Patents by Inventor Manuel SIX

Manuel SIX has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium
    Patent number: 10227506
    Abstract: Disclosed herein is a chemical mechanical polishing (CMP) composition (Q) containing (A) inorganic particles, (B) a compound of general formula (I) below, and (C) an aqueous medium, in which the composition (Q) has a pH of from 2 to 6.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: March 12, 2019
    Assignee: BASF SE
    Inventors: Max Siebert, Michael Lauter, Yongqing Lan, Robert Reichardt, Alexandra Muench, Manuel Six, Gerald Daniel, Bastian Marten Noller, Kevin Huang, Sheik Ansar Usman Ibrahim
  • CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE POLISHING OF SUBSTRATES COMPRISING GERMANIUM
    Publication number: 20170369743
    Abstract: Disclosed herein is a chemical mechanical polishing (CMP) composition (Q) containing (A) inorganic particles, (B) a compound of general formula (I) below, and (C) an aqueous medium, in which the composition (Q) has a pH of from 2 to 6.
    Type: Application
    Filed: December 4, 2015
    Publication date: December 28, 2017
    Applicant: BASF SE
    Inventors: Max SIEBERT, Michael LAUTER, Yongqing LAN, Robert REICHARDT, Alexandra MUENCH, Manuel SIX, Gerald DANIEL, Bastian Marten NOLLER, Kevin HUANG, Sheik Ansar USMAN IBRAHIM
  • CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION
    Publication number: 20160013066
    Abstract: Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) elemental germanium or (ii) Si1-xGex with 0.1?x<1, wherein the CMP composition (Q) consists essentially of (A) aluminum particles in an amount of from 0.01 to 3 wt. % based on the total weight of the CMP composition (B) at least one oxidizer, (M) an aqueous medium and (N) optionally at least one pH adjusting agent wherein the CMP composition (Q) has a pH of from 2 to 6.
    Type: Application
    Filed: May 26, 2014
    Publication date: January 14, 2016
    Applicant: BASF SE
    Inventors: Bastian Marten NOLLER, Manuel SIX