Abstract: Operational machine components of an information technology (IT) or other microprocessor- or microcontroller-permeated environment generate disparate forms of machine data. Network connections are established between these components and processors of an automatic data intake and query system (DIQS). The DIQS conducts network transactions on a periodic and/or continuous basis with the machine components to receive the disparate data and ingest certain of the data as measurement entries of a DIQS metrics datastore that is searchable for DIQS query processing. The DIQS may receive search queries to process against the received and ingested data via an exposed network interface. In one example embodiment, a query building component conducts a user interface using a network attached client device. The query building component may elicit search criteria via the user interface using a natural language interface, construct a proper query therefrom, and present new information based on results returned from the DIQS.

Abstract: Embodiments of the present invention are directed to facilitating event forecasting. In accordance with aspects of the present disclosure, a set of events determined from raw machine data is obtained. The events are analyzed to identify leading indicators that indicate a future occurrence of a target event, wherein the leading indicators occur during a search period of time the precedes a warning period of time, thereby providing time for an action to be performed prior to an occurrence of a predicted target event. At least one of the leading indicators is used to predict a target event. An event notification is provided indicating the prediction of the target event.

Abstract: A benign all-wet process for stripping photoresist after an implantation process performed to fabricate a device is provided. A method of stripping implanted resist includes a first step of disrupting a crust formed on the surface of the resist during the implantation process and then removing the underlying resist. In accordance with embodiments of the invention, a catalyzed hydrogen peroxide (CHP) chemical system is used to disrupt the crust and allow for low temperature (<180° C.) removal of the underlying resist.

Abstract: A benign all-wet process for stripping photoresist after an implantation process performed to fabricate a device is provided. A method of stripping implanted resist includes a first step of disrupting a crust formed on the surface of the resist during the implantation process and then removing the underlying resist. In accordance with embodiments of the invention, a catalyzed hydrogen peroxide (CHP) chemical system is used to disrupt the crust and allow for low temperature (<180° C.) removal of the underlying resist.