Patents by Inventor Manh Dang Nguyen

Manh Dang Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240144724
    Abstract: This invention proposes a method of crowd abnormal behavior detection from video using artificial intelligence, includes three steps: step 1: Data-preprocessing; step 2: Feature extraction and abnormal prediction using a three-dimensional convolution neural network (3D CNN), step 3: Post-processing and synthesizing information to issue warning.
    Type: Application
    Filed: September 28, 2023
    Publication date: May 2, 2024
    Applicant: VIETTEL GROUP
    Inventors: Hong Phuc Vu, Thi Hanh Vu, Hong Dang Nguyen, Manh Quy Nguyen
  • Publication number: 20240144489
    Abstract: A method for multi-object tracking from video. The method includes the following steps: (1) Capturing frames from the streaming source and preprocess the data; (2) Extract video features with three choices: a 3D-CNN backbone followed by a Transformer Encoder, a Video Transformer Encoder, a 2D-CNN Encoder with a stack of frames as input followed by a Transformer Encoder; (3) Multi-object tracking using a new end-to-end multi-task deep learning model named JDAT (Joint Detection Association Transformer), then post-processing and updating tracking state with Temporal Aggregation Module (TAM). The deep learning models in step 2 and step 3 are trained simultaneously end-to-end with a loss function that is accumulated over multiple timesteps (Collective Average Loss—CAL). Also, the model can be pretrained with weakly labeled image dataset in a self-supervised learning manner first, then finetuned on supervised video datasets with full tracking labels.
    Type: Application
    Filed: October 3, 2023
    Publication date: May 2, 2024
    Applicant: VIETTEL GROUP
    Inventors: Hong Dang Nguyen, Thi Hanh Vu, Manh Quy Nguyen
  • Patent number: 11796390
    Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
    Type: Grant
    Filed: July 1, 2022
    Date of Patent: October 24, 2023
    Assignee: KLA Corporation
    Inventors: Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen, Stilian Pandev, John Lesoine, Qiang Zhao, Liequan Lee, Houssam Chouaib, Ming Di, Torsten R. Kaack, Andrei V. Shchegrov, Zhengquan Tan
  • Publication number: 20220349752
    Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
    Type: Application
    Filed: July 1, 2022
    Publication date: November 3, 2022
    Inventors: Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen, Stilian Pandev, John Lesoine, Qiang Zhao, Liequan Lee, Houssam Chouaib, Ming Di, Torsten R. Kaack, Andrei V. Shchegrov, Zhengquan Tan
  • Patent number: 11378451
    Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: July 5, 2022
    Assignee: KLA Corporation
    Inventors: Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen, Stilian Pandev, John Lesoine, Qiang Zhao, Liequan Lee, Houssam Chouaib, Ming Di, Torsten R. Kaack, Andrei V. Shchegrov, Zhengquan Tan
  • Publication number: 20190041266
    Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
    Type: Application
    Filed: August 8, 2017
    Publication date: February 7, 2019
    Inventors: Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen, Stilian Pandev, John Lesoine, Qiang Zhao, Liequan Lee, Houssam Chouaib, Ming Di, Torsten R. Kaack, Andrei V. Shchegrov, Zhengquan Tan