Patents by Inventor Manabu Izumi

Manabu Izumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9816182
    Abstract: A substrate processing apparatus is disclosed. The substrate processing apparatus includes a process chamber configured to accommodate a substrate; a gas supply unit configured to supply a process gas into the process chamber; a lid member configured to block an end portion opening of the process chamber; an end portion heating unit installed around a side wall of an end portion of the process chamber; and a thermal conductor installed on a surface of the lid member in an inner side of the process chamber, and configured to be heated by the end portion heating unit.
    Type: Grant
    Filed: January 29, 2015
    Date of Patent: November 14, 2017
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideto Tateno, Yuichi Wada, Hiroshi Ashihara, Keishin Yamazaki, Takurou Ushida, Iwao Nakamura, Manabu Izumi
  • Publication number: 20160076149
    Abstract: By suppressing a re-liquefaction of a processing gas in a reaction tube, the processing gas is maintained in a gaseous state. There is provided a substrate processing apparatus that includes a reaction tube, a supply unit, an exhaust unit, a first heating unit configured to heat a substrate in the reaction tube, a second heating unit configured to heat a downstream portion of a reactant in gaseous state flowing in the reaction tube from the supply unit toward the exhaust unit, and a furnace lid, wherein the furnace lid includes a heat absorbing unit facing a lower surface of a lower end portion of the reaction tube and being heated by the second heating unit, the heat absorbing unit having an outer perimeter surface disposed outer than an inner circumference surface of the lower end portion.
    Type: Application
    Filed: November 23, 2015
    Publication date: March 17, 2016
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Keishin YAMAZAKI, Manabu IZUMI, Katsuaki NOGAMI
  • Publication number: 20150140835
    Abstract: A substrate processing apparatus is disclosed. The substrate processing apparatus includes a process chamber configured to accommodate a substrate; a gas supply unit configured to supply a process gas into the process chamber; a lid member configured to block an end portion opening of the process chamber; an end portion heating unit installed around a side wall of an end portion of the process chamber; and a thermal conductor installed on a surface of the lid member in an inner side of the process chamber, and configured to be heated by the end portion heating unit.
    Type: Application
    Filed: January 29, 2015
    Publication date: May 21, 2015
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideto TATENO, Yuichi WADA, Hiroshi ASHIHARA, Keishin YAMAZAKI, Takurou USHIDA, Iwao NAKAMURA, Manabu IZUMI
  • Publication number: 20150047513
    Abstract: An electromagnetic induction heating and cooking tray being formed a recessed portion for accommodating an electromagnetic induction heating and cooking plate, is characterized in being provided with a tray main body being formed the recessed portion or a through hole configuring a portion of the recessed portion, a board-shaped, lineal, columnar and/or hollow-columnar first heat insulation member being molded and made of carbon fibers, aramid fibers and/or rock fiber, for supporting the plate; and feet being protruded from the bottom of the tray main body. Because the electromagnetic induction heating and cooking plate does not contact the tray main body as a result of being supported by the first heat insulation member and the heat of the plate is dissipated from the space formed by the feet, temperature increase of the tray and deterioration of the heat insulation member can be prevented even if the plate is heated. The tray can also be made lighter.
    Type: Application
    Filed: March 26, 2013
    Publication date: February 19, 2015
    Applicant: F.T. Innovation Inc.
    Inventors: Teruo Okano, Manabu Izumi
  • Patent number: 8734148
    Abstract: A heat treatment apparatus capable of achieving high-accuracy processing and high safety and a method of manufacturing a substrate are provided. The heat treatment apparatus 10 includes a reaction tube 42 for processing a substrate, a manifold 44 for supporting the reaction tube 42, a heater 46 installed around the reaction tube 42 to heat an inner part of the reaction tube 42, a surrounding member 500 installed to surround a side portion of the reaction tube 42 arranged in a lower portion than the heater 46; an exhaust device 301 for forcibly exhausting a gap 506 between the surrounding member 500 and the reaction tube 42; and a sealing member 150 installed in a contacting portion between the reaction tube 42 and the manifold 44. Here, an inlet hole 501 through which the exhaust device inhales an atmosphere outside the surrounding member 500 to the gap 506 is installed in the surrounding member 500.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: May 27, 2014
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Keishin Yamazaki, Akira Hayashida, Masaaki Ueno, Manabu Izumi, Katsuaki Nogami
  • Patent number: 8394209
    Abstract: A high-strength steel sheet according to the present invention not only is suitably adjusted in its chemical elements composition, but also has a DE value defined by the following Equation (1) of 0.0340% or more, and a carbon equivalent Ceq defined by the following Equation (2) of 0.45% or less: DE value=[Ti]+[Nb]+0.3[V]+0.0075[Cr]??(1) where, [Ti], [Nb], [V], and [Cr] represent contents (mass %) of Ti, Nb, V, and Cr, respectively; Ceq=[C]+[Mn]/6+([Cr]+[Mo]+[V])/5+([Cu]+[Ni])/15 ??(2) where, [C], [Mn], [Cr], [Mo], [V], [Cu], and [Ni] represent contents (mass %) of C, Mn, Cr, Mo, V, Cu, and Ni, respectively. A high-strength steel sheet resistant to strength reduction and good in low-temperature toughness of HAZ even when subjected for a long time to a stress-relief annealing process after being processed by welding, is provided.
