Patents by Inventor Mandar R. Bhave

Mandar R. Bhave has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
    Patent number: 6894104
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Grant
    Filed: May 23, 2002
    Date of Patent: May 17, 2005
    Assignee: Brewer Science Inc.
    Inventors: Gu Xu, Jimmy D. Meador, Mandar R. Bhave, Shreeram V. Deshpande, Kelly A. Nowak
  • Bottom anti-reflective coating compositions comprising silicon containing polymers to improve adhesion towards photoresists
    Publication number: 20040242759
    Abstract: New anti-reflective compositions for use in 193 nm applications are provided. The compositions comprise a polymer having recurring silane monomers. The inventive compositions can be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having improved adhesion of photoresists to the anti-reflective coating layer, thereby reducing or preventing the occurrence of photoresist pattern collapse typically seen in feature sizes of 100 nm or smaller.
    Type: Application
    Filed: May 30, 2003
    Publication date: December 2, 2004
    Inventor: Mandar R. Bhave
  • Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
    Publication number: 20030220431
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Application
    Filed: May 23, 2002
    Publication date: November 27, 2003
    Inventors: Gu Xu, Jimmy D. Meador, Mandar R. Bhave, Shreeram V. Deshpande, Kelley A. Nowak
  • Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose
    Patent number: 6576408
    Abstract: New polymers and anti-reflective compositions including those polymers are provided. The polymer comprises recurring monomers according to the formula wherein each R is —OH, —CH2OH, —O—R1—O—X, or —CH2—O—R1—O—X, each R1 is a branched or unbranched alkyl group, and each X is shown below. The inventive compositions can be used to form anti-reflective coatings having high etch rate and optical densities.
    Type: Grant
    Filed: March 2, 2001
    Date of Patent: June 10, 2003
    Assignee: Brewer Science, Inc.
    Inventors: James D. Meador, Mandar R. Bhave
  • Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose
    Publication number: 20010031428
    Abstract: New polymers and anti-reflective compositions including those polymers are provided.
    Type: Application
    Filed: March 2, 2001
    Publication date: October 18, 2001
    Inventors: James D. Meador, Mandar R. Bhave
  • Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
    Patent number: RE40920
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Grant
    Filed: May 1, 2007
    Date of Patent: September 22, 2009
    Assignee: Brewer Science Inc.
    Inventors: Gu Xu, Jimmy D. Meador, Mandar R. Bhave, Shreeram V. Deshpande, Kelly A. Nowak