention includes a hermetic container provided therein with a mount for mounting thereon a substrate coated with a coating solution made by mixing a component of a coating film and a solvent; a vacuum exhauster connected to the hermetic container through an exhaust passage for reducing a pressure in the hermetic container to vaporize the solvent from the coating solution on the substrate; a current member provided to face a front face of the substrate mounted on the mount; and a current member raising and lowering mechanism for raising and lowering the current member. When the current member is raised and lowered to change in height position while the pressure inside the hermetic container is reduced to vaporize the solvent from the coating solution on the substrate, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the film thickness of a film of the coating solution.Type: ApplicationFiled: August 14, 2002Publication date: March 20, 2003Applicant: TOKYO ELECTRON LIMITEDInventors: Takahiro Kitano, Manabu Hama, Shinichi Sugimoto, Naoya Hirakawa