    Type: Grant
    Filed: January 26, 2009
    Date of Patent: March 12, 2013
    Assignee: Kobe Steel, Ltd.
    Inventors: Manabu Izumi, Makoto Kariyazaki
  • Publication number: 20110207339
    Abstract: A heat treatment apparatus capable of achieving high-accuracy processing and high safety and a method of manufacturing a substrate are provided. The heat treatment apparatus 10 includes a reaction tube 42 for processing a substrate, a manifold 44 for supporting the reaction tube 42, a heater 46 installed around the reaction tube 42 to heat an inner part of the reaction tube 42, a circumferential portion 500 installed to surround a side portion of the reaction tube 42 arranged in a lower portion than the heater 46; an exhaust device 301 for forcibly exhausting a gap 506 between the circumferential portion 500 and the reaction tube 42; and a sealing member 150 installed in a contacting portion between the reaction tube 42 and the manifold 44. Here, an inlet port 501 through which the exhaust device inhales an atmosphere outside the circumferential portion 500 to the gap 506 is installed in the circumferential portion 500.
    Type: Application
    Filed: February 24, 2011
    Publication date: August 25, 2011
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Keishin YAMAZAKI, Akira HAYASHIDA, Masaaki UENO, Manabu IZUMI, Katsuaki NOGAMI
  • Patent number: 7795157
    Abstract: An object of the invention is to provide a substrate treatment device that can lengthen the maintenance cycle, and prevent any by-product from falling on substrates even if it is accumulated, and a manufacturing method of such a substrate treatment device, and an embodiment of the invention is directed, comprising: a treatment chamber that subjects a substrate to a treatment while keeping hold of it by a substrate retention member; a reaction tube that configures the treatment chamber; a heating device that is disposed around the reaction tube for heating the treatment chamber; and an exhaust tube that is linked to the reaction tube on an upper side than the substrate inside of the treatment chamber and is extended downward from the heating device, and exhausts a gas inside of the reaction tube in which an extension portion as a result of the extension is disposed away from the reaction tube.
    Type: Grant
    Filed: August 3, 2007
    Date of Patent: September 14, 2010
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Masato Terasaki, Shinya Morita, Manabu Izumi
  • Publication number: 20090246067
    Abstract: A high-strength steel sheet according to the present invention not only is suitably adjusted in its chemical elements composition, but also has a DE value defined by the following Equation (1) of 0.0340% or more, and a carbon equivalent Ceq defined by the following Equation (2) of 0.45% or less: DE value=[Ti]+[Nb]+0.3[V]+0.0075[Cr]??(1) where, [Ti], [Nb], [V], and [Cr] represent contents (mass %) of Ti, Nb, V, and Cr, respectively; Ceq=[C]+[Mn]/6+([Cr]+[Mo]+[V])/5+([Cu]+[Ni])/15 ??(2) where, [C], [Mn], [Cr], [Mo], [V], [Cu], and [Ni] represent contents (mass %) of C, Mn, Cr, Mo, V, Cu, and Ni, respectively. A high-strength steel sheet resistant to strength reduction and good in low-temperature toughness of HAZ even when subjected for a long time to a stress-relief annealing process after being processed by welding, is provided.
    Type: Application
    Filed: January 26, 2009
    Publication date: October 1, 2009
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
    Inventors: Manabu IZUMI, Makoto Kariyazaki
  • Publication number: 20090170338
    Abstract: An object of the invention is to provide a substrate treatment device that can lengthen the maintenance cycle, and prevent any by-product from falling on substrates even if it is accumulated, and a manufacturing method of such a substrate treatment device, and an embodiment of the invention is directed, comprising: a treatment chamber that subjects a substrate to a treatment while keeping hold of it by a substrate retention member; a reaction tube that configures the treatment chamber; a heating device that is disposed around the reaction tube for heating the treatment chamber; and an exhaust tube that is linked to the reaction tube on an upper side than the substrate inside of the treatment chamber and is extended downward from the heating device, and exhausts a gas inside of the reaction tube in which an extension portion as a result of the extension is disposed away from the reaction tube.
    Type: Application
    Filed: August 3, 2007
    Publication date: July 2, 2009
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Masato Terasaki, Shinya Morita, Manabu Izumi
  • Publication number: 20070128878
    Abstract: A pyrogenic oxidation device (10) is comprised of a process gas supply line (38) connecting an external combustion device (39) and a supply pipe (37) connected to a processing chamber (13) and, a dilute gas supply line (45) connected to the process gas supply line (38) for supplying nitrogen gas (62), a purge gas supply line (47) for supplying nitrogen gas (62) and connecting to the exhaust pipe (37) side of the section connecting with the dilute gas supply line (45) in the process gas supply line (38), and a vent line (49) for exhausting gas and connecting to the dilute gas supply line (45) side of the section connecting with the purge gas supply line (47) in the process gas supply line (38), and stop valves (46), (48), (50) in each line opened and closed by a controller (60). A deterioration in film thickness uniformity due to residual matter can be prevented, since residual matter in the process gas supply line is prevented from flowing into the processing chamber during the purge step.
    Type: Application
    Filed: February 27, 2004
    Publication date: June 7, 2007
    Inventors: Manabu Izumi, Yuki Ohura